Nanomechanical testing system

ABSTRACT

An automated testing system includes systems and methods to facilitate inline production testing of samples at a micro (multiple microns) or less scale with a mechanical testing instrument. In an example, the system includes a probe changing assembly for coupling and decoupling a probe of the instrument. The probe changing assembly includes a probe change unit configured to grasp one of a plurality of probes in a probe magazine and couple one of the probes with an instrument probe receptacle. An actuator is coupled with the probe change unit, and the actuator is configured to move and align the probe change unit with the probe magazine and the instrument probe receptacle. In another example, the automated testing system includes a multiple degree of freedom stage for aligning a sample testing location with the instrument. The stage includes a sample stage and a stage actuator assembly including translational and rotational actuators.

RELATED APPLICATIONS

This application is an international filing that claims priority benefitof U.S. Provisional Application Ser. No. 61/441,511, filed Feb. 10,2011, and U.S. Provisional Application Ser. No. 61/551,394, filed Oct.25, 2011, both of which are incorporated herein by reference in theirentirety.

STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

This invention was made with government support under award numberDE-SC0002722 awarded by the US Department of Energy. The government hascertain rights in this invention.

TECHNICAL FIELD

Nano and micron scale material testing.

COPYRIGHT NOTICE

A portion of the disclosure of this patent document contains materialthat is subject to copyright protection. The copyright owner has noobjection to the facsimile reproduction by anyone of the patent documentor the patent disclosure, as it appears in the Patent and TrademarkOffice patent files or records, but otherwise reserves all copyrightrights whatsoever. The following notice applies to the software and dataas described below and in the drawings that form a part of thisdocument: Copyright Hysitron, Inc. All Rights Reserved.

BACKGROUND

Nanomechanical test instruments are used in R&D facilities around theworld for quantitative mechanical and tribological measurements.Nanoindentation is a method to quantitatively measure a sample'smechanical properties, such as elastic modulus and hardness, forexample, using a small force and a high resolution displacement sensor.Typically, a force employed in nanoindentation is less than 10 mN, witha typical displacement range being smaller than 10 μm, and with a noiselevel typically being better than 1 nm rms. The force and displacementdata are used to determine a sample's mechanical properties, and todetermine if the properties are within acceptable performance limits fora particular product or application.

In some examples a probe with a well-known shape is pressed into amaterial in a predetermined manner and removed therefrom whilecontinuously measuring the probe position and applied probe/samplecontact force. Nanomechanical characterization employs one or moreactuators and sensors to to perform one or more of control ormeasurement of the applied force that the probe exerts on the materialand the relative displacement of the probe during the test. Sensors andactuators are applied along a single axis, in one example, as is thecase with standard instrumented depth sensing indentation, or in two tothree dimensional space for tribological measurements. Probe-basednanomechanical testing techniques are used for the determination ofmechanical properties such as hardness, modulus, fracture toughness andtribological characteristics such as scratch/mar resistance, frictioncoefficient measurement and interfacial adhesion assessment.

Critical technological advances in nanomechanical test instruments havebeen mandated by the ability to control processes and structures tonanometer length scales and have required the development of highersensitivity force and displacement actuators/sensors. Due to combinedadvances in actuator/sensor and control electronics technologies,nanomechanical testing systems can control and measure forces to withinseveral nano-Newtons (nN) and control and measure displacements withinseveral Angstroms (Å). These developments have permitted quantitativenanomechanical characterization of ultra-small volumes of material,including thin films used in the semiconductor and data storageindustries; nano-composite polymers, ceramics, metals; andnanostructures including nanoparticles, nanowires, nanopillars, andnanotubes.

BRIEF DESCRIPTION OF THE DRAWINGS

In the drawings, which are not necessarily drawn to scale, like numeralsmay describe similar components in different views. Like numerals havingdifferent letter suffixes may represent different instances of similarcomponents.

The drawings illustrate generally, by way of example, but not by way oflimitation, various embodiments discussed in the present document.

FIG. 1 is a perspective view of one example of an automated testingassembly.

FIG. 2 is an exploded view of one example of a sample handling moduleand a plurality of storage modules.

FIG. 3A is an exploded view of a storage module as shown in FIG. 2including a plurality samples for storage therein.

FIG. 3B is a perspective view of another example of a storage module toincluding multiple samples for use with a sample handling module and anautomated testing assembly.

FIG. 4A is a plan view of one example of a robotic handling system in aplurality of orientations with a sample within the sample handlingmodule of FIG. 2.

FIG. 4B is a perspective view of one example of a pre-aligner for use inthe sample handling module of FIG. 2.

FIG. 5 is a block diagram showing one example of an automation methodfor mechanically testing one or more of a plurality of samples or aplurality of test locations on a sample with the automated testingassembly.

FIG. 6A is a perspective view of one example of an automated testingsystem.

FIG. 6B is a detailed perspective view of the automated testing systemshown in FIG. 6A.

FIG. 7A is a perspective view of mechanical testing instrument and anoptical instrument coupled with an instrument stage.

FIG. 7B is another perspective view of the mechanical testing instrumentincluding the instrument tip and the optical instrument shown in FIG.7A.

FIG. 7C is a schematic diagram showing one example of a transducerassembly.

FIG. 8 is a perspective view of an instrument stage coupled with a lowload and high load mechanical testing instruments and an opticalinstrument.

FIG. 9 is a perspective view of one example of a cantilevered instrumentcolumn and a sample stage including a sample stage surface and an X, Yand Theta degree of freedom stage actuator assembly.

FIG. 10A is a perspective view of one example of a sample stage surfacewith a plurality of elevation pins elevated relative to the sample stagesurface.

FIG. 10B is a perspective view of the sample stage surface of FIG. 10Awith the plurality of elevation pins substantially flush relative to thesample stage surface.

FIG. 11A is a detailed perspective view of the automated testing systemincluding a tip changing assembly.

FIG. 11B is a perspective view of the tip changing assembly including atip magazine and the stage receptacle flange.

FIG. 12A is a perspective view of one example of a tip change unit.

FIG. 12B is a cross sectional view of the tip change unit of FIG. 12A.

FIG. 13 is a perspective view of the tip change unit with a drive cap inbroken lines to show one example of a rotary clutch in the tip changeunit.

FIG. 14 is a cross sectional view of the tip change unit showingcomponents of the rotary clutch shown in FIG. 13.

FIG. 15 is a detailed perspective view of one example of the pawl of therotary clutch.

FIG. 16 is a perspective view of the tip change unit shown in FIG. 12Aincluding a mirror coupled with a mirror arm to facilitate viewing ofone or more of identification or calibration data of an instrument tipcoupled with the tip change unit.

FIG. 17 is a block diagram showing one example of an automatic methodfor performing a space indentation diagnostic of a transducer of amechanical testing instrument.

FIG. 18 is a block diagram showing one example of an automatic methodfor performing a tip diagnostic of an instrument tip of a mechanicaltesting instrument.

FIG. 19 is a block diagram showing one example of an automatic methodfor performing a tip calibration of an instrument tip of a mechanicaltesting instrument.

FIG. 20 is a block diagram showing one example of an automatic methodfor installing an instrument tip in a mechanical testing instrument.

FIG. 21A is a schematic view of one example of a sample stage of theautomated testing system positioned with translational and rotationalstages.

FIG. 21B is a schematic view of another example of a sample stage of theautomated testing system positioned with translational stages.

FIG. 22A is a plan view of one example of a testing system includingtranslational stages and limited instrument coverage of a sample stage.

FIG. 22B is a plan view of another example of a testing system includingtranslational stages and an enhanced overall system footprint.

FIG. 22C is a plan view of yet another example of a testing systemincluding translational stages and an enhanced overall system footprint.

FIG. 23 is a plan view of the testing system shown in FIG. 6A includingtranslational and rotational stages and a minimized footprint andminimal cantilevered instrument column length.

FIG. 24 is a perspective view of one example of a translational stagefor use with the sample stage shown in FIG. 6A.

FIG. 25 is a perspective partial sectional view of one example of arotational stage for use with the sample stage shown in FIG. 6A.

FIG. 26A is a schematic view of one example of the sample stage shown inFIG. 6A including a stage coordinate system.

FIG. 26B is a schematic view of one example of a sample including asample coordinate system and first and second reference marks.

FIG. 26C is a schematic view of the sample shown in FIG. 26B coupledwith the sample stage shown in FIG. 26A translational and rotationalmisalignment exaggerated between the sample and the sample stage.

FIG. 27A is a block diagram showing one example of a method fordetermining an instrument offset between at least two instruments of thetesting system.

FIG. 27B is a schematic diagram showing one example of a sample stage,an initialization sample and optical and mechanical testing instrumentswith an instrument offset between the instruments.

FIG. 28A is a block diagram showing one example of a method fordetermining a center of rotation of a sample stage of the testingsystem.

FIG. 28B is a schematic diagram showing one example of a sample stageand an initialization sample with marks at each of a plurality ofmarking locations on the initialization sample.

FIG. 29A is a block diagram showing one example of a method fortranslational deskewing of a sample on a sample stage.

FIG. 29B is a schematic diagram showing one example of a sample coupledwith the sample stage and a plurality of detected locations forming theboundaries of a translational deskewing circle, and a first referencepoint is the center of the circle.

FIG. 30A is a block diagram showing one example of a method forrotational deskewing of a sample on a sample stage.

FIG. 30B is a detailed schematic diagram showing one example of a samplehaving a second reference point at a second reference angular offset toa first reference point.

FIG. 31A is a block diagram showing one example of a method for aligningan instrument with one or more test site locations of a sample.

FIG. 31B is a block diagram showing one example of a method for aligningan instrument with one or more test site locations of a sample based ona coordinate system of the sample.

DESCRIPTION OF THE EMBODIMENTS

In the following detailed description, reference is made to theaccompanying drawings which form a part hereof, and in which is shown byway of illustration how specific embodiments of the present disclosuremay be practiced. In this regard, directional terminology, such as“top,” “bottom,” “front,” “back,” “leading,” “trailing,” etc., is usedwith reference to the orientation of the Figure(s) being described.Because components of embodiments of the present apparatus can bepositioned in a number of different orientations, the directionalterminology is used for purposes of illustration and is in no waylimiting. These embodiments are described in sufficient detail to enablethose skilled in the art to practice aspects of this disclosure, and itis to be understood that other embodiments may be utilized and thatstructural changes may be made without departing from the scope of thepresent disclosure. Therefore, the following detailed description is notto be taken in a limiting to sense, and the scope of the presentdisclosure is defined by the appended claims and their equivalents.

Overview

The systems described herein provide a series of capabilities beyondthose of previous devices. Reference is made in this overview to anautomated testing assembly 100 as described herein including itscomponents. Multiple measurements of multiple samples are performedwithout time and labor intensive reloading and correspondingrepositioning of a sample for a single measurement. High throughput ofsamples with rapid measurements of one or more samples are achieved withthe systems described below. Sample handling, positioning, testing andobservation of one or more samples 202 (e.g., 10, 100, 1000 or moresamples) are performed by the system while the system is adaptively ableto: prepare the one or more samples, execute testing routines, configureand calibrate the instruments, selectively operate the instruments asneeded (to test, verify data, calibrate the instruments and the like),configure the instruments, identify testing locations, executemeasurements and analyze data. Because the system 100 is configured toconduct testing and measurement of a large number of samples, technicianerror, for instance, from individual handling (of instruments andsamples), positioning and testing of discrete samples is substantiallyavoided.

In contrast, other systems require labor and time intensive effort bytechnicians having substantial technical aptitude to properly prepareindividual discrete samples, calibrate the system, set up theappropriate testing routines and execute measurements.

Furthermore, the systems described herein ensure rapid, accurate andconsistent testing of a plurality of samples within environmentalconditions that cause distortion and inaccuracy of measurements taken onthe sub-micron scale (i.e., micron scale; one or more microns and below,such as the nano scale). The systems isolate the automated testingsystem 600 and correspondingly minimize the effects of disturbancesincluding, but not limited to, acoustical, air flow, temperaturevariability, vibratory disturbances and the like. Testing andmeasurement with the systems are performed with inherent anduncontrollable disturbances present in these exterior environments(e.g., manufacturing), to making in-line and near-line nanomechanicaltesting possible. Stated another way, the systems 100 described hereinare configured for use within production environments and therebycapable of rapidly and accurately testing and measuring mechanicalproperties at micron, sub-micron and nano scales. Remote and discretetesting of a sample relative to the production environment is therebyavoided.

Moreover, the systems described herein facilitate the testing andmeasurement of large quantities of samples in the production environmentwhile at the same time minimizing material contamination, materialbreakage and system downtime.

The apparatus provides systems and methods for testing a series ofmaterial samples 202, 310 (e.g., plurality of 10, 100, 1000 or more)utilizing a micro- and nanomechanical testing instrument 612. Theapparatus and method includes:

delivering a plurality of material samples 202 to a micro and/ornanomechanical testing instrument 612 of an automated testing system;

positioning at least one of the plurality of material samples 202 in asubstantially pre-determined position relative to at least one probehaving a substantially known tip geometry. In one example, the system100 is configured to not, per-se, place samples in a pre-determinedlocation, but rather place the sample 202 on a sample stage 614, andthen through an automated process, bring the stage 614 carrying thesample 202 to the probe 702 of the mechanical testing instrument 612 fortesting;

applying a force with a probe 702 in one or more of a normal direction(e.g., the Z axis/direction, which may be substantially perpendicular tothe sample surface) and/or lateral direction(s) (e.g., substantiallyin-plane with the sample surface, otherwise generally known as the x-and y-axis/directions) relative to the surface of the positioned sample202;

collecting data relative to the interaction or interactions between theprobe 702 and a positioned sample (such as force-displacement data);

disengagement of the probe 702 from the sample 202, followed by theapparatus (e.g., by a robotic handling system 200) unloading the testedmaterial sample 702 before loading and testing the next sample.

Materials Capable of being Tested by One or More Examples of TheseSystems and Methods

In the course of the following description reference is made to avariety of materials that will undergo nanomechanical testing as“materials” or “samples.” As detailed herein, the terms “material(s)” or“sample(s)” broadly cover a wide variety of substances capable of beingtested nanomechanically. These materials are virtually any composition,and include, but are not limited to, such substances as: ceramics,metals, polymers, wood, biological materials (such as red blood cells,cartilage, bone), liquids, viscous materials, MEMS devices and the like.While the materials tested are virtually unlimited, one of ordinaryskill in the art will recognize that the critical and necessary aspectsof an automated nanomechanical testing system will be relativelyuniform, regardless of the actual materials tested. For illustrativepurposes only, the following system 100 and methods will describe anexample of such a system wherein the materials tested are semiconductingmaterials deposited on wafers. The disclosure herein is intended tobroadly cover the testing of other samples and sample materials beyondsemiconductor wafers and materials. Throughout this specification,reference may be made to one semiconductor wafer (or one other material)as the “sample” indicating it is one sample in a larger set of samplesthat collectively are referred to as a “material” or “materials”. Forexample, broadly speaking, the nanomechanical testing instruments 612conduct tests on materials (e.g., semiconductors), but individual“samples” of those materials are loaded into the instrument and tested.

Storage Modules Suitable for Storing Material to Tested

Materials are delivered to and removed from the nanomechanical testinginstrument (e.g., the automated testing system 600). One or more of aplurality of devices are configured to deliver and/or remove thematerials. One example, described further below, stores materials priorto testing in an appropriate container or storage module 104. The typeof storage module is dependent on the nature of the materials tested.Other examples of material handling devices, prior to testing, seriallydeliver material samples to the nanoindentation apparatus usingautomated means, such as a conveyer belt-type apparatus, roboticassemblies and the like. Other options are considered as well.

Storage Module

One option for a storage module is the material storage module (“SM”),wherein a number of similar materials are arranged and stored prior tonanomechanical testing of said materials. The specific type of storagemodule will depend upon a number of factors, such as the size of thesample and the number of samples tested in a testing sequence.

Small Samples: Where the samples to be tested are relatively small, asis the case with, for example, certain MEMS devices (i.e.,Microelectromechanical Systems) or numerous liquid samples, the materialstorage module is optionally relatively small, and is accommodatedentirely within the testing enclosure without needing opening of thetesting chamber to serially place and remove test samples. Examples ofsuch storage modules include a microplate having a series of samplewells (such as 6, 12, 24, 96, 384 or 1536 sample wells arranged in a 2:3rectangular matrix), such as the sample module 308 shown in FIG. 3B.Another such example of a storage module includes a pallet an array of,for example, MEMS devices or other small samples positioned or fixed onthe pallet.

Larger Samples: Where multiple samples are not readily accommodatedwithin the confines of a testing enclosure 108 the nanomechanicaltesting system 100 employs, in one example, a storage module 104 forcontaining test samples outside of the enclosure. In some embodiments,said external material storage module 104 acts as a magazine andcontains multiple smaller material storage modules (such as, forexample, palletized MEMS devices, the aforementioned microplate, and thelike) for individual loading into the enclosure for testing. In anotherembodiment, in the semiconductor industry, the storage module is a FOUP,or Front Open Unified Pod, which stores and transports 13, 25 or anothernumber of individual wafers, such as a plurality of samples 302 (SeeFIG. 3A). As one of ordinary skill in the art will readily appreciate, aFOUP is an example of a storage module. Many other non-FOUP storagemodules exist, but are referred to by other names or acronyms dependingon the relevant industry and the specific material housed.

Delivery Mechanism

In another embodiment, samples tested are not transported and stored ina Material Storage System prior to testing, but are instead seriallydelivered via a mechanical apparatus, such as a conveyer belt, to ornear the testing site. While those of ordinary skill in the art willrecognize that such delivery apparatuses can take many forms (theconveyer belt being one such form) we will refer to delivery apparatusescollectively as “delivery mechanisms.”

In one embodiment of the delivery mechanism, the physical location ofthe individual materials with respect to the delivery mechanism orstorage module is known or predetermined. The handling system (addressedbelow) is able to ascertain the position of the transported material tobe tested in order to engage the samples prior to positioning thesamples for nanomechanical testing. The storage module, such as thestorage module 104, will house the materials in a uniform andpredetermined arrangement (such as in a FOUP). Alternatively, thehandling system will be capable of interacting with the materials in thestorage module or on the delivery mechanism in such a way that thehandling system can reliably locate and engage each individual sampleprior to testing.

In one example, there is uniform spacing between the individual samples,for instance a plurality of samples 302 or 310 are mange in a uniformmanner. In certain embodiments, sensing devices are employed to reliablyidentify the location of a material prior to the handling systeminteraction with the same where the spacing of each material is notsubstantially uniform. Such sensing devices include, but are not limitedto, pattern and shape recognition sensors, acoustical sensors,thermographic sensors, tactile sensors, RF sensors, electrical contactsand the like.

Regardless of the actual means employed, the materials are stored and/ordelivered to or proximate to the nanomechanical testing instrument (suchas the instrument 612 of the automated testing system 600) in such amanner that in one example, a handling system (such as the robotichandling system 200 shown in FIG. 2) is able to releasably andselectively engage said samples 202 (e.g., picking them up,repositioning them, moving them, etc.) to deliver them to thenanomechanical testing instrument. In another example, the materials areautomatically delivered to a nanomechanical testing system 600 withoutthe intervening handling system. Aspects of the handling system areaddressed in more detail below.

Handling System

The handling system, which can take numerous forms, is responsible forserially engaging multiple samples 202 (materials) and moving saidmaterial either from the storage module 104 or the delivery mechanism(e.g., a chute, bin, belt conveyor or the like). In one embodiment, thehandling system, such as the robotic handling system 200 shown in FIG.2, engages a material and mechanically positions that material on asupport structure, such as a mechanical testing stage 614 as shown inFIGS. 6A, B (e.g., a wafer chuck) that is located inside ananomechanical testing instrument. Handling systems take many forms,each appropriate to the material being tested. For the purposes ofexplaining the apparatus, one example of a handling system (in thisinstance, an EFEM) is used in one embodiment.

An EFEM is employed to transport material (in this case silicon wafersor quartz photo-masks) between storage carriers (e.g., modules 104, suchas FOUPs) and the nanomechanical testing instrument 612 of the system600 (described below). In an embodiment, an EFEM is configured to unloadmaterial, such as a 300 mm wafer sample 202, and deliver that wafer to ananomechanical testing instrument (e.g., instrument 612 of the automatedtesting system 600) for testing, imaging, or other analysis, and thenreturn the material to its carrier, such as the storage module 104, uponcompletion of said process or test. While an EFEM is an example of asystem and apparatus for handling materials, we will refer to any systemfor handling materials as a handling system. Examples of non-EFEMhandling systems in other industries include dedicated robotics systemsthat act as an intermediate mechanism to “bridge the gap” between two ormore systems/processes. Such handling systems with variousconfigurations are employed in numerous industries, including (by way ofexample and not of limitation): the pharmaceutical and biotech,semiconductor, nano-technology, photovoltaics (PV) solar cell, fuelcell, data storage, opto-electronics, and liquid crystal display/lightemitting diode industries.

Opener

Where material samples are contained in a material storage module 104,the handling system is configured, in one example, with an opener torender accessible the samples or materials stored in the module. In thesemiconductor industry, wafers stored in a FOUP (a FOUP is one exampleof a material storage module) are delivered to a FOUP opener (one kindof opener) that is attached to the Equipment Front End Module (EFEM)(the sample handling module 106 in FIG. 1) employing robotic means formanipulating wafers as well as, in some instances, a wafer realignmentdevice (see below).

In an exemplary system, the EFEM is configured to insert and withdraw200 and 300 mm wafers from the nanomechanical test instrument. Morespecifically, the front of the EFEM will contain one or more FrontOpening Unified Pod (FOUP) openers for 13 and 25 wafer FOUPs(cassettes). For instance, the sample handling module in FIG. 1 includesone or more storage module loading racks 204 configured to receive andfacilitate the opening of the storage modules 104 (See FIG. 2). Inanother embodiment, a robotic arm provides the transfer functionalitybetween the cassette, a pre-aligner, and the nanomechanical testinstrument. For instance a robotic handling system 200, shown in FIG. 2,includes in one example an articulating arm 402 and one or more handlingforks 404 as shown in FIG. 4A. Means of sample transfer other than arobotic arm may also be used without departing from the scope of thisdisclosure (e.g., mechanical linkage assemblies, vacuum assemblies,electrostatic actuators, magnetic actuators, high pressure gas jets andthe like).

Pre-Aligner

In one system, the handling system (e.g., the EFEM) incorporates apre-aligner 412 (FIGS. 4A, B) which includes approximately ±0.05°accuracy to position the sample 202, such as the wafer (or any othermaterial), in the desired orientation prior to placement within thenanomechanical test instrument (e.g., on a sample stage 614 as shown inFIG. 6A). In other embodiments, sample alignment and re-alignment ishandled inside the nanomechanical test instrument by, for example, astage or wafer chuck 614 capable of one or more of rotational andtranslational movement.

Ionizer

In an embodiment, the EFEM units also contains an ionizer and +1 Paenvironment module (FFU).

Nanomechanical Testing Instrument (NTI)

The system 100 and methods for using the same include a nanomechanicaltesting instrument. One nanomechanical testing instrument includes, butis not limited to, the Hysitron TI950 TriboIndenter. Nanomechanicaltesting instruments, such as the TI950 are configured with computer,software and controller means for conducting automated nanomechanicaltesting. In other embodiments, and as explained further below, the NTIis an automated, high throughput instrument (e.g., the automated testingsystem 600) capable of supporting numerous nanomechanicalcharacterization techniques and is coupled to a control module, such asthe control station 110 shown in FIG. 1, and enables precise,feedback-controlled nanomechanical testing of a large number of samples.A plurality of various NTIs may be utilized with the automated testingassembly 100, depending upon the nature of the samples to be tested. Onesuch example is outlined below.

Automated Mechanical Test Apparatus for Micron and Nano-Scale Testing

The automated testing system 600 includes a mechanical testinginstrument 612 having the testing probe 702 (See FIGS. 6A, B and 7A-C).The automated testing system 600 is configured for one or more ofindentation, scratching and other testing operations including, but notlimited to, tension, compression, fracture, tribological testing and thelike.

The actuator/sensor, such as the transducer assembly 700, is configuredto provide force and displacement in one or more of the normal, lateraland arcuate directions with one or more testing heads (e.g., probes ortips 702) configured for any combination of normal, lateral and arcuatemovement directions.

Translation staging, including one or more of the sample stage 614including the stage actuator assembly 618, or an instrument stage 608are configured, in one example, for any combination of XYZ translationfor material and/or testing head translation. In another example, thesample stage 614 is configured for material positioning of the sample202 relative to the testing head, such as the probe 702, for instancewith X-axis, Y-axis and rotational positioning (e.g., thetapositioning).

The automated testing system 600 is configured for receiving samplesfrom the automated material handling system, such as the sample handlingmodule 106, shown in FIG. 1. The automated testing system 600 furtherincludes a fixture mechanism for affixing or anchoring samples 202 tothe staging. In one example, vacuum ports 632 affix the samples 202 tothe staging.

The automated testing system 100 includes, in one example, a supportframe that mechanically couples various hardware components of the testapparatus. For instance, the support frame includes the automatedtesting enclosure 108. In another example, the support frame includes agranite base 602 and a system support table 604, as shown in FIG. 6A. Insome examples, the support frame mechanically couples the test apparatus(automated testing system 600) to the automated material handlingsystems, such as the sample handling module 106, shown in FIG. 1.

In another example, the automated testing system 600 includes an opticscolumn, such as an observation column using one or more of optical,infrared, and other observation techniques for observation of thesamples. The optics column includes an optical instrument, such as theoptical instrument 610 shown in FIG. 6A. The optical instrument 610 isconfigured to view test placement location. In another example, theoptical instrument 610 provides machine vision for automated recognitionof testing sites, rotational and translation deskewing of the sample andthe like.

In still other examples, the automated testing assembly 100 includes ananti-vibration system.

The automated testing assembly 100 further includes a control station110, shown in FIG. 1, including control software, memory, hardwiredcontrols, a user interface and the like configured for one or more ofthe selection of testing sites, acquisition of force-displacement data,data analysis, automated system calibration routines and automated tipshape validation routines.

The control system, such as the control station 110, coordinates thecommunication between the components of the automated testing assembly100 as well as peripheral machines and systems having a relationshipwith the assembly 100, such as production devices upstream or downstreamfrom the assembly.

The above outline is an example of one such system including options foruse with the system. Numerous other configurations are possible withoutdeparting from the systems described herein. Some configurations includeall of the above described features, a portion of the describedfeatures, and in some examples include other features in addition tothose listed.

The following is a sequence of steps for implementing an embodiment ofsystem, wherein the interaction between the material handling system(e.g., the sample handling module 106) and the NTI (e.g., the automatedtesting enclosure 108 including the automated testing system 600) isoutlined and wafers comprise the materials tested. The system isconfigured with a staging system and a wafer chuck (e.g., a stage 614)for securing the wafers prior to testing. The example steps forimplementation include one or more of the following:

-   -   i) A sample 202 is engaged by the handling system (e.g., the        robotic handling system 200);    -   ii) The elevation pins 634 (see FIGS. 10A, B) are raised if not        already raised;    -   iii) A door to the enclosure is opened (if not already open)        permitting access to the interior of the NTI (the automated        testing enclosure 108);    -   iv) The handling system 200 transports the wafer 202, through        the door and into the interior chamber of the NTI;    -   v) The wafer 202 is placed onto the raised pins 634 and        released;    -   vi) The handling system 200 withdraws from the chamber and the        door to the enclosure is closed;    -   vii) Vacuum (e.g., at the vacuum ports 632) is provided and the        pins 634 are lowered, with the vacuum securing the wafer 202;    -   viii) The nanomechanical testing and/or imaging sequences and/or        data acquisition are performed with the automated testing system        600;    -   ix) The vacuum is released at the vacuum ports 632;    -   x) The pins 634 are raised;    -   xi) The door to the enclosure 108 is opened;    -   xii) The material handling system 200 retrieves the sample from        the NTI, and places it in a predetermined location, for instance        in the sample storage module 104;    -   xiii) Return to step 1) where a sample is engaged by the        handling system and the steps are repeated or performed in        another permutation.

As will be readily recognized, a number of these steps are conductedsimultaneously or out of the specific sequence represented above, in oneexample, without departing from the exemplary apparatuses and methodsdescribed herein. For example, steps i, ii, and iii are performed in adifferent order or performed simultaneously, in one option.Additionally, several of these steps include sub-steps. For example,step viii wherein the system conducts nanomechanical testing and/orimaging and/or data acquisition includes many (in one example, nearlyinfinite permutations) depending upon the specific configuration of theinstrument in various examples.

As is detailed further below, the system optionally incorporates astaging system and damping technology. The system also incorporates oneor more of the following capabilities.

Staging System

Regardless of the specific nature of the NTI, the system is configuredwith a support structure, such as a sample stage 614 or a wafer chuck,upon which a sample is placed or secured prior to and during testing,such as nanoindentation testing, scratch or wear testing, etc. A widevariety of stages are employed by the system, some of which are specificto the nature of the materials to be tested.

In an embodiment, once a material/sample is engaged by the handlingsystem (e.g., the robotic handling system 200), the material isautomatically placed on a support structure (“SS”) such as a samplestage or a wafer chuck, prior to nanomechanical testing (nanomechanicaltesting system, as used herein includes systems configured to also teston the micro-scale as well). In one example, the support structure, suchas the sample stage 614, is located inside the NTI housing and is usedto temporarily secure the material during nanomechanical testing.

By way of example, where the apparatus is utilized in the semiconductorindustry, the nanomechanical test instrument incorporates an X-Y stagingsystem, an X-Y-theta staging system or the like with a travel longenough to accept the wafer from the EFEM. Where the wafer is to undergo,for example, nanoindentation testing utilizing a fixed probe that is notcapable of substantial movement in the X-Y dimensions, the sample stageupon which the wafer rests is configured to travel, and thus move thewafer relative to the indentation probe so that the probe is able totest all regions of a 300 mm wafer without human intervention.Embodiments include a high velocity X-Y stage or X-Y-Theta stage with asmall encoder resolution.

Vibration Mitigation

Because nanomechanical testing is conducted at incredibly small scales,acoustic noise, mechanical vibration, electrical and magneticinterference, and air currents affect test results by introducingunwanted disturbances that are larger than the quantities beingmeasured. Such disturbances are often referred to collectively as“noise.” The sources of such noise are varied. Regardless of the source,any noise may have an appreciable effect on test data and should beminimized. The apparatuses and methods described herein minimize noiseeven in production and manufacturing environments to facilitatelarge-scale testing of a plurality of samples.

Instrument Housing

In one embodiment, the NTI (e.g., the automated testing system 600) issurrounded by a physically passive barrier to external disturbances,such as an instrument housing or automated testing enclosure 108. In avariation of the embodiment, the housing structure surrounds theinstrument (e.g., the mechanical testing instrument 612), the stagingsystems, and the test sample to during active testing, but it excludesthe material handling system, the sample delivery mechanism and anyopeners or sample pre-alignment equipment. In another example, thestorage modules, handling system, delivery mechanism, and otherequipment are enclosed within the instrument housing and still achievesubstantial damping. Because these devices tend to themselves emit noiseat some level, even when not active, such equipment is located outsideof the physical instrument housing in another example.

The housing itself can be comprised of various materials, including,without limitation, fiberglass enclosures and enclosures with anacoustic damping layer, thermally insulating materials. In anotherexample, the physical shape of the enclosure itself has noisemitigating, aerodynamic properties. In an example a damping housingincludes a housing constructed of a fiberglass which incorporates adamping core. The instrument is located inside. In another embodiment,the housing is constructed of a metal, such as stainless steel and isfurther combined with acoustic damping materials, for instance as shownin FIG. 1 with the automated testing enclosure 108.

Anti-Vibrational

In an embodiment, the system incorporates additional anti-vibrationstrategies: including active and passive strategies. Such passivedamping includes “floating” mechanisms, such as springs, maintained airpressure, shock absorbing devices, or a material with high dampingproperties, such as rubber, other elastomers or suspension mechanisms.All of these are passive anti-vibration techniques used alone or inconjunction with other mechanisms. Another damping strategy affixesinstruments housed inside the enclosure to a block of material, such asa large piece of stone, for instance granite. In one embodiment, thematerial takes the form of a heavy granite arch-like structure orcantilevered instrument column 606 and base 602 (see FIG. 6A) which, byvirtue of its mass, damps vibrations that might otherwise be transferredto the instruments 612 (e.g., nanoindenters, AFM (atomic forcemicroscope), SPM (scanning probe microscope), optical microscopes, etc.)coupled thereto.

Because vibration and noise mitigation is important for nanomechanicaltesting in an automated environment, the system also contains one ofmore active antivibrational mechanisms, in another example. One activemethod is achieved through the incorporation of piezo active elementsthat sense vibration and actively cancel out vibration by creating anopposite out of phase damping force (e.g., vibration with a counterfrequency). In an example, such piezo active elements are locatedbeneath the NTI (e.g., beneath a system support table 604 or a granitebase 602, as shown in FIG. 6A) in order to partially isolate thesensitive instruments, the sample stage and the sample from vibrationstransferred through the floor in a factory environment. In anotherexample, piezo active elements are employed inside the instrumenthousing, for example, under the granite structure mentioned above. Inyet another example, voice coil based damping systems are incorporatedinto the automated testing system 100.

Wafer Chuck

In one configuration relevant to wafer testing, a modified 200 mm and300 mm wafer chuck (e.g., a sample stage 614) comprised of a solid pieceof stainless steel is incorporated. The chuck in one variation, alsocontains an extension containing a quartz sample (e.g., a diagnosticsample 1106), which has known physical properties and is utilized fortip area function calibrations, wherein a nanoindentation tip conductsone or more indents into the quartz and, for example, force anddisplacement data is analyzed. In another embodiment, a sample ofaluminum or other suitable material is similarly utilized to calibrate atip-optics offset.

In one example, wafer chucks are rotational, which may create instrumentreliability problems. Optionally, such rotational capabilities are notincluded in the wafer chuck described herein. In another example, thesample stage includes translational and rotational stages. Moreover, thechuck in an embodiment does not incorporate a wand slot.

In another embodiment, the automated instrument incorporates a computercontrolled on/off switch to control the suction from the vacuum pump aswell as automatic ‘lifting pins’ (typically three or more) which areemployed to raise and lower the wafer to and from the vacuum chuck.

Z-Axis

The NTI accommodates movement of the indentation probe, for example,relative to the sample in the z-axis. In an example system, the z-axisof the instrument accommodates up to two separate testing heads. This isdesired for several reasons, including: A) applications where bothscratch and indentation are important—two tips are required, B) in onlya scratch or indentation application (i.e., dual identical heads areused), if one tip becomes defective testing can still continue, and C)possibility of running two transducers simultaneously for a more thantwofold increase in data acquisition. It is noted that in someconfigurations, the control computer (e.g., the control station 110) maybe required to switch between two controllers (e.g., Hysitron Performechcontrollers). In one example one or both of the controllers includedigital signal processors (DSPs) that cooperate with and act uponcommands from the control station 110. The controllers communicate withone or more mechanical testing instruments (e.g. 610 including one ormore of mechanical and tribological transducers).

Material Specific Components

It is recognized that certain embodiment of the system are configured tocreate a positive (or negative) pressure microenvironment. Additionally,in one example, the instrument incorporates an ionizer and/or filtrationsystem, an ESD-proof enclosure, opening/closing load door (mentionedabove).

Auto Tip Change Mechanism

In one embodiment, the NTI incorporates a mechanism, such as a probechange assembly 1100 that automatically changes tips when A) goingbetween indentation and scratch testing (when the z-axis can onlyaccommodate a single testing head), and B) when testing results falloutside pre-defined acceptable levels and an ‘auto tip validation’software routine identifies the tip as defective.

One mechanism utilizes a planetary set of gears that hold a multitude oftips. When it is determined that a tip is no longer functioning withinacceptable parameters, the system decouples the tip, which in someembodiments is affixed to a threaded post affixed to a transducer, andwill select a replacement tip or a tip of a different desired geometry,and affix that tip to the threaded post. Because of the sensitivity ofthe transducer, and the danger of applying excess torque when affixing areplacement tip, an embodiment provides for a known number of rotationsto securely install and remove a tip and the tip change mechanism isconfigured to limit the permitted amount of torque. Optionally, thereplacement tip is held by a mechanical interfitting that affixes thetip to the instrument without rotation, such as by snap fit,interference fit, friction fit and the like.

Speed Enhancement—Finding the Sample Surface Quickly

In most nanoindentation systems, testing is conducted slowly because alarge percentage of the testing time involves approaching the sampleslowly with a probe. Because testing is performed on a micro- andnano-scale level, and given the sensitivity of the transducer to whichthe probe is affixed, it is critically important that the tip not“crash” into the sample to be tested. Crashing the tip into the samplecan destroy the transducer and or the tip (e.g., the transducer assembly700 or the probe 702), rendering the instrument inoperable.

In an embodiment of the system described herein, the macro approach ofthe tip to the sample is not facilitated by a human operator. To reducecycle time one embodiment incorporates a sensor that extends somedistance below the probe, so in a “quick approach” mode the sensorcontacts the sample before the indentation tip can crash into thesample. Contact of the sensor with the sample triggers the system towithdraw the sensor and proceed slowly for the last remaining distanceto bring the tip (e.g., the probe 702) into contact with the samplewithout damaging it or the transducer (e.g., the transducer assembly 700including the capacitor assembly 710.

In another example, the system described herein is equipped with one ormore sensors such as laser triangulation sensors, capacitance sensors,fiber optics-based interferometers that enable the tip to quickly closethe majority of the gap. In one embodiment, the tip is quickly directedto within 1 micron of the sample surface, testing is started from theair and the displacement offset is automatically corrected.

Supporting Components

The components of the NTI (e.g., the automated testing assembly 100) usevarious electronics, computer, a controller such as an SPM-typecontroller (e.g., a scanning probe microscopy type controller including,but not limited to, a scanning tunneling microscopy type controller), avideo display monitor, etc. found in one example in the control station110.

Software Multi-User Level Software

In one configuration, the software that operates the system (forexample, the Hysitron's TriboScan Professional software), is configuredto have two or more user levels, such as Administrator (fullfunctionality), Engineer (limited functionality), and Operator (morelimited functionality). In one embodiment, these defined user levelsprovide push-button type testing capability on a graphic user interfaceonce the testing protocols are set up by the Administrator or Engineerlevels. An embodiment is configured to include an easy to navigate userinterface where the operator specifies the type of test to be performed(e.g., indentation/scratch), the pre-defined load/scratch function, andthe testing location. Each setting is ideally selected on a singlescreen (tab) using, for example, a touch screen in the control station110.

Machine Vision/Pattern Recognition

It may be advantageous to more specifically orient the sample (such as awafer) prior to testing, even where a pre-aligner is employed by thehandling system. Therefore, in one embodiment, in order to fine-tune thewafer orientation, machine vision is incorporated to further de-skew thewafer alignment. This assists in testing small discrete regions of apatterned substrate, or limits the introduction of defects to specificregions of the wafer. In one example, the de-skewing capabilityalgorithms are implemented in the operating software. In an embodiment,this machine vision capability is configured to automatically identifyspecific regions of samples as well as identify and catalog (record x-ycoordinates) of individual samples/test pieces and measure their size.

In another embodiment where testing is performed on materials or sampleshaving irregular surface features, the NTI software is configured toimage a portion of the sample surface (using, for example, an SPM, AFM,optical microscope, the optical instrument 610 or the like) and thenapply pattern recognition software to that image that enables the deviceto automatically identify structures having patterns that fall withincertain parameters. For example, where a user desires to performindentation testing on samples comprised of MEMS devices, and where theuser wants to tests specific features of said MEMS device, thosefeatures are identified by the pattern recognition software, thelocation of an acceptable test site is then calculated, and that featureis then automatically moved under the probe and the desired testingprotocols are applied.

Automated Tip Area Function—Calibration

As mentioned above in the discussion of the optional wafer chuck, anembodiment includes an automated software function that positions theindentation tip over an unused portion (un-indented) of a fused quartzsample or other suitable tip calibration material (e.g., a diagnosticsample 1106) and conducts an indent and/or performs a user-definablenumber of indents to automatically calculate an area function and usethis Tip Area Function (TAF or probe area function PAF) until the tip isreplaced or recalibration is needed as described herein.

Automated Tip Area Function—Indentation

As mentioned above in the discussion of the optional wafer chuck, anembodiment includes an automated software function, for instanceincorporated with the control station 110 or the electronics of thetransducer assembly 700 that periodically checks at user-definedintervals (after a preselected number of days or number of testingoperations (e.g., indents)) that the TAF is still accurate.

In another embodiment, a specific occurrence (for example the presenceof atypical or unexpected test data, such as force and displacementdata) initiates an automated TAF to determine whether the tip continuesto operate within specified acceptable parameters. For example,indentation tips are typically much harder than the samples they indent.Nevertheless, tips (even diamond tips) wear out. Where a series ofsamples are tested and the results of those tests are expected to yielddata that falls within certain parameters, and data is obtained thatdeparts from those parameters, that data may be a result of aproduction-line problem resulting in the creation of abnormal materialor, in the case of the semiconductor industry, damaged wafers. However,where the wafer itself is normal, the abnormal data could be due toexcessive wear of the tip, requiring the tip to be replaced. Verifyingthe TAF (e.g., conducing diagnostics) can potentially rule out tipfailure as a cause of abnormal data. Thus, if the material properties ofthe sample fall outside the user-definable specification range, the TAFis immediately checked before signaling that the process is producingunacceptable coatings (wafers, material and the like) and prompting aproduction line shut-down. Shutting down a product line in this manner(after checking the TAF) can save substantial cost by quicklyidentifying when that line is producing substandard products.

Automated Tip Shape Validation—Scratch

Similar to the TAF Calibration and the TAF Indentation, the system willincorporate an automated software function to calculate the radius ofcurvature of a scratch probe. Using a material of well known properties,a low-load indent is performed along with a calculation of the radius ofcurvature from a Hertzian fit. In one embodiment the system isconfigured to enable the customer to input the range of radii that areacceptable. Additionally, if the measurement provides a scratch resultoutside the acceptable level the instrument will check the radius ofcurvature before signaling a line shutdown.

Automated System Calibrations

In one example, the software provides the ability to automaticallyperform one or more of a periodic z-axis air calibration (e.g., a spacecalibration) or a tip-optics offset calibration (e.g., an H-patterncalibration, as described herein).

Automated Data Analysis

Immediately during and after each indentation test the software (e.g.,incorporated in one or more of the transducer electronics 708, thecontrol station 110 and the like) analyzes the force-displacement datameasured with the mechanical testing instrument 610 to output a hardnessand modulus (standard Oliver and Pharr analysis).

In an optional embodiment, the data (such as hardness and modulus data)is correlated to a specific sample or a specific set of samples. Usingthe semiconductor industry system as an example, the system correlatesthe test data to a specific wafer number, such that where a series ofwafers are being tested, a wafer can be later located for, for example,later inspection or further processing. In one embodiment, the sampleitself is assigned a unique number, such as a bar code or a number. Inanother embodiment, the sample itself is not marked, rather it iscontained in a known position in a material storage module, such as aspecified position in a FOUP corresponding to samples designated forfurther investigation.

Where the system is configured to conduct scratch testing, in oneexample, the software instructs that a scratch analysis is automaticallyperformed and automated to identify the critical load event. This isaccomplished by looking at the derivative of the measured parameters(normal displacement, lateral force, friction) and identifying a suddenchange. Due to the wide ranging critical load ‘signatures’, in anembodiment, the user will define a sensitivity parameter that triggersthe critical load reading. In another embodiment, there may be a numberof events (as in the case with certain multilayer films) where only thenth event is recorded.

Aggregate Data Storage and Analysis

In one optional embodiment, a spreadsheet like program is used with theresults of one or more tests and is saved to both the NTI computer, suchas the control station 110, as well as on a remote server location.Numerous other electronic storage options are possible.

In another optional embodiment, sets of test data are aggregated andsaid aggregations of data are thereafter compared to other aggregationsof data or to data from a specific test on a specific sample. By way ofexample and not of limitation, hardness and modulus data for a set of100 wafers tested in January 2012 may be compared to hardness andmodulus data of 100 wafers tested in February 2012, to determine whetherthey are A) substantially identical or whether B) the data so obtainedfrom any comparison contains unexplained deviations. By storinghistorical data and aggregating that date in such a way that it may beutilized to examine relative differences over time, the system 100 willenable the user to more readily identify errors that may be due tosubstandard material, a potential failure of a fabrication process,human error, substandard batches of raw materials, favorable orunfavorable changes in production methods or equipment, the relativeperformance and accuracy of worker shifts, etc. Thus, while datarelevant to a specific sample is valuable to the process, aggregate andmanaged data is a powerful tool, especially when compared to otheraggregate data gathered not only by the present system, but datagathered outside the system and reviewed in combination with the datagathered from the system 100.

Material Handling System Handshake

In some embodiments including embodiments employing a material handlingsystem, the system is configured with software to enable communicationbetween the material handling system (such as an EFEM robotic handlingsystem 200) and the NTI to establish, for example: when the instrumentenclosure is open, permitting access to the interior of the instrument;when to load a sample, such as a wafer, into the NTI; and when to unloada sample (e.g. one or more wafers) once testing is concluded. In anotherembodiment, the control station 110 includes software instructions andthe like that records what wafer is being tested, from where it wasobtained, and where it is deposited after testing.

Dynamic Testing Based on System Meeting Minimum Damping Requirements

Different kinds of tests have different tolerances for disturbance. Forexample, high load indentation testing tolerates a higher level ofvibration or other disturbance than low-load indentation testing. Thus,while all significant levels of vibration during nanomechanical testingare undesirable, testing may proceed and yield acceptably accurateresults so long as disturbance levels are maintained within acceptableparameters even in a production (e.g., manufacturing) setting.

In one embodiment, the system is equipped with one or more sensors thatdetect disturbances that negatively impact the operation of theinstrument. Where disturbances exceed a maximum threshold (optionallydictated by the user according to the test scenario performed, e.g.,with differing thresholds automatically applied for each test) theautomated testing assembly 100 is adaptive to automatically shut down,pause and/or suspend the test. The system 100 then resumes the test whensaid disturbances or other conditions are within acceptable limits. Thesensors include, but are not limited to, transducers, accelerometers,and the like. Similarly, where specialty environments are required fortesting, a wide variety of sensors can be employed to monitor, forexample, the status of temperature controlled environments, vacuumlevels, environmental issues (e.g., the presence or absence ofparticulate matter, vibration, humidity, and the like). When conditionsfall outside of acceptable parameters, the system initiates an action,such as suspension of testing, stopping testing, activating a lighttower, generating an error report, and the like.

Dynamic Testing

In some embodiments, the NTI (e.g., the automated testing assembly 100)is configured with multiple testing heads and indenter tips, imagingdevices, and testing modules. While in many embodiments a user will runone test across multiple samples, the present system may be configuredto run a variety of tests and generate additional data depending uponthe data obtained from those tests.

For example, where a user is conducting a series of tests on, forexample, MEMS devices or photovoltaic devices, and the data obtainedfrom a nanoindentation test or scratch tests yields data having certainparameters, the system may be configured to automatically and adaptivelyconduct additional testing on that sample before returning to thestandard testing routine. As one example, where a hardness measurementon a MEMS device yields what might be considered unexpected results, thesystem is configured to automatically reposition the sample using theX-Y stage or X-Y-Theta stage and relocate that sample and/or the testsite on that sample in order to obtain an AFM image of the site, (forexample) or an optical image for later analysis. In another example, thesystem 100 runs an additional series of tests on that sample as well,such as additional indentation tests, scratch tests, wear tests, modulusmapping or performs orthogonal testing techniques. Alternatively, thepresence of abnormal test results or even a series of abnormal testresults can trigger a tip diagnostic (on an aluminum or quartz block,such as the diagnostic samples 1106), tip replacement, or testing with atip having alternative geometry before resuming testing on subsequentsamples, for example.

Modulus Mapping

Modulus Mapping incorporates the quantitative measurements ofviscoelastic properties provided by nanoscale dynamic mechanicalanalysis with the in-situ imaging of testing instruments to yieldunprecedented capabilities in nanomechanical testing. This tool providesa modulus map of a surface from a single SPM scan, eliminating the needfor thousands of indents to characterize an area. Metallic oxide filmshave been investigated extensively due to their relevance in theelectronic, wear and corrosion fields. The metal/oxide interface iscrucial in a variety of technologically important applications,including contacts in microelectronics, metal/ceramic composites,photovoltaic devices, electrochemical cells and gas sensors. Thedetermination of the mechanical properties of these films is necessaryfor predicting the ability of the layer to survive in a realisticenvironment.

Because the thickness of these films can range from several nanometersto several microns, site specific characterization of the mechanicalproperties can be difficult. Modulus Mapping uses aspects of bothnanoDMAT™ and SPM imaging to create nanoscale maps enablingvisualization of both topographical and mechanical data of themetal/oxide interface.

Initial topographical data of the sample cross section enablesvisualization of (for example) the interface between the metal and theoxide film.

The increased complex modulus of the film implies that the layer may besuitable to act as a protective boundary over the metal surface which iscrucial for metals with high wear applications. The systems and methodsdescribed herein, in one example, are configured to modulus map one ormore samples through positioning and alignment of samples as describedabove, and nanomechanical testing of the mechanical properties of thesurfaces of the samples.

AUTOMATED TESTING ASSEMBLY

FIG. 1 shows one example of an automated testing assembly 100. As shownthe automated testing assembly 100 includes in the example a samplestorage and handling assembly 102. As shown in FIG. 1, the samplestorage and handling assembly 102 includes one or more storage modules104 and a sample handling module 106 coupled with an automated testingenclosure 108. As further shown in FIG. 1, the control station 110 iscoupled with the automated testing enclosure 108. In still anotherexample, the automated testing assembly 100 includes a control station110 positioned remotely relative to the other components of theautomated testing assembly 100, for instance, within a control room at aremote location and the like.

Referring again to FIG. 1, the sample storage and handling assembly 102is shown as including a storage module 104. In the example shown in FIG.1, the sample storage and handling assembly 102 includes a plurality ofstorage modules 104 coupled with the sample handling module 106. In oneexample, the storage modules 104 include but are not limited to frontopen unit pods (FOUP) sized and shaped to contain a plurality ofsemi-conductor wafers therein. When loaded into the sample handlingmodule 106, the plurality of storage modules 104 provide a plurality ofsamples such as semi-conductor wafers for access by the handling module106 and corresponding loading of the samples within the automatedtesting enclosure 108 for mechanical testing as described herein.

In another example, the sample handling module 106 includes but is notlimited to an equipment front end module (EFEM) configured to manipulatesamples in the storage modules 104 and position the samples within theautomated testing enclosure 108 for mechanical testing.

The control station 110 as previously described is, in one example,coupled with the automated testing enclosure 108 of the automatedtesting assembly 100. Optionally, as also previously described thecontrol station 110 is remote relative to the other components of theautomated testing assembly 100. The control station 110, in one example,includes a series of controls, user interfaces, output devices such asmonitors, printers and the like configured to assist the user inmonitoring, controlling, observing test parameters, diagnosticcharacteristics and testing scenarios for the automated testing assembly100. In still another example, the control station 110 is configured toassist the user in developing and implementing various testing scenariosfor the samples contained in the sample storage modules 104.

Referring now to FIG. 2, the sample storage and handling assembly 102 isshown in an exploded view. As shown, the plurality of storage modules104 are positioned away from the sample handling module 106. The samplehandling module 106 includes storage module loading racks 204 sized andshaped to receive the storage modules 104 (e.g., FOUP) thereon. Thesample handling module 106 is further shown with a robotic handlingsystem 200 at least partially presented outside of the sample handlingmodule 106. As shown in FIG. 2, the robotic handling system 200 includesa sample 202, such as a semi-conductor wafer presented thereon, forpositioning within the automated testing enclosure 108 for mechanicaltesting as described herein.

FIGS. 3A and 3B show different examples of storage modules sized andshaped for containing a plurality of samples therein for testing withthe automated testing assembly, such as the assembly 100 shown inFIG. 1. Referring first to FIG. 3A, the storage module 104 previouslyshown in FIGS. 1 and 2 is provided in an open configuration with aplurality of samples 302 positioned outside of a storage module case300. In one example the sample 202, such as the semi-conductor wafer, isshown positioned away from the plurality of samples 302. As shown inFIG. 3A, in another example, the plurality of samples 302 are arrangedin a stacked configuration and thereafter positioned within the storagemodule case 300 for storage and eventual retrieval by the robotichandling system 200 shown in FIG. 2. In yet another example, the storagemodule case 300 is specifically designed for fitting on or within thestorage module loading rack 204 shown in FIG. 2. The storage module case300, in one example, includes a port configured for opening by thesample handling module 106 to provide access to the plurality of samples302 therein by the robotic handling system 200.

FIG. 3B shows another example of a sample module 308. As shown, thesample module 308 includes a sample module tray 312 sized and shaped tocontain a plurality of samples 310 thereon. In one example, theplurality of samples 310 include but are not limited to biologicalsamples, material samples and the like. Each of the samples 310 arepositioned in a specified orientation on the sample module 312. Forinstance, the sample module tray 312 includes a plurality of recesses,ridges, cups, partitions and the like sized and shaped to receive thesamples 310 therein and organize the samples on the sample module tray312 for easy access by handling systems such as the robotic handlingsystem 200 shown in FIG. 2. In one example, the samples 310 are arrangedin a 2:3 ratio of samples, for instance, in the example shown in FIG. 3Bin the samples 310 are arranged in a configuration of 8:12.

FIG. 4A shows one example of the sample handling module 106 from a topview. The sample handling module 106 includes the robotic handlingsystem 200 previously described and shown in FIG. 2. The robotichandling system 200 is shown in two separate orientations. A firststored position orientation 408 is shown in FIG. 4A with the robotichandling system 200 coupled with a sample 202, for instance, at thestorage module loading rack 204 corresponding to the storage module 104.The robotic handling system 200 is further shown in a loaded position410 with the sample 202 in a configuration for positioning on a stage,for instance, a stage of the automated testing system as describedherein.

As shown in FIG. 4A, the robotic handling system 200 includes a roboticbase 400 and an articulating arm 402 extending from the robotic base400. Further, in the examples shown, the articulating arm 402 includesone or more handling forks 404 sized and shaped to engage, lift andmanipulate one or more samples 202 as shown in FIG. 4A. The articulatingarm 402 is sized and shaped to move within the sample handling module106 to readily position the sample 202 in the loaded position 410 bymanipulating the articulating arm 402 through the access window 406.Similarly, the articulating arm 402 of the robotic handling system 200is configured to retrieve the sample 202 from the automated testingsystem and reposition the sample 202 in the stored position 408, forinstance, the storage module 104 (e.g., FOUP).

As described herein, the sample storage handling assembly 102 includingthe storage modules 104 and the sample handling module 106 as well asthe automated testing system within the automated testing enclosure 108shown in FIG. 1 are provided to efficiently and rapidly test theplurality of sample locations on the plurality of samples containedwithin the storage modules 104. The automated testing assembly 100automatically and with minimal use or interaction is configured to carryout a plurality of testing scenarios with the samples 202 and therebymechanically generate measurements and corresponding data for mechanicalparameters of the materials of the samples 202.

Referring again to FIG. 4A, in one example, the sample handling module106 includes a pre-aligner 412 as shown in FIG. 4A. In one example, thepre-aligner 412 pre-aligns the sample, such as the sample 202 (e.g., asemiconductor wafer), for eventual positioning within the automatedtesting assembly 100, for instance, the automated testing systemdescribed herein. That is to say the pre-aligner 412 is positioned in anintermediate position between the stored positioned 408 and the loadedposition 410 shown in FIG. 4A. For instance, the pre-aligner 412 ispositioned in a separate bay or within the enclosure of the samplehandling module 106. The pre-aligner 412 engages with the sample 202after withdrawal of the handling forks 404 to substantially prealign thesample 202 for aligned or substantially aligned positioning of thesample 202 in the loaded position 410 within the automated testingenclosure 108.

Referring now to FIG. 4B, one example, of a pre-aligner 412 is provided.In the example shown the pre-aligner 412 includes a pre-aligner stage414, for instance, including a plurality of feet 416 extending away froma central portion of the pre-aligner stage 414. In one example, thepre-aligner stage 414 is operable to couple with and grasp a sample suchas the sample 202 with the feet 416. The pre-aligner stage 414 isthereafter configured to rotate or translate (e.g., one or more) thesample 202 on the pre-aligner stage 414 relative to the alignment sensor418. In one example, the alignment sensor 418 is configured to detectone or more indexing features on the sample 202, for instance, a notchin the sample 202. The indexing of the notch 202 allows for theprealignment of the sample 202 relative to the automated testing systemcontained within the automated testing enclosure 108. Stated another waythe pre-aligner 412 prealigns the sample 202 for accurate positioning ofthe sample 202 for instance with the indexing features such as the notchin a desired orientation on the sample stage of the automated testingsystem contained within the automated testing enclosure 108.

After prealignment the articulating arm 402 including the handling forks404 retrieves the sample 202 from the pre-aligner 412 and positions theprealigned sample in the loaded position 410 shown in FIG. 4A. In thisorientation, the articulating arm releases the prealigned wafer onto thestage with the indexing feature such as the notch positioned as desiredby the pre-aligner with only modest misalignment between the testingsystem stage and the sample 202. As described herein, the automatedtesting assembly 100 thereafter performs one or more of translationaland rotational deskewing to ensure the accurate positioning of testinglocations for testing by the mechanical testing instrument relative tothe indexing feature. The testing system of the automated testingassembly 100 thereafter uses the sample stage 614 to position the sampleso the desired testing location is positioned beneath the mechanicaltesting instrument 612 (or optical instrument 610) of the automatedtesting system.

Overview of the Automated Testing Method Using the Automated TestingAssembly

FIG. 5 shows one example of a method 500. The method 500 is conductedwith the automated testing assembly 100 previously shown in FIG. 1 tomechanically test one or more of a plurality of samples or a pluralityof test locations on a sample. In describing the method 500, referenceis made to features and elements previously described herein includingnumbered references where convenient. The numbered elements providedwithin the description of the method 500 are not intended to belimiting. Instead numbered references are provided for convenience andfurther include any similar features described herein as well as theirequivalents. At 502, the method 500 begins with the automated testingassembly 100 shown substantially in the configuration provided inFIG. 1. Stated another way, the sample storage handling assembly 102 iscoupled with one or more storage modules 104 containing one or moresamples 202 therein. The sample handling module 106 of the samplestorage and handling system 102 is coupled with the automated testingenclosure 108 including the automated testing system therein. Thecontrol station 110 is further coupled with the automated testingenclosure 108. As previously described herein, control station 110, inone example, is remotely positioned and coupled with the automatedtesting enclosure 108, for instance, within a control room on a remotework site and the like.

At 504, a robotic arm automatically retrieves a sample from one of thestorage modules 104. For instance, the articulating arm 402 includingthe handling forks 404 shown in FIG. 4A retrieves a sample from thestorage module 104. At 506, the articulating arm 402 of the robotichandling system 200 places the sample on an optional pre-aligner module412 as shown in FIG. 4A. At 508, the robotic handling system 200, forinstance, the articulating arm 402 and the handling forks 404 places thesample 202 on a stage of the automated tested assembly 100 (forinstance, a sample stage 614 shown in FIGS. 6A and 6B and describedhereinbelow).

In another example, the method 500 further includes at 510 performingpattern recognition algorithms that deskew the sample 202 orientationrelative to one or more of the sample stage and the automated testingsystem. For instance, the sample 202, in one example, is positioned in asubstantially aligned configuration with the sample stage and themechanical testing instruments of the automated testing enclosure 108shown in FIG. 1. Some misalignment occurs between the sample 202 and theinstruments or the sample stage. The pattern recognition algorithmsdeskew the orientation of the sample relative to one or more of thesample stage and the mechanical testing instrument to ensure accuratepositioning of testing locations of the sample 202 relative to themechanical testing instrument. Optionally, at 512 a supplementalinstrument such as a scanning probe microscope (or the opticalinstrument 610) coupled with the automated testing system, for instance,adjacent to the mechanical testing instrument images the sample toidentify test positions over the surface area of the sample 202.

At 514, the mechanical testing instrument, for instance, a probe ispositioned over one or more desired testing locations, for instance, ona semi-conductor wafer the probe of the mechanical testing instrument ispositioned over four or more separate locations of the sample accordingto indexing of the position through the pattern recognition deskewingoperation and relative to the position of the indexing feature (notch)of the sample 202. At 516, the mechanical testing instrument is operatedto acquire mechanical measurements of the sample 202, for instance, togenerate one or more mechanical parameter measurements of the sample 202with mechanical testing at one or more of the testing locations.

At 518, one or more of the measurements and the parameters generatedfrom the measurements are displayed, for instance, at the controlstation 110 shown in FIG. 1. In another example, at 518, the resultsincluding the measurements and generated mechanical parameters arestored by the control station 110 or are instructed for storage by thecontrol station 110 for instance at an offsite network memory location.At 520, the mechanical testing instrument is disengaged from the sample202 to allow for withdrawal of the sample 202 from the automated testingenclosure 108 and positioning in the storage module 104. At 522, therobotic handling system 200 engages the sample 202 and repositions thesample from the loaded position 410 shown in FIG. 4A to the storedposition 408 shown in FIG. 4A within one of the storage modules 104.

Automated Testing System

Referring now to FIGS. 6A and 6B, one example of an automated testingsystem 600, for instance, for positioning within the automated testingassembly 100 shown in FIG. 1 is provided. As shown the automated testingsystem 600 includes a granite base 602 positioned on a system supporttable 604. In one example, the system support table 604 provides aframework underneath the granite base 602. For instance, the systemsupport table 604 underlies the granite base 602 to provide a compactfootprint for the overall automated testing system 600, for instance,within the automated testing assembly 100. A cantilevered instrumentcolumn 606 extends from the granite base 602 partially over a samplestage surface 616. The cantilevered instrument column 606 includes acolumn base 605 and a cantilevered arm 607. In one example, thecantilevered instrument column 606 includes one or more instrumentstages 608 sized and shaped to receive and position the plurality ofinstruments relative to the sample stage surface 616. For instance, asshown in FIG. 6A the cantilevered instrument column 606 includes twoinstrument stages 608. As shown, one of the instrument stages 608includes an optical instrument 610 and a mechanical testing instrument612. In other examples as described herein, one or more of theinstrument stages 608 includes a plurality of instruments including anoptical instrument 610 and a mechanical testing instrument 612. In otherexamples, as described herein one or more of the instrument stages 608includes a plurality of instruments including an optical instrument 610,mechanical testing instrument 612 and another mechanical testinginstrument such as high load mechanical testing instrument configured toprovide indentation, scratches and the like at high force loads relativeto the mechanical testing instruments 612. As described herein, themechanical testing instrument 612 are configured to perform mechanicaltesting at micron (e.g., one or more microns) or nano scales on samplespositioned on the sample stage surface 616. For instance, the mechanicaltesting instruments 612 are configured to provide one or more ofindentation, scratching and the like upon samples positioned on thesample stage surface 616. Optionally, one or both of the mechanicaltesting instruments 612 and the optical instrument 610 include, but arenot limited to, probes, probes having a Berkovich geometry tip,microscopes, electron guns, imagers, atomic force microscopes,manipulators or other instruments configured to ascertain physical ormechanical properties of a sample.

Referring again to FIG. 6A, the sample stage 614 is shown including thesample stage surface 616. As shown beneath the sample stage 614 a stageactuator assembly 618 is provided. In one example, the stage actuatorassembly 618 is configured to move the sample stage 614 along or arounda plurality of axis. The stage actuator assembly 618 is configured tomove the sample stage surface 616 in one or more of the x and y axis. Instill another example, the stage actuator assembly 618 is configured tomove sample stage surface 616 rotationally, for instance, around the zaxis (e.g., the stage actuator assembly is configured to providerotational or theta movement). As shown, for instance, in FIG. 6A in oneexample the stage actuator assembly 618 includes a plurality of stageseach comprising separate actuators configured to actuate the samplestage surface 616 into a variety of orientations to facilitate thepositioning of substantially any testing location on sample stagesurface 616 beneath the mechanical testing instrument 612 and theoptical instrument 610 coupled with the instrument stage 608. Forinstance, the stage actuator assembly 618 includes in one example anx-stage 620. The x-stage 620 facilitates the movement of the samplestage surface 616 in a left to right direction relative to the view ofthe automated testing system 600 shown in FIG. 6A. In another example,the stage actuator assembly 618 includes a y-stage 622 coupled with thex-stage 620. In contrast to the x-stage, the y-stage 622 is configuredto provide movement to to the sample stage surface 616 in a directionsubstantially orthogonal to the x-axis of the x-stage 620. For instance,the y-stage 622 is configured to move the sample stage surface 616 intoand out of the page of the view shown in FIG. 6A. In still anotherexample, the stage actuator assembly 618 includes a rotational actuatorsuch as a rotational stage 624 coupled with one or more of the x-stageand the y-stage 620, 622. In one example the rotational stage 624provides full rotational movement of the sample stage surface 616, forinstance, rotational movement through a full 360°. In another example,the rotational stage 624 provides a smaller degree of rotationalmovement such as a range of movement from 0 to 270° or from 0 to 180° orfrom 0 to 90° and the like. As will be described in further detail belowthe provision of multiple actuators, for instance, the x-, y- androtational stages 620, 622, 624 facilitates positioning of substantiallyany location on the sample stage surface 616 and a sample overlying thesample stage surface 616 (e.g., the sample stage 614) underneath theplurality of instruments coupled with the instrument stage 608 (e.g.,the optical instrument 610 and the mechanical testing instrument 612).

Each of the components of automated testing assembly including theautomated testing system 600 are constructed with a variety of materialsaccording to the testing methods appropriate for the system. Forinstance, materials including, but not limited to, ceramics, steels(tool and stainless steels), aluminum, other metals, composites,polymers and the like are used in one or more of the mechanical andoptical instruments 612, 610, the sample stage 614, and the like. One ormore of the components of the instruments, stage and the like (e.g.,probe tips, shafts, housings and the like) may include alloys, such asinvar, quartz, diamond, sapphire and other similar materials havingpredictable mechanical characteristics, including one or more of highhardness, low coefficients of thermal expansion and low thermalconductivities.

The instrument stage 608, the optical instrument 610 and the mechanicaltesting instrument 612 have a limited footprint relative to theautomated testing system 600. For instance, the cantilevered instrumentcolumn 606 positions the optical and mechanical testing instruments 610,612 over a substantially limited portion of the sample stage surface616. In one example, the footprint of the optical and mechanical testinginstrument 610, 612 is substantially minimal to the overall footprint ofthe sample stage surface 616. The stage actuator assembly 618 includingthe x-, y- and rotational stages 620, 622, 624 facilitates the movementof the sample stage surface 616, for instance, any location on thesample stage surface 616 to a position underneath the mechanical andoptical testing instruments 612, 610 respectively. Stated another way,the mechanical and optical instruments 610, 612 are maintained in asubstantially small footprint according to the limited cantilever of thecantilevered instrument column 606, and the sample on the sample stagesurface 616 (e.g., a semiconductor wafer, other sample or the like) isrotated, translated, and the like to position substantially any testinglocation on the sample underneath the instruments 610, 612. Thecantilevered instrument column 606 is thereby able to provide a stiff,solid support to the mechanical and optical testing instruments 610, 612to provide reliable and accurate measurements of mechanical parametersof the sample tested by the mechanical and optical testing instruments612, 610. Stated another way, large arch-type supports as opposed to thecantilevered instrument column 606, are substantially avoided throughthe use of a sample stage surface 616 as a component of the sample stage614 where the stage actuator assembly 618 is configured to substantiallymove any testing location beneath the mechanical testing instrument 612and the optical instrument 610 for testing. The automated testing system600 thereby has a minimal footprint and can readily fit on a factoryfloor between other components, for instance, in a semiconductorproduction facility.

FIG. 6B shows a detailed view of the automated testing system 600previously shown in FIG. 6A. As shown, the instrument stages 608 areprovided on the cantilevered instrument column 606. In one example, theinstrument stages 608 are provided with corresponding instrumentactuators 626. In one example the instrument actuators 626 areconfigured to provide movement of the instruments such as the opticalinstrument 610 and the mechanical testing instrument 612 along an axissuch as the z-axis relative to the sample stage surface 616 and a samplepositioned thereon. In one example, the instrument actuator 626 includesin one example, but is not limited to, one or more screw drivesconfigured to move part of the instrument stage 608 relative to thecantilevered instrument column 606. In one example, the instrumentactuators 626 provide gross positioning of the mechanical and opticalinstruments 612, 610 relative to a sample on the sample stage surface616. Optionally, the instrument actuators 626 include one or moreactuators configured to provide one or more of X, Y and Z axes ofmovement and positioning of the instruments 610, 612 (e.g.,orthogonally, parallel to the stage 614 and the like).

In still another example, the instrument actuators 626 work in concertwith a transducer, for instance, within the mechanical testinginstrument 612. For instance, the instrument actuator 626 provide anindentation or scratching force for an instrument probe of themechanical testing instrument 612. The transducer within the mechanicaltesting instrument 612 is then solely relied upon to measure forces,indentation depths, and the like of the probe relative to the sample onthe sample stage surface 616. Optionally, the instrument actuators 626provide multiple degrees of translational movement (e.g., movement alongthe x, y and z axes) for the instruments coupled thereon.

As further shown in FIG. 6B, the sample stage 614 includes a stagereceptacle flange 630 with the sample stage surface 616. Optionally, thestage receptacle flange 630 is integral to the sample stage surface 616(and when referring to the sample stage surface 616 in one example thealignment of the surface with an instrument includes alignment of flange630 with the instrument). For instance as shown in FIG. 6B, the stagereceptacle flange 630 extends along a portion of the perimeter of thesample stage surface 616. The stage receptacle flange 630 includes atleast one stage receptacle 628. As will be described in further detailbelow, in one example, the stage receptacle flange 630 includes aplurality of stage receptacles 628. The stage receptacles 628 are sizedand shaped to receive one or more of diagnostic samples, probe changeunits, and the like configured to automate the diagnostics andcalibration of probes and the exchange and installation of instrumentprobes within the mechanical testing instruments 612.

As further shown in FIG. 6B, the sample stage surface 616 includes aplurality of vacuum ports 632. The vacuum ports 632 are configured toprovide a vacuum underneath a sample position on the sample stagesurface 616. In the example shown in FIG. 6B, the vacuum ports 632 formconcentric circles within the sample stage surface 616. The vacuum ports632 are thereby able to retain a plurality of samples having differentsizes on the sample stage surface 616. In yet another example, thevacuum ports 632 are formed by a plurality of orifices, for instance pinholes, in the sample stage surface 616. In such an example the vacuumports 632 are readily able to vacuum and thereby retain a sample havingan irregular shape (e.g., non-circular, elongate and the like) on thesample stage surface 616. In still another example, the sample stage 614includes a plurality of elevation pins 634 positioned around the samplestage surface 616. The elevation pins 634 are operable to provide anelevated support base for a sample such as a semiconductor waferpositioned over the sample stage surface 616. For instance, when asemiconductor wafer is positioned over the sample stage 614, an elongatemember may be positioned underneath the sample to hold the sample as itis positioned. The plurality of elevation pins 634 allow for positioningof the sample over the sample stage surface 616 while allowing theinterposing of the elements, such as a robotic arm, between the samplestage surface 616 and the sample. After positioning of the sample on thesample stage surface 616, for instance on the elevated elevation pins634, the robotic arm is removed and the elevation pins 634 are depressedto allow setting of the sample upon the sample stage surface 616.Thereafter, the vacuum port 632 are operated to hold the sample on thesample stage surface 616 while the stage actuator assembly 618 isoperated to position the sample as desired relative to the mechanicaltesting instrument 612, for instance to position the instrument over aplurality of designated testing locations on the sample.

Mechanical Testing Instrument

FIGS. 7A and 7B show one example of mechanical testing instrument 612coupled with the instrument stage 608. As previously described in oneexample, the mechanical testing instrument 612 is positioned adjacent toan optical instrument 610 coupled with the same instrument stage 608. Inanother example, the positioning of the optical instrument 610 relativeto the mechanical testing instrument 612 is fixed. For instance, where atesting location is identified with the optical testing instrument 610,a fixed specified distance between the optical instrument 610 and theinstrument probe 702 (e.g., an instrument offset) allows for the readypositioning of the sample stage surface 616 and the testing locationbeneath the mechanical testing instrument.

Referring again to FIGS. 7A and 7B, the mechanical testing instrument612, in one example, includes a transducer assembly 700 positionedadjacent to an instrument probe 702. In another example, the mechanicaltesting instrument includes an actuator 704. For instance, the actuator704 includes but is not limited to a piezo actuator configured to movethe instrument probe 702 along one or more axes such as the x-, y- orz-axis. The actuator 704 cooperates with one or more of the instrumentsstages 608 and the stage actuator assembly 618 to position themechanical testing instrument 612 as needed over the sample on thesample stage surface 616. In one example, the actuator 704 providesgross positioning of the instrument probe 702 relative to the sample onthe sample stage surface 616. The transducer assembly 700 in anotherexample provides the movement and forces necessary to operate theinstrument probes 702 in testing schemes including scratching andindentation while the instrument probe 702 is engaged with the sample onthe sample stage surface 616. Optionally, the actuator 704 works inconcert with the instrument probes 702 and the transducer assembly 700.For instance, the actuator 704 provides the indentation or scratchingforces for the instrument probe 702 and the transducer assembly 700provides measurement and sensing of the movement of the instrument probe702 and the forces incident on the probe. The instrument probe 702 andthe transducer assembly 700 thereby operate in a passive orsubstantially passive configuration while the actuator 704 provides theoperating forces, displacement and the like. Optionally, the instrumentprobe 702 includes one or more instrument features, including, but notlimited to tips having specified shapes and materials according to thetesting schemes and samples tested (e.g., Berkovich geometry tips,conical geometry tips, diamond tips, quartz tips, composite tips, alloytips, doped tips and the like).

Referring again to FIG. 7A, in one example, actuator electronics 706 areprovided at one end of the actuator 704. In one example, the actuatorelectronics 706 include controls, circuit boards, memory, wiring and thelike configured to operate the actuator 704. In another example,transducer electronics 708 are positioned adjacent or remote to thetransducer assembly 700. As shown in FIG. 7A, the transducer electronics708 are positioned outside the transducer assembly 700 but in electricalcommunication with the transducer assembly. Referring to FIG. 7B, aplurality of transducer electronic units 708 are positioned on eitherside of the transducer assembly 700. In one example, the transducerelectronics 708 provide control modules, measurement modules andoperation modules for the transducer assembly 700. In another example,wiring and the like are fed through the actuator 704 and the actuatorelectronics area 706 to provide electrical coupling of the mechanicaltesting instrument 612 with controls such as the control station 110shown in FIG. 1. In a similar manner the electronics of the opticalinstrument 610 are similarly electrically coupled with the controlstation 110. In yet another example, each of the optical and mechanicaltesting instruments 610, 612 are coupled with the control stationthrough one or more of IR, wireless, Bluetooth and related non-wiredsystems.

Referring now to FIG. 7C, one schematic example of the transducerassembly 700 shown in FIGS. 7A and 7B is provided. The transducerassembly 700 shown in FIG. 7C includes a capacitor assembly 710including opposed plates 714 positioned around a center plate 712. Asshown in the diagram the center plate 712 is movable relative to theopposed plates 714. For instance, the center plate 712 is coupled withthe remainder of the capacitor assembly 710 with one or more springsupports 715. The application of a voltage across the opposed plates 714operates the center plate 712 to move the instrument probe 702 forindentation (e.g., along the z-axis) or translation (e.g., along the x-and y-axes). Similarly, movement of the center plate 712 relative theopposed plate 714 is measurable according to changes in capacitance,changes in the voltage across the opposed plates 714 and the like.Measurement of the change in capacitance and change in voltage isreadily associated with the change in position of the instrument probe702. From these measurements forces incidents on the instrument probe702 as well as movement of the instrument probe 702 are readilydetermined with precision.

Referring now to the instrument probe 702, the instrument probe 702includes a probe surface 716 coupled with a probe base 718. In oneexample, the probe base 718 includes a probe coupling feature 720 suchas a threaded hole. The center plate 712, in one example includes aprobe receptacle 722 sized and shaped to receive the probe base 718. Inone example the probe receptacle 722 includes a threaded projectionsized and shaped to couple with the probe coupling feature 720 of theprobe base 728. For instance, with rotation of the probe base 718 theprobe coupling features 720 receive and engage with the elongatedprojection of the probe receptacle 722 to securely fasten the instrumentprobe 702 to the center plate 712 of the capacitor assembly 710.

In one example, the capacitor assembly 710 operates in an electrostaticmanner to move the center plate 712 relative to the opposed plates 714.For instance, the opposed plates 714 provide an electrostatic force tothe center plate 712 that provides one or more of indentation orscratching movement of the instrument probe 702 relative to a sample,for instance, coupled on the sample stage surface 616 as shown in FIGS.6A and 6B.

As previously described in some examples, the actuator, such as theactuator 704 or instrument actuator 608, provides movement includingscratching movement, indentation movement or the like with theinstrument probe 702 relative to the sample. The capacitor assembly 710is used in this passive or substantially passive manner to measure themovement of the instrument probe 702 relative to the opposed plates 714(e.g., by movement of the center plate 712). For example, in a passivemode the center plate 712 is held between the opposed plates 714 withthe spring support 715. As the actuator 626 or 704 moves the instrumentprobe 702, for instance indenting the instrument probe 702 or scratchingthe instrument probe 702 across or into a sample, the deflection of thecenter plate 712 relative to the opposed plates 714 is measured tothereby determine the force incident on the instrument probe 702 as wellas its movement.

In yet another example, the center plate 712 is held at a substantiallystatic position relative to the opposed plates 714 with an electrostaticforce. In this example, one or more of the actuators 704, 626 areoperated to move the instrument probe 702, for instance indenting orscratching the instrument probe 702 into or along a sample, and thevoltage required to maintain the center plate 712 in position relativeto the opposed plates 714 is measured to determine the force incident onthe instrument probe 702 corresponding to the force applied to thesample. The movement of the actuator 704 or 626 is used tocorrespondingly measure the movement of the instrument probe 702 wherethe instrument probe 702 is otherwise statically maintained relative tothe opposed plates 704 (e.g., where the instrument probe 702 is coupledwith the center plate 712).

FIG. 8 shows another example of an instrument stage 800. In the exampleshown, the instrument stage 800 includes a plurality of instrumentsincluding the optical instrument 610 and the mechanical testinginstrument 612 previously shown in FIGS. 6A and 6B. In the example shownin FIG. 8, the instrument stage 800 further includes a high loadmechanical testing instrument 802. The high load mechanical testinginstrument 802 includes a high load instrument probe 804 movably coupledwithin the high load mechanical testing instrument 802. In someexamples, the high load mechanical testing instrument 802 includes amore robust capacitor assembly 710 and the high load instrument probe804 to facilitate the application of higher forces to the samplepositioned on the sample stage surface 616. The high load mechanicaltesting instrument 802 in combination with the mechanical testinginstrument 612 is thereby able to provide a full suite of operationalforces and the like to samples present on the sample stage surface 616without requiring the exchange of instruments on the instrument stage800. For example, the high load mechanical testing instrument 802 isconfigured to provide higher forces (e.g., up to around 10 N or more)relative to the forces provided by the lower force mechanical testinginstrument 612 (e.g., up to around 10 micro N). As previously describedwith regard to the mechanical testing instrument 612 relative to theoptical instrument 610, in one example the high load mechanical testinginstrument 802, for instance its high load instrument probe 804, has aset specified position relative to the optical instrument 610. Byproviding a set distance (e.g., instrument offset) between the high loadinstrument probe 804 and the optical instrument 610 the high loadmechanical testing instrument 802 is accurately and precisely positionedat a testing site location observed with the optical instrument 610.

Cantilevered Instrument Column and a Translational and Rotational Stagefor Use with the Same

FIG. 9 shows a side perspective view of the automated testing system 600previously shown and described in FIGS. 6A and 6B. The view shown inFIG. 9 shows the relative position of the optical and mechanical testinginstruments 610, 612 when coupled with the cantilevered instrumentcolumn 606 relative to the sample stage 614 including the sample stagesurface 616. As shown, the cantilevered instrument column positions theinstruments 610, 612 at an instrument-column length 902 over top of thesample stage surface 616. The sample stage surface 616 has a stagesurface length 900 substantially larger than the instrument-columnlength 902. The sample stage 614 including the sample stage surface 616is moved to provide access to each of the locations on the sample stagesurface 616 with the stage actuator assembly 618 previously describedherein. As previously described, in one example the stage actuatorassembly 618 includes a plurality of stages, for instance an x-stage, ay-stage and a rotational stage 620, 622, 624, configured to position thesample stage surface 616 so that substantially any location on thesample stage surface 616 as well as any of the stage receptacles 628 onthe stage receptacle flange 630 are capable of being positionedunderneath one or more of the instruments such as the optical instrument610 and the mechanical testing instrument 612.

In one example the instruments 610, 612 have a limited footprint such asan instrument footprint 906 shown in broken lines in FIG. 9. Forinstance, the instruments 610, 612, such as the optical and mechanicalinstruments, are configured to overlie an area of the sample stagesurface 616 (e.g., the instrument footprint) according to theircantilevered position provided by the cantilevered instrument column606. Stated another way, the limited instrument-column length 902 shownin FIG. 9 correspondingly constrains the position of the optical andmechanical testing instruments 610, 612 to the instrument footprint 906shown in FIG. 9. The constrained positioning of the optical andmechanical testing instruments 610, 612 according to the cantileveredinstrument column 606 provides a robust structurally supported base forthe mechanical testing instrument 612 to substantially minimizemechanical noise in the mechanical testing instrument 612 duringoperation including indentation, scratching and measurement ofscratching and indentation forces and indentation depth by themechanical testing instrument 612. As shown, the cantilevered instrumentcolumn 606 provides a constrained instrument-column length 902 tominimize any deflection of the cantilevered instrument column extendingover the sample stage surface 616.

The stage actuator assembly 618 in combination with the sample stage 614having the sample stage surface 616 provides the flexibility to thesample stage surface 616 needed to position substantially any locationon the sample stage surface 616 under any one of the optical ormechanical testing instruments 610, 612. Additionally, the stageactuator assembly 618 (e.g. configured for to translation along x- andy-axes as well as rotation about the z-axis or theta rotation) isconfigured to position a plurality of the stage receptacles 628 and thestage receptacle flange 630 under the mechanical testing instrument 612.That is to say, with a combination of one or more of X and Y translationalong with rotation of the sample stage surface 616 for instance withthe x-stage, the y-stage and the rotational stage 620, 622, 624substantially any location on the sample stage surface 616 is configuredfor positioning within the constrained instrument footprint 906 shown inFIG. 9. With this configuration a cantilevered instrument column 606provides a relatively short cantilevered extension for the instrumentsover top of the sample stage surface 616 without otherwise requiring acorresponding duplicated column, such as an arch positioned on theopposed side of the cantilevered instrument column 606 shown in FIG. 9.The provision of a second column such as the column 606 shown in FIG. 9to provide an arch would greatly increase the overall footprint of theautomated testing system 600 and thereby the corresponding footprint ofthe automated testing assembly 100 shown in FIG. 1. In contrast, theautomated testing system 600 shown in FIG. 9 has a compact footprintprovided by the compact cantilevered instrument column 606 used incombination with the stage actuator assembly 618 configured for one ormore of X, Y and rotational movement as described herein.

In one example, the x-stage 620 of the stage actuator assembly 618 isconfigured to have a greater range of movement relative to the range ofmovement of the y-stage 622. Stated another way, the sample stage 614 isconfigured to move into and out of the page as shown in FIG. 9 to agreater degree as opposed to transverse movement (e.g., along they-axis) of the sample stage 614, for instance to the left and the rightof the page shown in FIG. 9. By constraining the movement of the samplestage surface 616 to a large degree along the x-axis of the x-stage 620the footprint in the direction transverse to the x-axis (e.g., along they-axis of the y-stage 622) is substantially minimized. The correspondingfootprint of the automated testing system 600 is thereby furtherminimized to substantially limit the translation of the sample stagesurface 616 to the left or right of the page shown in FIG. 9. Theautomated testing system is fully contained within the automated testingassembly 100 shown in FIG. 1 without requiring a larger enclosureotherwise needed with a sample stage 614 configured to move extensivelyalong the y-axis with the y-stage 622 (e.g., to a similar degree to thex-stage range of translation).

In one example, the rotational stage (a theta stage) 624 provides addedflexibility needed to substantially move any position on the samplestage surface 616 normally positioned by a y-stage having a greaterrange of motion. That is to say, the rotational stage 624 provides anadditional degree of freedom to the stage actuator assembly 618 thatminimizes the need for a large translational range for the y-stage 622.

Sample Stage Surface

FIGS. 10A and 10B show one example of the sample stage surface 616previously described and shown in FIGS. 6A and 6B. For instance, thesample stage surface 616 includes a plurality of vacuum port 632 shownin concentric rings in FIGS. 10A and 10B. As previously described, thesample stage 614 further includes a plurality of elevation pins 634sized and shaped to provide a support surface for a sample positioned onthe sample stage surface 616 prior to retention for instance by thevacuum ports 632. That is to say, the elevation pins 634 provide anelevated resting surface for the sample to allow the interpositioning ofa handling object such as a robotic arm between the sample stage surface616 and the sample prior to fixing of the sample along the sample stagesurface 616. The elevated pins shown in FIG. 10A allow the handlingfeature such as the robotic arm to position the sample and thereaftermove from between the sample stage surface 616 and the sample withoutdisturbing the sample's position or the sample stage surface 616. Afterdisengagement and removal of the handling feature, such as the roboticarm, the elevation pins 634 are depressed as shown in FIG. 10B and theplurality of vacuum port 632 are operated to fix the sample to thesample stage 614 to allow for positioning of one or more testinglocations relative to the instruments such as the optical and mechanicaltesting instruments 610, 612 shown in FIGS. 6A and 6B without relativemovement between the stage 614 and the sample.

Probe Change Assembly

FIGS. 11A and 11B show portions of the automated testing 600 previouslyshown in FIGS. 6A and 6B. In FIGS. 11A and 11B the components of a probechange assembly 1100 are provided. The probe change assembly 1100 in oneexample includes a plurality of probe change units 1102 positionedwithin stage receptacles 628 along the stage receptacle flange 630 ofthe sample stage 614. As shown, each of the probe change units 1102 inone example includes a probe change tool 1104 coupled with a probe 702.Each of the probes 702 (e.g., instrument tips having specified shapes,materials and the like) are positioned within the probe change tools1104 with the probe base 718 exposed for ready coupling with themechanical testing instrument 612 coupled with the cantileveredinstrument column 606.

In another example, the probe change assembly 1100 further includes aprobe magazine 1108 coupled with a portion of the automated testingsystem 600. In one example, the probe magazine 1108 is coupled with thecantilevered instrument column 606 as shown in FIGS. 11A and 11B. Inanother example, and as shown in FIGS. 11A, B, the probe magazine iscoupled with the instrument stage 608 and thereby movable at least alonga Z-axis (e.g., vertically). The probe magazine 1108 in another example,is positioned anywhere within or on the automated testing system 600where access is provided to the plurality of probes 702 by the pluralityof probe change tools 1104 shown in FIGS. 11A and 11B. For instance, theprobe magazine 1108 is positioned separately from the cantileveredinstrument column 606 at a position to the side of the cantileveredinstrument column where the plurality of probe change tools 1104 haveaccess to the probe magazine 1108 to readily couple and decouple probes702 from the probe magazine 1108 as needed for exchange with themechanical testing instrument 612.

As shown in FIG. 11A, a plurality of probe change units 1102 areprovided along the stage receptacle flange 630. In one example, theprobe change tools 1104 are substantially identical and thereby able tocouple with any of the probes 702 positioned within the probe magazine1108. In another example, the probe change units 1102 include differingprobe change tools 1104, for instance having differing diameters,cross-sectional shapes and the like. In such examples the probe changetools 1104 are sized and shaped to engage with differing probes 702stored within the probe magazine 1108 or positioned within the probechange tools 1104 prior to operation of the automated testing system600. For instance in one example, one or more of the probe change units1102 include probe change tools 1104 sized and shaped for coupling withheavy load probes. In another example, one or more of the probe changeunits 1102 are, in contrast to the heavy load tools, sized and shapedfor coupling with standard probes configured to operate at lesser forcesrelative to the heavy load probes used in the other probe change units1102.

In another example, each of the stage receptacle 628 of the stagereceptacle flange 630 are indexed to software control systems configuredto operate the stage actuator assembly 618. The indexing of the stagereceptacle 628 allows for the accurate and reliable positioning of theprobe change units 1102 coupled within the stage receptacles 628relative to the mechanical testing instrument 612 and the probe magazine1108. Stated another way, the control system for the stage actuatorassembly 618 is configured with the indexed positions of the stagereceptacles 628 to move one or more of the probe change units 1102 whendesired into alignment with the mechanical testing instrument 612 orvarious ports on the probe magazine 1108 for selective coupling anddecoupling of probes 702 with the probe change units 1102. For instance,the stage actuator assembly 618 is configured to move the probe changeunits 1102 into alignment with one or more of the probes 702 storedwithin the probe magazine 1108, couple with one of the probes 702, anddecouple the probe 702 from the probe magazine 1108. The stage actuatorassembly 618 is thereafter configured to move through a combination ofone or more of translation and rotation of the sample stage 614 to alignthe probe change unit 1102 and the probe 702 installed therein with themechanical testing instrument 612. The probe change unit 1102 isconfigured to couple the probe 702 with the mechanical testinginstrument 712 for instance through the elevation of one or more of themechanical testing instrument 612 (e.g., the instrument stages 608including the magazines 1108 thereon) or the sample stage 614 followedby rotation of the probe 702 by the probe change unit 1102.

Optionally, the probe change unit 1102 precedes the installation of aprobe 702 within the mechanical testing instrument 612 with removal of aused probe from the mechanical testing instrument 612. In such anexample, the probe change unit 1102 is aligned with the mechanicaltesting instrument 612 and the probe change tool 1104 engages with theprobe 702 coupled with the mechanical testing instrument 612 andthereafter rotates the probe 702 out of coupling with the mechanicaltesting instrument 612. In one example, the probe change tool 1104thereafter is moved for instance by the stage actuator assembly 618(through a combination of one or more of translation and rotation) toalign the probe change unit 1102 with one or more orifices in the probemagazine 1108. The probe change unit 1102 is raised or the probemagazine is lowered 1108 (for instance where the probe magazine 1108 iscoupled with the instrument stage 608) into coupling engagement with theprobe change unit 1102 having the used probe 702 thereon. The probechange unit 1102 positions the used probe 702 in an orifice of the probemagazine 1108 and decouples the probe 702 from the probe change unit1102. The probe change unit 1102 is then free to receive a fresh probe702 from the probe magazine 1108 for installation within the mechanicaltesting instrument 612.

In another example, the stage receptacle flange 630 includes one or morediagnostic samples 1106 positioned in one or more of the stagereceptacles 628. In one example the diagnostic samples 1106 include, butare not limited to, quartz and aluminum samples having well known andpredictable mechanical characteristics such as elastic modulus, hardnessand the like. As with the probe change units 1102, having the diagnosticsamples 1106 within the stage receptacles 628 allows for indexing of thediagnostic samples 1106 for accurate positioning of the samples by thestage actuator assembly 618. For instance, the stage actuator assembly618, through control software, is readily able to move a diagnosticsample, through one or more of translation and rotation of the samplestage 614, into alignment with the mechanical testing instrument 612.The mechanical testing instrument 612 is operated to check the functionof the probe 702 coupled with the mechanical testing instrument 612(e.g., to check on probe wear, reassess the probe area function and thelike).

In still another example the probe magazine 1108 includes a probeactuator configured to raise and lower the probe magazine 1108 relativeto the probe change units 1102, to move one or more of the probes 702into engagement with the probe change tools 1104 of the probe changeunits 1102, to couple and decouple probes 702 to and from the probechange units 1102 and the like.

Rotary Clutch

FIGS. 12A and 12B show views of one example of the probe change unit1102 previously shown and described in FIGS. 11A and 11B. As shown forinstance in FIG. 11A, the probe change unit 1102 includes a probe changeunit housing 1200 sized and shaped to retain a motor 1202 such as a stepmotor therein. In the example shown, the motor 1202 is configured toprovide one or more of clockwise and counterclockwise rotation forinstance to the probe change tool 1104. The probe change unit housing1200 further includes a wiring interface 1204 extending through theprobe change unit housing and electrically coupled with the motor 1202.Referring to FIG. 12A, a drive cap 1206 is shown engaged with the probechange tool 1104. As will be described in further detail below the drivecap 1206 in one example is a transmission means configured to providerotational force to the probe change tool 1104 for correspondingrotation of the probe 702 positioned within the probe change tool 1104.

In another example shown in FIG. 12A, the probe change unit 1102includes a mirror 1208 directed toward an access port 1212 extendingthrough the probe change tool 1104. In one example the access port 1212provides access (e.g. a direct visible line) to probe data 1214 providedon the probe 702. In another example, the probe data includes one ormore of RFID, text, barcode and the like. For instance, the probe data1214 includes one or more of probe identification data, calibration datasuch as the probe area function for the probe 702 and the like. Further,in the example shown in FIG. 12A the mirror 1208 is positioned by amirror arm 1210 cantilevered relative to the probe change unit housing1200. As shown in FIG. 12A the mirror arm 1210 is positioned to extendup and around the drive cap 1206 to substantially prevent the engagementof the mirror 1208 or the mirror arm 1210 with the drive cap 1206, forinstance, during rotation of the drive cap during one or more ofinstallation or decoupling of the probe 702 with the mechanical testinginstrument 612. The mirror arm 1210 directs the mirror 1208 so that themirror when viewed from above provides visibility to the probe data 1214such as with the optical instrument 610 previously shown and describedin FIGS. 6A and 6B. In another example, the mirror and mirror arm 1208,1210 are replaced or are included in addition to other sensinginstruments such as an RFID sensor, barcode reader, text reader and thelike coupled with one or more of the optical instrument 610 or the probechange assembly 1100 previously shown and described in FIGS. 11A, B and12A.

Referring now to FIG. 12B, as previously described the probe change unit1102 is a part of the probe change assembly 1100 shown in FIGS. 11A and11B. For instance, the probe change unit 1102 is configured to rotate orcouple one or more probes 702 with the probe magazine 1108 and themechanical testing instrument 612. Referring now to FIG. 12B, the probechange unit 1102 is shown in cross-section and includes the motor 1202positioned within the probe change unit housing 1200 as previouslydescribed. A drive shaft 1216 extends from the motor into the drive cap1206. As shown in FIG. 12B, the drive shaft 1216 is engaged with aspindle 1218 and the spindle is in turn rotatably coupled with the drivecap 1206.

As will be described in further detail below, in one example a rotaryclutch or slip interface is provided between the spindle 1218 and thedrive cap 1206 to ensure locking rotary engagement in one direction suchas a decoupling direction with respect to the probe 702 and themechanical testing instrument 612, and to permit slipping rotaryengagement of the probe 702 and the mechanical testing instrument 612for instance in a rotary installing direction.

Referring again to FIG. 12B, as shown in the cross-section the probechange unit 1102 further includes in one example a bearing 1220interposed between portions of the drive cap 1206 and the spindle 1218.In one example the bearing 1220 is a rotational bearing including aninner bearing ring 1219 and an outer bearing ring 1221 with ballbearings interposed therebetween. As will be described in further detailbelow, the bearing 1220 facilitates the rotation of the spindle 1218relative to the drive cap 1206 for instance where slipping engagementbetween the spindle and the drive cap is desired such as to avoidover-torquing of a probe 702 within the mechanical testing instrument612. Instead, the bearing 1220 permits rotational force to be solelytransmitted from the spindle 1218 to the drive cap 1206 through therotary clutch described herein below.

In another example, the probe change unit 1202 includes a slippinginterface feature 1222 coupled between one or more portions of the drivecap 1206 and the bearing 1220. In one example, the slipping interfacefeature 1222 includes a wave washer that selectively allows thetransmission of torque between the drive cap 1206 and the bearing 1220.As further shown in FIG. 12B, a tool interface 1226 is provided betweenthe drive cap 1206 and the probe change tool 1104. In one example thetool interface 1226 includes one or more of corresponding noncircularcontours between the drive cap 1206 and the probe change tool 1104 or aninterference fit therebetween. The noncircular interference fit at thetool interface 1226 ensures the reliable transmission of rotationalforces from the drive cap 1206 to the probe change tool 1104 throughrotation of the drive cap 1206. In another example, a probe interface1224 is provided between the probe change tool 1104 and the probe 702when the probe 702 is coupled with the probe change tool. For instance,as with the tool interface 1226, the probe interface 1224 includes anoncircular interface configured to ensure rotational movement of theprobe change tool 1104 is transmitted to the probe 702 duringinstallation and decoupling of the probe 702 from the mechanical testinginstrument 612 or the probe magazine 1108.

FIG. 13 shows the probe change unit 1102 with the drive cap 1206provided in phantom lines. The drive cap 1206 is provided in phantomlines to expose the components of the rotary clutch 1300, for instancealong the drive cap 1206 and the spindle 1218. The rotary clutch 1300 inone example includes one or more pawls 1302 moveably coupled with thespindle 1218. In another example, the rotary clutch 1300 furtherincludes one or more pawl receivers 1306 positioned along the innersurface of the drive cap 1206. As will be described in further detailbelow, the rotary clutch 1300 provides slipping engagement in a firstdirection such as a probe installation rotation direction and provideslocking non-slipping engagement between the spindle 1218 and the drivecap 1206 in a probe decoupling rotational direction.

Referring again to FIG. 13, the pawl 1302 is retained within a pawlhousing 1304 formed in the spindle 1218. For instance, as shown in FIG.13 the pawl housing 1304 has a substantially corresponding shape to thepawl 1302 to facilitate the reception of the pawl 1302 therein and tofurther facilitate the rotation of the spindle 1218 relative to thedrive cap 1206 in the rotary installation direction and over at least aportion of the decoupling rotational direction at least until the pawl1302 is received within the pawl receiver 1306. As further shown in FIG.13, a biasing element 1308 is positioned around the spindle 1218. Aswill be described in further detail below, in one example the biasingelement 1308 engages with a portion of the pawl 1302 (e.g. including oneor more pawls 1302) to bias a portion of the pawl 1302 outwardlyrelative to the spindle 1218. Biasing of a portion of the pawl 1302outwardly from the spindle 1218 biases that portion of the pawl intoengagement with the pawl receiver 1306. In the decoupling rotationaldirection the biasing of the pawl 1302 outwardly biases the pawl intothe pawl receiver 1306 and engages the pawl 1302 in a locking rotaryengagement with the drive cap 1206 to substantially prevent the slippingof the spindle 1218 relative to the drive cap 1206 while the spindle1218 is rotated in the decoupling direction.

As shown in FIG. 14, the probe change unit 1102 is transverselycross-sectioned to expose the rotary clutch 1300 including the pawl 1302positioned between the spindle 1218 and the drive cap 1206. In theconfiguration shown in FIG. 14, the pawl 1302 is substantially receivedwithin the pawl housing 1304 while the spindle 1218 is configured forselective slipping engagement with the drive cap 1206. For instance asthe spindle 1218 is rotated in the counterclockwise (i.e., clockwisewhen viewed from the bottom up) direction for instance by rotationprovided by the drive shaft 1216 coupled with the motor 1202 the pawl1302 is biased outwardly into engagement with the inner surface of thedrive cap 1206. While the spindle 1218 is moved in a counterclockwisedirection the pawl 1302 as well as the other surfaces of the spindle1218 engage with the inner surfaces of the drive cap 1206 to providerotational movement to the drive cap 1206 and corresponding rotationalmovement to the probe change tool 1104 shown in FIGS. 11A and 11B. Theprobe 702 coupled with the probe change tool 1104 is thereby selectivelyrotated. In one example where the probe change tool 1104 is rotated inthe counterclockwise direction for instance with a probe 702 coupledwith a probe change tool 1104 torque is provided to the probe 702 untilsuch time as the probe 702 is fully or at least partially received andcoupled with the mechanical testing instrument 612. As the probe 702 iscoupled with the mechanical testing instrument 612 a counter torque isprovided between the interface features of the mechanical testinginstrument 612 and the probe base 1718 of the probe 702. The countertorque is correspondingly transmitted to the drive cap 1208. Because thepawl 1302 is selectively engaged with the drive cap 1206 and nototherwise in locking engagement because of the counterclockwise rotationshown in FIG. 4 upon receiving the counter torque the drive cap 1206will slide relative to the spindle 1218 to substantially prevent theover torquing of the probe 702 into the mechanical testing instrument612. The transducer within the mechanical testing instrument 612 isthereby substantially preserved and not damaged by over-rotation of theprobe 702 from the motor 1202.

In contrast, where decoupling of the probe 702 is desired from themechanical testing instrument 612 the spindle 1218 is rotated in anopposed direction, such as the clockwise direction as shown in FIG. 14.While rotated in the clockwise direction (i.e., counterclockwise whenviewed from the bottom up) the pawl 1302 continues to be biasedoutwardly for instance by the biasing element 1308. As the spindle 1218rotates the counter torque of the probe 702 coupled with the mechanicaltesting instrument 612 is correspondingly transmitted through the probechange tool 1104 and the drive cap 1206. The counter torque allows thedrive cap 1206 to slip relative to the spindle 1218 until the pawl 1302reaches one or more of the pawl receivers 1306. Because the pawl 302 isbiased outwardly the pawl 1302 is received in one or more of the pawlreceivers 1306 and provides a locking rotary engagement between thedrive cap 1206 and the spindle 1218. The motor 1202 is thereby able toprovide a decoupling torque through the drive shaft 1216, the spindle1218 and the drive cap 1206 to the probe change 1104. The torquetransmitted to the probe 702 is able to readily decouple the probe 702from the mechanical testing instrument 612. Because the probe 702 isbeing decoupled from the mechanical testing instrument 612 the lockingengagement between the spindle 1218 and the drive cap 1206 does notdamage the transducer as the probe 702 instead rotates relative to thetransducer and decouples from the mechanical testing instrument 612.

As described, the rotary clutch 1300 is thereby able to provide lockingrotary engagement between the probe change tool 1104 and spindle 1218 ina probe decoupling rotation direction and selected slipping engagementbetween the probe change tool 1104 and the spindle 1218 in a probeinstalling rotational direction. For instance, through the selectiveengagement of one or more pawls 1302 with the interior surface of thedrive cap 1206 selected slipping engagement and transmission of torquebetween the spindle 1218 and the drive cap 1206 is realized. Incontrast, locking rotary engagement between one or more pawls 1302 andone or more pawl receivers 1306 provides locking rotary engagementwithout slipping between the spindle 1218 and the drive cap 1206 toensure reliable decoupling of the probe 702 for instance from themechanical testing instrument 612 (or the probe magazine 1108).

FIG. 15 shows a detailed perspective view of the spindle 1218 of theprobe change unit 1102 previously described and shown in FIG. 11A. Asshown, the drive cap 1206 is removed to further expose the pawls 1302and the pawl housing 1304. As shown in FIG. 15, a plurality of pawls1302 are provided with an interposing pawl boss 1500 extendingtherebetween. In one example, the pawl boss 1500 extends across abiasing element groove 1502. As previously described the probe changeunit 1102 includes a biasing element 1308 extending around the spindle1218. As shown in FIG. 15, the biasing element 1308 is received withinthe biasing element groove 1502 and overlies the pawl boss 1500. Thebiasing element 1308 includes in one example an elastomeric band sizedand shaped to provide an inwardly projecting biasing force against thepawl boss 1500. In another example, the biasing element 1308 includes,but is not limited to a spring wire, an elastic element and the likesized and shaped to provide an inward biasing force. The engagement ofthe biasing element 1308 with the pawl boss 1500 biases heads 1504 ofthe pawls 1302 inwardly into the relatively larger head grooves 1508.Inward movement of the heads 1504 (e.g., into snug reception within thehead grooves 1508) biases (e.g., rotates) the tails 1506 of each of thepawls 1302 outwardly through engagement of the pawls with a pivot point1501. The tails 1506 are thereby biased into engagement with the spindle1218 (e.g. along the inner spindle surface or within one of the pawlreceivers 1306).

As shown in FIG. 15, the pawls 1302 further include heads 1504 receivedin the larger head grooves 1508 formed as part of the pawl housings 1304formed in the spindle 1218. In another example, tail groves 1510 arefurther provided within the pawl housing 1304 to receive the tails 1506there. As previously described, the pawl housing 1304 allows for thereception of the pawls 1302 therein while the spindle 1218 rotates withthe drive cap 1206 for instance in a selective slipping engagementbetween the drive cap 1206 and the spindle 1218 in a probe installingrotational direction. In contrast, the biasing element 1308 biases atleast the tails 1506 outwardly from the spindle 1218 (e.g., throughinward biasing of the pawl boss 1500 and the heads 1504 for pivoting atthe pivot point 1501) for reception of the tails 1506 within the pawlreceivers 1306 where the spindle 1218 is rotated in a probe decouplingrotational direction to ensure the pawls 1302 provide a lockingengagement between the spindle 1218 and the drive cap 2106 as describedabove.

Reading of Probe Identification or Calibration Data from the Probe

FIG. 16 shows one example of the probe change unit 1102 with the mirror1208 directed toward the access port 1212 and probe data 1214 providedon a probe 702. As previously described, in one example the mirror 1208is one means for providing access to the probe data 1214 by theautomated testing system 600 for instance through the optical instrument610. As shown in FIG. 16, an image line 1600 extends from the probe data1214 to the mirror 1208. A reflected image line 1602 for instance withthe inverse of the probe data 1214 shown at FIG. 16 extends upwardlysuch as toward the optical instrument 610 where the optical instrument610 is aligned with the mirror 1208.

As previously described, in another example the stage receptacles 628are indexed for ready positioning by the stage actuator assembly 618. Inyet another example, the mirror 1208 is also indexed for the stageactuator assembly 618 (e.g., relative to the stage receptacle 628). Thestage actuator assembly 618 is thereby controlled to position the samplestage 614 including one or more of the mirrors 1208 for one or more ofthe probe change units 1102 into alignment with the optical instrument610. By aligning the mirror 1208 with the optical instrument 610 theoptical instrument 610 is able to observe the probe data 114 suppliedalong with probe 702 visible through the access port 1212. In anotherexample, the optical instrument 610, another instrument such as an RFIDreader, barcode reader and the like is oriented at other angles forinstance perpendicular to the probe 702 and directed toward probe data1214 positioned at other locations on the probe 702 to eliminate theneed for the mirror 1208. For instance, the optical instrument 610 orRFID reader, barcode reader or the like is positioned perpendicularlyrelative to the probe 702 to provide direct access to the probe data1214. In another example with an RFID reader, alignment of the RFIDreader with the mirror 1208 is not necessary. Instead, the RFID readeris brought into close proximity with the probe 702 to activate the RFIDchip and thereby read the information therefrom.

Method for Automatically Examining a Transducer Response to theMechanical Testing Instrument

FIG. 17 shows one example the method 1700 for automatically examining atransducer response in the mechanical testing instrument configured toperform mechanical testing at micron scale or less (e.g., equal to orless than microns). In describing the method 1700 reference is made topreviously described features and functions provided herein. Wherereference numerals are provided the numerals are intended to beexemplary and not limiting. For instance, the recited structure andfeatures in the method 1700 as well as the other methods describedherein include the referenced features, other similar features describedherein as well as their equivalents. At 1702, the method 1700 includesdetermining if a transducer operation threshold is achieved. Thetransducer 700 includes in one example the transducer assembly 700 shownin FIG. 7A and the corresponding capacitor assembly 1710 shown in FIG.7C. In one example, the transducer assembly is coupled with aninstrument probe such as the probe 702 shown in FIG. 7C. The transducer,such as the capacitor assembly 710, is configured to move the probe 702,measure the instrument probe movement and measure the force applied tothe instrument probe 702 through for instance the movement of a centerplate 712 relative to the oppose plates 714 of the capacitor assembly710.

At 1704, a space indentation operation is conducted with the transducersuch as the transducer assembly 700 once the transducer operationthreshold is achieved. In one example, the space indentation operationincludes at 1706 moving the instrument probe 702 into a position wherean instrument probe 702 will not engage a surface during the spaceindentation. For instance, the instrument stage 608 is operated to movethe mechanical testing instrument 612 relative to the sample stage 614to elevate the mechanical testing instrument out of possible engagementwith the sample stage surface 616. In another example, the stageactuator assembly 618 is operated to move the sample stage surface 616laterally relative to the mechanical testing instrument 612 tosubstantially move the sample stage surface 616 out alignment with themechanical testing instrument.

At 1708, a specified voltage is applied to the transducer, for instance,across the opposed plates 714. As previously described herein, theapplication of the specified voltage to the opposed plate 704 generatesan electrostatic force between the opposed plates 714 and the centerplate 712 thereby deflecting or moving the center plate 712 relative tothe opposed plates 714. At 1710, the movement of the instrument probe702 (e.g., the center plate 712) is measured. At 1712, it is determinedwhether the transducer assembly 700 requires one or more of calibrationor service if the measured movement is outside of the specified movementthreshold for the specified voltage. For instance, the specified voltageis paired with a predicted movement of the probe 702 (e.g., the centerplate 712 of the capacitor assembly 710) and where the measured movementof the probe 702 is outside the specified or predicted threshold rangeof the movement for the probe 702 one or more of calibration or serviceis indicated for performance on the transducer assembly 700.

Several options for the method 1700 follow. In one example, determiningif the transducer operation threshold is achieved includes counting thenumber of transducer operations (e.g., indents, scratches and the like)and then determining if the number of transducer operations are greaterthan the transducer operation count threshold. In one example, thetransducer operation count threshold corresponds to empiricallydeveloped threshold numbers generated in part on experience as well asknowledge of the mechanical characteristics of the sample and probeunder consideration. For instance, in one example, the transduceroperation count threshold is one or more of 100 indentationsindentations, 1000 indentations or the like. As described above, thetransducer operation count threshold, for instance, one or more of thenumbers provided is adjusted up or down depending on the material beingtested, the material of the probe, the forces being applied, theindentation depth, scratch, length and the like. In another example,determining if the transducer operation threshold is achieved includesadjusting the transducer operation count threshold according to thespecified accuracy range. For instance, where measurements of mechanicalparameters of the sample are desired within a predicted range ofaccuracy where measurements of the mechanical parameter are outside ofsaid specified range, the transducer operation count threshold or thetransducer operation threshold are considered achieved and the spaceindentation operation is conducted again.

In still another example, determining if the transducer operationthreshold is achieved includes determining that the transducer operationthreshold is achieved if the transducer measures a force outside of anormal operating force range. For instance, in one example, thetransducer assembly 700 is configured to provide forces to the probe 702on the order of milli-newtons. Where forces incident on the capacitorassembly 710 fall outside of the this range, for instance, 1 or morenewtons is applied to the transducer 702 (e.g., corresponding to orapproximately a pound or more) the transducer operation threshold is metindicating a possible strike of the probe 702 by the user or a piece ofmachinery and requiring the space indentation operation be performed toensure capacitor assembly 710 has not been damaged by the unintentionalinteraction with the probe 702 and the center plate 712 by an operator.With each of the threshold determination steps and functions describedherein, the control station 110 or other similar control systemincludes, but is not limited to, a comparator, processor, circuit andthe like configured to compare the relevant measure value (e.g.,parameter, count and the like) against the respective threshold andthereby make a determination that the threshold is met.

Examination of a Probe of a Mechanical Testing Instrument for Use for anAutomated Testing System

FIG. 18 shows one example of the method 1800 for automatically examiningan instrument probe 702 coupled with a mechanical testing instrument,such as the testing instrument 612 shown in FIGS. 6A and 6B. In oneexample, the mechanical testing instrument 612 is configured to performmechanical testing at micron scale or less (e.g., at the nanoscale). Asdescribed with the method 1700, in the description of the method 1800reference is made to features and elements previously described hereinincluding reference numerals for the same. Reference numerals areintended to be exemplary and not limiting. For instance, features andelements described in the method 1800 include the referenced elements,other similar features and their equivalents. At 1802, the method 1800includes determining if an instrument probe use threshold is achieved.Instrument probe 702 is coupled with the transducer such as thecapacitor assembly 712 shown in FIG. 7C. The transducer assembly 700 isconfigured to move the instrument probe 702, measure an instrument probeindentation depth and measure the force applied to the instrument probethrough the transducer 700. At 1804, a probe check operation isconducted once the instrument probe use threshold is achieved.

In one example, the probe check operation includes but is not limited toat 1806 aligning the instrument probe 702 with a diagnostic sample suchas one or more of the diagnostic samples 1106 shown in FIG. 11A. At1808, the instrument probe 702 is indented into the diagnostic sample1106. At 1810, one or more of the indentation depth, indentation forceor a sample mechanical parameter is measured with the transducer 700.

At 1812, the method 1800 includes determining the instrument probe 702requires one or more of calibration or replacement if one or more of themeasured indentation depth, measured indentation force or the samplemechanical parameter measured are outside of an indentation thresholdrange, an indentation force threshold range or a sample mechanicalparameter threshold range of the diagnostic sample, respectively. Forinstance, the automated testing system, an operator or the likespecifies one or more of the threshold ranges described herein. Wherethe measured indentation depth, indentation force or a sample mechanicalparameter measured with the transducer are outside of this thresholdrange one or more of calibration or replacement of the probe 702 isindicated.

Several options for the method 1800 follow. In one example, determiningif the instrument probe use threshold is achieved includes counting thenumber of transducer operations such as for the transducer 700. Themethod 1800 further includes determining if the number of transduceroperations are greater than the transducer operation count threshold. Ina similar manner to the method 1700, the transducer operation countthreshold is in one example determined according to the materialstested, the probe material, the forces applied, the indentation depthare the same and the like. In one example, the empirical or experiencedbase criteria are used by the operator to adjust the transduceroperation count threshold upward or downward according to the desiredreliability for the automated testing system. As described in oneexample, the transducer operation count threshold includes 10, 100, 1000or more transducer operations before a probe check operation asdescribed herein is required.

In another example, determining if the transducer operation countthreshold is achieved includes adjusting the transducer operation countthreshold according to one or more of the material tested, theinstrument probe, and the force applied to the probe through thetransducer. In still another example, determining if the transduceroperation count threshold is achieved includes adjusting the transduceroperation count threshold upward or downward according to the specifiedaccuracy range. For instance, where the measured mechanical parametersfor the sample are desired to be within a specified range, measuredvalues of the parameter that fall outside of a range trigger performanceof the probe check operation as described herein.

In another example, determining if the instrument probe use threshold isachieved includes measuring one or more of the instrument probeindentation depth, force applied to the instrument probe through thetransducer or a sample mechanical parameter of the sample and thendetermining the instrument probe use threshold is met if one or more ofthe instrument probe indentation depth force applied to the instrumentor the sample mechanical parameter is outside of one or more of thespecified indentation depth threshold range, a specified force thresholdrange, or a specified sample mechanical parameter threshold range of thesample (in contrast to the diagnostic sample 1106). For instance, aprobe check operation may be triggered where one or more of theindentation depth, indentation force, or a measured sample mechanicalparameter are outside of one or more threshold ranges. For instance, ifthe transducer operation count threshold is not met, however one or moreof the indentation force, the indentation depth or the measured samplemechanical parameter are outside of the predicted threshold range for aparticular sample the probe check operation is conducted even though thetransducer operation count threshold is still not met.

In one example, aligning the instrument probe, for instance, the probe702 coupled with mechanical testing instrument 610 with a diagnosticsample 1106 includes moving the diagnostic sample 1106 beneath theinstrument probe 702. For instance, moving the diagnostic sample 1106beneath the instrument probe includes one or more of translating androtating a sample stage surface 616 (e.g., the sample stage) wherein thesample stage surface includes a stage receptacle flange 630 housing oneor more diagnostic samples 1106. In one example, moving the diagnosticsample 1106 includes translating the sample stage surface 616 along an Xaxis and a Y-axis. In one example, the X axis translation range isgreater than the Y axis translation range available with stage actuatorassembly 618 such as the X-stage and Y-stage 620, 622. In still anotherexample, moving the diagnostic sample includes rotating the sample stage614 around a Z axis, for instance with the rotational stage 624, asshown in FIG. 6A. In yet another example, moving the diagnostic sample1106 beneath the instrument probe (e.g., into alignment with theinstrument probe 702) includes a combination of translating and rotatingthe sample stage 614 from a first sample location where the instrumentprobe 702 is aligned with the first sample location (e.g., on the samplestage surface as opposed to the flange 630) to a second diagnosticlocation where the instrument probe 702 is aligned with the diagnosticsample 1106, such as on the stage receptacle flange 630. With each ofthe threshold determination steps and functions described herein, thecontrol station 110 or other similar control system includes, but is notlimited to, a comparator, processor, circuit and the like configured tocompare the relevant measure value (e.g., parameter, count and the like)against the respective threshold and thereby make a determination thatthe threshold is met.

Method of Probe Calibration

In still another example, the probe calibration is conducted if one ormore of the measured indentation depth, the measured indentation forceor the sample mechanical parameter measured are outside of theindentation threshold range, the indentation force threshold range orthe sample mechanical parameter threshold range, respectively. In oneexample, the probe calibration method includes the method 1900 shown inFIG. 19. At 1902, a plurality of indentations are performed with theinstrument probe 702 against the diagnostic sample 1106. Each of theplurality of indentations are conducted according to a specified array(e.g., predicted values) of one of indentation depths or indentationforces, each of the indentation depths, indentation forces beingdifferent. At 1904, one or more of the indentation force or theindentation depth of each indentation according to the specified arrayof indentation depths or indentation forces are measured. At 1906, therespective measured indentation forces or the measured indentationdepths are associated with the corresponding predicted indentationdepths or indentation forces of the specified array.

At 1908, a probe area function is calculated for the instrument probe702 according to the relationship between the indentation forces orindentation depths associated with the indentation depths or indentationforces of the specified array. Stated another way, the measuredindentation forces or measured indentation depths that are associatedwith the corresponding predicted indentation depths or indentationforces in the specified array are utilized to generate a probe areafunction for the probe 702 (e.g., for instance to provide arecalibration function for use with the used probe 702 to ensure theused probe provides accurate and reliable results when used in theautomated testing system 600).

In one example in 1910, functions used within the control station 110are configured to operate the automated testing assembly 100. Thecontrol functions of the automated testing system 600 are in one examplecalibrated with the probe area function 702 for the probe 702 generated,for instance, with the method 1900, to ensure accurate determination ofone or more of modulus and hardness values for a sample based onmeasured values obtained with the mechanical testing instrument 610. Forinstance, with a new probe 702 or a used probe 702 the method 1900 shownin FIG. 19 may be performed to provide a calibrating functioncorresponding to the probe area function for the software and controlsystem to ensure the reliable and accurate measurements of hardness andmodulus of samples under consideration.

In yet another example, the probe check operation 1800 is conductedagain after the calculation of the probe area function of theinstrument. The method 1800 includes determining the instrument probe702 requires replacement if one or more of the measured indentationdepth measured indentation force or the sample mechanical parameter arestill outside the corresponding indentation threshold range, theindentation force threshold range, or the sample mechanical parameterthreshold range of the diagnostic sample 1106. That is to say, afterconducting the probe calibration operation to generate a probe areafunction, the probe check operation described and shown in the method1800 is conducted again. If the measured values with the probe 702tested against the diagnostic sample 1106 are outside the thresholdranges, the probe 702 is, in one example, considered unusable andthereafter specified for replacement and the probe 702 is not used untilreplacement with an installation method described herein.

Method for Installing an Instrument Probe

FIG. 20 shows one example of a method 2000 for installing an instrumentprobe, such as the instrument probe 702, in the transducer such as thetransducer assembly 700 previously shown in FIGS. 7A and 7B. In oneexample, the probe 702 is coupled with a mechanical testing instrument610 configured for performing mechanical testing at a micron scale orless, for instance, at one or more microns to nanoscale. As with thepreviously described methods, the method 2000 includes references tofeatures and elements previously described herein as well as referencenumerals for the same. Reference numerals are intended to be exemplaryand are not limiting. For instance, a feature or element provided with areference numeral includes the recited elements as well as all similarelements and their equivalents. At 2002, the method 2000 includesaligning an instrument probe 702 coupled with a probe change unit 1102with a probe receptacle 722 of the mechanical testing instrument 610. At2004, one or more of the instrument probe 702 or the probe receptacle722 is moved into engagement with the other of the probe receptacle orthe instrument probe. For instance, one or more of the instrument probe702 or the probe receptacle 722 are moved along a z axis into engagementwith the other of the probe receptacle or the instrument probe. At 2006,the instrument probe 702 is coupled with the probe receptacle 722, forinstance, by relative rotation coupling of mechanical coupling featuresand the like. At 2008, the probe change unit 1102 is disengaged from theinstrument probe 702 leaving the probe 702 coupled with the mechanicaltesting instrument 612.

Several options for the method 2000 follow. In one example, aligning theinstrument probe 702 with the probe receptacle 722 includes one or moreof X axis and Y axis translating of the probe change unit 1102. Inanother example, aligning the instrument probe 702 with the probereceptacle 722 includes rotating the probe change unit 1102 around the Zaxis, for instance, the Z axis coincident with the center axis of theprobe change unit 1102 and a probe change tool 1104 coupled with theprobe change unit 1102. In still another example, aligning theinstrument probe 702 with the probe receptacle 722 includes actuating amultiple degree of freedom stage 614 configured to translate in the Xand Y axes and rotate around a Z axis (e.g., the center of rotation ofthe stage 614). The multiple degree of freedom stage 614 includes asample stage surface 616, a stage receptacle flange 630 coupled with thesample surface 616 and one or more stage receptacles 628. The stagereceptacle flange 630 and each of the one more stage receptacles 628 aresized and shaped to house the probe change units 1102. In anotherexample, the stage receptacle flange 630 including the one or more stagereceptacles 628 is sized and shaped to couple with a plurality of probechange units 1102. Optionally, moving one or more of the instrumentprobes 702 or the probe receptacle 722 into engagement with the other ofthe probe receptacle or the instrument probe includes translating theprobe receptacle along a Z axis with an instrument stage coupled withthe mechanical testing instrument such as the instrument stage 608. Inanother example, the sample stage 614 includes a Z actuator configuredto elevate the sample stage as well as the probe change unit 1102relative to the mechanical testing instrument 612.

In other examples, the method 2000 includes other features and steps forthe coupling of the instrument probe 702 with the mechanical testinginstrument 612. In one example, coupling the instrument probe 702 withthe probe receptacle 722 includes rotating the instrument probe 702 withthe probe change unit 1102. For instance, the probe 702 includes a probebase 718 having one or more mechanical interface features such asthreading configured to couple with the corresponding features of theprobe receptacle 722, such as a probe coupling feature 720 (see FIG.7C). In another example, rotating the instrument probe 702 with theprobe change unit 1102 includes rotating the probe changing tool 1104 ina probe installing rotational direction. The probe changing tool 1104 iscoupled with a spindle 1218 with a rotary clutch 1300 providing aselective slipping engagement between the probe changing tool 1104 andthe spindle 1218.

In still another example, coupling the probe 702 with the probereceptacle 722 includes initially rotating the probe 702 with the probechanging instrument 1102 in a probe decoupling rotational direction andmeasuring the force incident on a transducer 700 of the mechanicaltesting instrument 612. Rotation of the probe 702 in the probedecoupling rotational direction is arrested where the measured forcedincident on the transducer 700 decreases below a thread interface forcethreshold. For instance, the instrument probe 702 is rotated in theprobe decoupling rotational direction (e.g., counter to the threads) andas the threads of the probe 702 ride over the conesponding threads ofone or more of the probe receptacle 722 or the probe coupling feature720 the threads on one of the probe receptacle and the probe couplingfeature move upward thereby correspondingly deflecting the center plate712 and creating a measurable deflection of the center plate 712relative to the opposed plates 704. Once an end of the threads on theprobe 702 passes over an end of the threads on the probe receptacle 722or the probe coupling feature 720 (e.g., an apex of the threads), theprobe threads disengage and the center plate 712 moves downward, forinstance, the threads on the probe 702 fall into a gap between threadson the problem receptacle 722 or the probe coupling feature 720. Thedownward deflection of the center plate satisfies the thread interfaceforce threshold (a threshold corresponding to a measured decrease inforce) thereby alerting the system that the probe threads have moveddownward and are now reliably positioned between threads of the probereceptacle. With the threads of the probe 702 interfaced between threadsof one or more of the probe receptacle 722 or the probe coupling feature720 the risk of cross threading is minimized and the rotation of theprobe in the decoupling rotational direction is thereafter arrested.

With the threads interfaced the instrument probe 702 rotates with theprobe change unit 1102 in a probe installing rotational direction tocouple the probe 702 with the probe receptacle 722 and thereby couplingthe probe 702 with the mechanical testing instrument 612. In stillanother example, coupling the instrument probe 702 with the probereceptacle 722 includes counting steps of a step motor such as the motor1202 shown in FIGS. 12A and 12B and arresting the operation of the stepmotor when a step count threshold is achieved, for instance,corresponding to a number of turns of the probe 702 empiricallyconsidered to properly couple the probe 702 with the mechanical testinginstrument 612.

In another example, the method 2000 includes checking coupling of theinstrument probe 702 with the probe receptacle 722. In one example, thechecking of the coupling between the instrument probe and the probereceptacle includes measuring the force on a transducer such as thetransducer assembly 700 of the mechanical testing instrument 612 aftercoupling of the instrument probe 702 with the mechanical testinginstrument. The instrument probe 702 is considered coupled with theprobe receptacle if the transducer measures a force corresponding withan instrument probe weight, for instance, where the transducer isdeflected according to a specified weight of the probe 702 afterdisengagement of the probe change unit 1102 from the probe 702. Themeasurement of the instrument probe weight provides a measure ofconfidence that the probe 702 is properly coupled with the probereceptacle 722.

In another example, the method 2000 includes mounting the instrumentprobe 702 and the probe changing unit 1102 of the probe change assembly1100 previously shown in FIGS. 11A and 11B. For instance, in oneexample, mounting the instrument probe 702 in the probe changing unit1102 includes aligning the probe change unit 1102 with the instrumentprobe 702 in a probe magazine 1108. The probe change unit 1102 is movedinto engagement with the instrument probe. For instance, in one example,the probe magazine 1108 includes a z actuator or is coupled with theinstrument stage 608 of the cantilevered instrument column 606 todepress the instrument probe 702 into engagement with the probe changeunit 1102, for instance, the probe change tool 1104. In still anotherexample, a z actuator is provided with a stage actuator assembly 618 toelevate the sample stage 614 and thereby engage the probe change tool1104 of the probe change unit 1102 with the instrument probe 702provided in the probe magazine 1108.

In another example, the method 2000 includes decoupling a previouslyinstalled probe 702 from the probe receptacle 722 before coupling of theinstrument probe 702 with the probe receptacle. Stated another way, inone example, an existing or used probe coupled with mechanical testinginstrument 612 is decoupled from the mechanical testing instrument 612by the probe changing unit 1102 of the probe change assembly 1100 priorto installation of the new probe in the mechanical testing instrument612. In one example, decoupling the previously installed probe on theprobe receptacle 722 includes aligning the probe change unit 1102 withthe previously installed probe 702. Decoupling the previously installedprobe 702 further includes coupling the previously installed probe 702with the probe change unit 1102. The previously installed probe 702 isthereafter decoupled from the probe receptacle of the mechanical testinginstrument 612 with the probe change unit 1102. In one example, thepreviously installed probe is loaded within a probe magazine afterdecoupling from the probe receptacle 722 of the mechanical testinginstrument 612.

In still another example, decoupling of the previously installed probe702 from the probe receptacle 722 includes rotating the previouslyinstalled probe with the probe change unit 1102. For instance, rotationof the previously installed probe with the probe change unit 1102includes rotating a probe changing tool 1104 in a probe decouplingrotational direction. Probe changing tool 1104 is coupled with a spindle1218 with a rotary clutch 1300 providing a locking rotary engagementbetween the probe changing tool and the spindle.

In another example, the method 2000 includes reading one or more ofidentification data 1214 or calibration data 1214 from the instrumentprobe 702. For instance, in one example, a mirror such as the mirror1208 is aligned with an optical instrument 610. The mirror 1208 isdirected toward one or more identification or calibration data 1214 onthe instrument probe, for instance, viewable through an access port 1214in the probe change tool 1104. The method further includes reading oneor more of the identification or calibration data 1214 by way of thereflection of the mirror 1208 toward the optical instrument 610. Inanother example, the method 2000 includes one or more of calibrating orcontrolling the mechanical testing instrument 612, or the control ormeasurement functions for instance in the control station 110 (thatoperate the mechanical testing instrument 612) according to the readcalibration data from the probe 702.

Minimal Footprint and Cantilevered Arm of the Automated Testing System

FIG. 21A shows the overall foot print of the sample stage 614 coupledwith the stage actuator assembly 618, shown in FIGS. 6A and 9, having X,Y and rotational stages 620, 622, 624. As shown, four test locationsT1-4 are provided on opposing peripheral edges and near the center ofthe sample stage surface 616. The outline of the sample stage 614 isshown that corresponds to the position of the stage where each of theT1-4 are selectively positioned beneath the mechanical testinginstrument 612. As shown, with a combination of X translation androtation of the sample stage 614 each of the test locations T1-4 arereadily positioned within a first footprint 2100 (e.g., a sample stagefootprint). In one example, the first foot print 2100 has a firstdimension 2101 substantially similar to a sample stage length 900 (seeFIG. 9) where the sample stage 614 is not movable or is minimallymovable (e.g., for misalignment between the instruments 610, 612) alongthe y-axis. That is to say, the first dimension 2101 is optionallyslightly larger than the sample stage length 900. Optionally, the y-axisis substantially parallel to the cantilevered arm 607 of thecantilevered instrument column 606. In another example, the first footprint 2100 has a second dimension 2103 substantially similar to a rangeof translation of the sample stage 614 along the x-axis (e.g., an axisoptionally orthogonal to the cantilevered arm 607). Stated another way,with the combination of X translation and rotation (e.g., through thestages 620 and 624) the first footprint 2100 is minimized (e.g., withreduced or no Y translation). The automated testing system 600 footprintincludes the first footprint 2100 and the column footprint, for instancethe perimeter of the column base 605.

As further shown in FIG. 21, the cantilevered instrument column length902 is minimized according to the limited (optionally non-existent)translation of the sample stage 614 along the Y-axis because of theaddition of the rotational stage 624 to provide enhanced positioningflexibility to the stage 614. Deflection of the cantilevered instrumentcolumn, noise and the like, for instance with a larger cantilever, arethereby minimized to ensure reliable and accurate testing with themechanical testing instrument 610.

In contrast, FIG. 21B shows the overall footprint 2104 of a sample stage2102 including lateral stages. Relative to the footprint 2100 of thesample stage 614 (including rotational as well as translational stages),the foot print 2104 is larger. The overall footprint of a testing systemincluding the sample stage 2102 is thereby larger to ensure alllocations of a sample on the stage may be tested with a mechanicaltesting instrument 2106. A larger footprint and system conespondinglyassume greater space on a factory floor and may require additional laborand reworking of an existing production line to make room for such asystem. Alternatively, the sample stage 2102 includes stages havinglimited translation ranges that conespondingly limit the locations themechanical testing instrument 2106 may test on a sample coupled on thesample stage 2102.

Additionally, the footprint 2104 of the sample stage 2102 requires thatthe cantilevered instrument arm 2108 has a correspondingly longercantilevered instrument column length 2110 relative to the cantileveredinstrument column length 902 of the instrument column 606 (shown in FIG.21A and FIG. 9). The increased cantilevered instrument column length2110 increases the susceptibility of the mechanical testing instrument2106 to deflection and noise. Alternatively, the cantilevered instrumentarm 2108 is made larger to better structurally support the mechanicaltesting instrument 2106. Increasing the size of the arm 2108 increasesthe footprint 2104 of the system and the system correspondingly assumesmore room on a factory floor.

FIGS. 22A-C show three separate examples of systems 2200, 2202, 2204including stages configured to move through X and Y translation.Referring to FIG. 22A, the system 2200 including the sample stage 2206includes X and Y stages configured to move the sample stage 2206 so thatat least one third of a sample positioned across the sample stage 2206is accessible by a mechanical testing instrument such as the mechanicaltesting instrument 2207 shown in FIG. 22A. As shown, the sample stage2206 perimeter closely corresponds to a sample perimeter, such as asemiconductor wafer having a diameter of approximately 300 millimeters.The footprint for the system 2200 is shown approximately by the Xdimension 2208 and the Y dimension 2210. In one example, the X dimension2208 measures approximately 27 inches while the Y dimension measuresapproximately 21 inches.

Referring now to FIG. 22B, another example of a system 2202 is shown. Asshown in FIG. 22B, the system 2202 includes an expanded footprintconfigured to allow positioning of the sample stage 2212 relative to themechanical testing instrument 2213 at substantially any location on thesample stage 2212 corresponding to a sample such as a semiconductorwafer having a to diameter of 300 millimeters. In this example, with theexpanded footprint the X dimension 2214 and the Y dimension 2216 of thesystem 2202 are larger than those of the system 2200 to account for theadditional space needed to ensure full positioning of all locations onthe sample stage 2212 in alignment with the mechanical testinginstrument 2213. As shown in the example, the X dimension 2214 isapproximately 45 inches while the Y dimension 2216 is approximately 31inches. Each of the X and Y dimensions 2214, 2216 is correspondinglylarger than the X and Y dimensions 2208, 2210 of the system 2200 shownin FIG. 22A. The width of the granite base prescribes the length of thebridge (e.g., the underlying rectangle and the overlying rectangularobject adjacent to the mechanical testing instrument 2213) to an extremethat the bridge must be thick and robust (e.g., with a substantial archand support legs) to have sufficiently high natural frequencies andstiffness for accurate testing while still allowing for positioning ofall sample locations in alignment with the mechanical testinginstrument.

Another example of a testing system 2204 is shown in FIG. 22C. As withthe previous examples, the sample stage 2218 is configured for movementaccording to X and Y translation to position one or more testinglocations of the sample stage 2218 in alignment with both of themechanical testing instruments 2224, 2226. In this arrangement, toensure the sample stage 2218, for instance a sample such as asemiconductor wafer having a diameter of 300 millimeters positionedthereon, is positionable relative to the mechanical testing instruments2224, 2226 to ensure all locations on the sample are available fortesting by the mechanical testing instruments the footprint of thesystem 2204 is larger than either of the footprints for the systems2200, 2202 previously described. For instance, the system 2204 has an Xdimension 2220 measuring approximately 41 inches and a Y dimension 2222measuring approximately 48 inches. The overall footprint of the system2204 is thereby larger than the overall footprints of the systems 2200,2202. As with the system 2202, the width of the granite base prescribesthe length of the bridge (e.g., the underlying rectangle and theoverlying rectangular object adjacent to the mechanical testinginstrument 2213) of the system 2204 to an extreme that it must be thickand robust to have sufficiently high natural frequencies and stiffnessto allow for accurate testing while at the same time allowing forinstrument access to substantially all locations on the sample.

Referring now to FIG. 23, the automated testing system 600 previouslydescribed herein, for instance as shown in FIGS. 6A and 9, is shown in atop down view. As shown, the automated testing system 600 includes agranite base 602 and a cantilevered instrument column 606 extending overthe sample stage 614. As shown, the cantilevered instrument column 606extends over a portion of the sample stage 614. As previously described,the stage actuator assembly 618 combines translational and rotationalactuation of the sample stage 614 to position substantially any locationon the sample stage 614 beneath the optical and mechanical testinginstruments 610, 612. As previously described and shown in FIG. 23, therotational and translational stage actuator assembly 618 minimizes theoverall footprint of the automated testing system 600. For instance asshown in FIG. 23, the sample stage 614 is fully accessible by themechanical and optical testing instruments 612, 610. Stated another way,substantially all locations on the sample stage surface 616 are capableof alignment with the instruments 610, 612. The sample stage 614 isfully accessible by the instruments while presenting a minimal footprintrelative to any of the systems 2202, 2204 previously shown in FIGS.22A-C. As shown in FIG. 23, in one example the automated testing system600 has a footprint at least partially defined by an X dimension 2300and a Y dimension 2302. In one example, the X dimension 2300 measuresapproximately 32 inches and the Y dimension measures approximately 25inches. As shown, the automated testing system 600 with the stageactuator assembly 618 as described herein thereby has a smallerfootprint than either of the testing systems 2202, 2204 shown in FIGS.22B and 22C. The overall footprint of the automated testing system 600shown in FIG. 23 is slightly larger than the test system 2200 shown inFIG. 22A. However, the automated testing system 600 shown in FIG. 23provides full access to substantially all locations (includingdiagnostic samples, probe change units and the like as previouslydescribed herein) on the sample stage 614 with the mechanical andoptical testing instruments 612, 610. In contrast, the system 2200 whilehaving a smaller footprint is only able to allow access to approximatelyone-third of the overall surface area of the stage 2206. The automatedtesting system 600 including the sample stage 614 and the stage actuatorassembly 618 thereby presents a smaller overall footprint than manyother testing systems, while at the same time providing full access tosubstantially all locations of the sample stage 614 including, forinstance, large samples such as semiconductor wafers having a diameterof 300 millimeters positioned on the sample stage 614.

Additionally, as previously described, the provision of the stageactuator assembly 618 having combined translational and rotationalcapabilities minimizes the overall cantilevered length of the instrumentcolumn 606 to thereby to provide a supported and stiff assembly forpositioning and operation of the mechanical testing instrument 612.Deflection and noise incident on the mechanical testing instrument 612are minimized according to the minimal cantilevered length of thecantilevered instrument column 606. For example, the range of X stage620 translation only needs to be long enough to reach half of the wafer(e.g., 150 mm) plus the distance between the farthest optics andindentation positions. The range of Y stage 622 translation only needsto be long enough to cover Y-axis misalignment between the opticalinstrument 610 and the mechanical testing instrument 612 due to designand assembly variation (e.g., about 5, 10 or 20 mm and the like). Statedanother way, the range of Y stage 622 translation, the maximum anorthernmost edge of the stage can move up and the maximum asouthernmost edge of the stage can move down along the y axis, iscoextensive with the first dimension 2101 of the first footprint 2100(e.g., the sample stage footprint). Similarly, the range of X stage 620translation, the maximum an easternmost edge of the stage can move tothe right and the maximum a westernmost edge of the stage can move tothe left along the x axis, is coextensive with the second dimension 2103of the first footprint 2100. The range of X stage 620 translation is, inthis example, greater than the range Y stage 622 translation.

Because the X stage 620 is able to translate the sample stage 614 from alocation where the instruments 610, 612 are aligned near the stagecenter (e.g., near a sample center) to a location where the instrumentsare aligned with the edge of the stage (e.g., near an edge of thesample), rotation of the rotational stage 624 (e.g., the theta stage)provides access and full coverage of the instruments to all portions ofthe sample not otherwise available with X stage 620 translation. Therotational stage 624 in combination with the X stage 620 thereby allowsthe automated testing system 600 to reach the entire surface (e.g., withthe footprint 2100) without adding to the machine footprint as requiredwith dual translational actuators having a full range of motion tofacilitate access to all locations on the sample. Rather than using amassive granite bridge to straddle the entire wafer for instance with asystem having dual translational actuators without a rotationalactuator, the cantilevered instrument column 606 (in combination withtranslational (constrained primarily to the X axis) and rotationalstages) has a minimized arm length 902 and must reach only over half ofthe sample 202.

X, Y, Rotational (Theta) Deskewing/Positioning Translational andRotational Stages

FIG. 24 shows one example of a translational stage 2400. In one example,the translational stage 2400 is used as a one or more of the X andY-stages 620, 622 previously shown in FIGS. 6A and 6B. As shown in FIG.24, the translational stage 2400 includes a stage base 2402 and a stagecarriage 2404 movably coupled with the stage base 2402. A motor, such asa stepper motor 2406 configured to provide rotational motion, is coupledwith one or more of the stage base or stage carriage 2404. The motor2406 is coupled with a lead screw 2408 extending along one or both ofthe stage base 2402 and the stage carriage 2404. The lead screw 2408 isin turn engaged with a nut assembly 2410 coupled with one of the stagebase 2402 and the stage carriage 2404. In the example shown in FIG. 24,the nut assembly 2410 is associated with the stage carriage 2404 and themotor 2406 and the lead screw 2408 are coupled with the stage base 2402.Rotation of the motor 2406 turns the lead screw 2408 which in turn movesthe nut assembly 2410 along the lead screw 2408. Movement of the nutassembly 2410 along the lead screw 2408 correspondingly moves the stagecarriage 2404 relative to the stage base 2402.

In one example, bearings 2414 are coupled between the stage base 2402and the stage carriage 2404. In another example, the bearings 2414include one or more of roller, ball, needle bearings and the like. Inthe example shown in FIG. 24, the bearings 2414 include cross rollerbearings. In one example, the cross roller bearings 2414 include opposedrollers with each of the rollers being transverse to one another (e.g.,rollers that are crossed) to provide surface to surface contact betweenthe rolling surfaces of the bearings and corresponding square orrectangular shaped channels in each of the stage base 2402 and stagecarriage 2404.

In another example, the translational stage 2400 includes an encoder,such as an optical encoder 2412, configured to measure and monitor themovement of the stage carriage 2404 relative to the stage base 2402. Inone example, the encoder 2412 includes but is not limited to a linearencoder having an encoding resolution configured to measure movement ofthe translational stage 2400 (e.g., the stage base 2402 or the stagecarriage 2404) in approximately 0.1 micron increments.

When discussing the X and Y stages 620, 622 references is made to movingone or more of the stage carriage 2404 relative to the stage base 2402associated with each of the stages 620, 622. Where the translationalstage 2400 is referred to as the X and the Y-stage one or more of thestage base or stage carriage 2402, 2404 of the associated stage isconfigured to move along one of the X and the Y axes. For instance, asshown in FIG. 6B the X-stage 620 includes a stage carriage 2404 shown inFIG. 24 configured to move to the left and right with respect to thepage. In another example, the Y-stage 622 includes a stage carriage 2404(also shown in FIG. 24) configured to move into and out of the page, forinstance, toward and away from the cantilevered instrument column 606.

As previously described herein, in one example, the translational stage2400 associated with the Y axis (e.g., the Y stage 622) is configured tohave a smaller translational range of movement relative to the X stage620. For instance, the predominant translational movement of the samplestage 614 is conducted by the X stage 620 moving from the left to theright as shown in FIG. 6B. The Y translation of the sample stage 614 isminimized according to a minimal range of motion provided, for instance,between the lead screw 2408 and the nut assembly 2410. As previouslydescribed herein, in one example, the Y stage 622 provide a minimal ornonexistent range of translational according to the testing needs forthe particular testing system including but not limited to misalignmentin the Y dimension between the optical and mechanical testinginstruments 610, 612. For instance, the Y stage 622 is configured tomove in a to limited range of motion, for instance 5, 10, 20 millimetersand the like corresponding to the predicted misalignment in the Ydirection between the optical and mechanical testing instruments 610,612 shown in FIG. 6B. Stated another way, the Y stage 622 provides aminimal increase to the overall footprint of the sample stage 614. Thatis to say, the sample stage 614 has a footprint along the Y axissubstantially similar or identical to the sample stage length of thesample stage 614 (e.g., the length plus a minimal translation range tocompensate for an instrument misalignment). For instance, in oneexample, where the testing system does not include a Y stage 622 thefootprint of the sample stage 614 and the Y dimension is substantiallyequivalent to the length of the sample stage 614 (e.g., its diameter,width, length and the like).

FIG. 25 shows another example of a stage. In the example shown in FIG.25, the stage 2500 is a rotational stage, such as the rotational stage624 previously shown in FIGS. 6A and 6B. In one example, the rotationalstage 2500 provides movement such as theta movement (e.g., rotationalmovement around a Z axis extending through the center of the stage) fora sample coupled with the sample stage 614 (FIGS. 6A, B) relative to theremainder of the testing system. For instance, the rotational stage 2500provides rotation of the sample relative to the optical and mechanicaltesting instrument 610, 612. The rotational stage 2500 as shown includesa stage base 2502 and a stage carriage 2504 rotatably coupled with thestage base 2502. In one example, a rotary bearing 2506 such as a staticbearing, ball bearings, and the like is positioned between the stagebase 2502 and the stage carriage 2504. A motor such as a stepper motor2508 is coupled with one or more of the stage base 2502 and the stagecarriage 2504. In the example shown in FIG. 25, the motor 2508 iscoupled with the stage base 2502. The motor 2508 is configured to rotatea worm gear 2510 extending adjacent to the stage carriage 2504. As shownin FIG. 25, the stage carriage 2504 includes a ring gear 2512 coupledwith the stage carriage 2504. Rotation of the worm gear 2510 throughoperation of the motor 2508 correspondingly rotates the ring gear 2512and thereby rotates the stage carriage 2504 relative to the stage base2502.

In one example, the rotational stage 2500 includes a rotary encoder 2514such as an optical encoder adjacent to the stage carriage 2504. Therotary encoder 2514 is configured to measure and monitor the rotation ofthe stage carriage 2504 relative to the stage base 2502. In anotherexample, the rotary encoder has a resolution of around about of0.000028582 degrees.

In still another example, the rotational stage 2500 includes a utilityrecess 2516. In one example, the utility recess 2516 is substantiallycoincident with a center of the stage carriage 2504. The utility recess2516 is sized and shaped to receive an actuator such as a lift pinactuator therein. In one example, the lift pin actuator is configured tooperate one or more of the lift pins 634 shown in FIGS. 10A and 10B.

As previously described herein, in one example, the rotational stage2500 provides for rotation to the sample stage 614 and the samplecoupled thereon to substantially minimize translation in one or moreaxes to further minimize the overall footprint of the sample stage 614and the corresponding testing system. For instance, the rotational stage2500 cooperates with the translational stage 2400 (e.g., an X-stagehaving a larger translational range relative to a mirror or minimaltranslational range for a Y-stage) to substantially limit the overallfootprint of the sample stage 614 according to the translation of theX-stage 620 and the rotation of the rotational stage 624. Stated anotherway, through rotation with the rotational stage 624 and translationthrough the X-stage 620 all or nearly all of the locations on the samplestage 614 are fully accessible by the optical and mechanical testinginstruments 610, 612 with minimal or no translation along the Y axis,for instance, with the Y stage 622. Minimizing of the translation in atleast one axis, for instance, along the Y axis minimizes the overallfootprint of the sample stage 614 when operated to positionsubstantially all of the locations of the sample stage 614 underneathone or more of the optical and mechanical testing instruments 610, 612.

Coordinate Systems and Adjusting for Misalignment Between Sample andStage

FIGS. 26A-C show the sample stage 614 and a sample 2610 configured forcoupling with the sample stage 614. Referring first to FIG. 26A, thesample stage 614 is shown including a sample stage surface 616. In theexample, the sample stage 614 includes a stage coordinate system 2600centered at a stage center 2606 such as a center of rotation of thestage 614. As shown, the stage coordinate system 2600 includes a stage Xaxis 2602 and a stage Y axis 2604. The stage coordinate system 2600 isfixed relative to the stage 614. Stated another way, with rotation ofthe stage 614, for instance through the rotational stage 2500 shown inFIG. 25, the stage coordinate system 2600 moves with the sample stage614. Additionally, each of the stages 620, 622, 624 moves along its ownrespective X, Y and Z axis (in the case of the rotational stage actuatorthe actuator rotates around the Z axis). The respective X, Y and Z axesof the stages are another example of coordinate systems married to eachof the stages (e.g., these axes are static relative to the stages).

Referring now to FIG. 26B, one example of the sample 2610 is shown in amisaligned configuration relative to the sample 614. That is to say thesample coordinate system 2612 including a corresponding sample X axisand a sample Y axis 2614, 2616 is rotated relative to the stagecoordinate system 2600 shown in FIG. 26A. The sample 2610, includes thesample coordinate system 2612 fixed relative to the sample 2610. That isto say, that the sample coordinate system 2612 including the X and Yaxess 2614, 2616 moves with movement of the sample 2616, for instance,in a rotational manner about the sample center 2622.

When describing the centers of the sample stage 614 the sample 2610 andother orientations features of the sample or sample stage reference ismade to one or more reference points. When describing the referencepoints, the points are not necessarily limited to the features describedherein, for instance, the reference points as shown in FIGS. 26A and 26Binclude but are not limited to the stage center 2606 and the samplecenter 2622 as well as a sample orientation feature 2618 describedbelow. Instead, the reference points are broadly considered to be anyposition along one or more of the sample stage 614 and the sample 2610and the methods described herein including the calculations based on thereferences points are correspondingly adjusted as needed for orientingone location on the sample relative to the sample stage 614. Forinstance, the sample 2610 or sample stage 614 may include one or more ofa non-circular shape or have one or more set reference points thatinclude or do not include the sample or sample stage centers.

Referring again to FIG. 26B, the sample 2610 (for instance, asemi-conductor wafer) includes a sample orientation feature (a secondreference point relative to the first reference point or sample center2622) that provides an orientation marker relative to the sample center2622 that facilitates the locating and indexing of testing locations toposition the testing locations in coincidence with one or more of themechanical testing and optical instruments 612, 610. As shown in FIG.26B, in one example, the sample orientation feature 2618 includes anotch formed in a perimeter of the sample 2610. In one convention, thesample orientation feature 2618 is coincident or aligned along thesample X axis 2614. As shown the sample X axis 2614 extends through boththe sample orientation feature 2618 and the sample center 2622 (e.g.,respective second and first reference points). As will be described infurther detail below, the sample orientation feature 2618 as well as thesample center 2622 (or corresponding first and second reference points)are used to determine the alignment or misalignment of the sample 2610relative to the sample stage 614 and thereby facilitate the accurate andprecise locating of testing locations such as the testing locations 2620(e.g., T₁₋₄) shown around the sample 2610.

FIG. 27C shows one example of the sample 2610 coupled over the samplestage 614 with the coordinate systems 2600, 2612 overlaid thereon. Asshown the sample 2610 is misaligned (exaggerated for demonstrationpurposes) to show the relation between each of the coordinate systems2600, 2612 and the reference points, such as the centers 2606, 2622 andthe sample orientation feature 2618. Through detection, indexing andmeasuring the distances and orientations of each of these referencepoints accurate locating of each of the testing locations 2620 isensured through movement of the sample stage 614 even where the sample2610 is misaligned from the stage 614.

Instrument Offset Determination

FIG. 27A shows one example of a method 2700 for determining aninstrument offset, for instance, an offset or lateral displacement ofthe mechanical testing instrument 612 relative to another instrument,such as the optical instrument 610 shown in FIGS. 6A and 6B. At 2702 thesample, such as the sample 2610 shown in FIGS. 26B and 26C, is markedwith a mark such as the marking 2710 shown in FIG. 27B at a first offsetmarking location on the sample 2610. For instance, the marking 2710 isprovided with the mechanical testing instrument 612. As shown in FIG.27B the mechanical testing instrument 612 is aligned with the marking2710 (because the mechanical testing instrument 610 formed the marking2710 on the sample 2610). Optionally, the sample 2610 used fordetermining the instrument offset is an initialization sample (e.g.,aluminum and the like) coupled with the sample stage for initializationof the testing system 600 (e.g., one or more of instrument offset orcenter of rotation determinations).

At 2704 the sample stage 614 and the sample 2610 are translated and themarking 2710 at the first offset marking location on the sample is movedwith the sample stage 614 into alignment with the optical instrument610. For instance, the marking 2710 and the sample stage 614 includingthe sample 2610 thereon are translated through one or more of X and Ytranslation with the X and Y-stages 620, 622 previously shown anddescribed in FIGS. 6A and 6B.

At 2706 the translation of the sample stage 614 is measured from theprevious position of alignment of the marking 2710 with the mechanicaltesting instrument 612 to a position aligning the marking 2710 with theoptical instrument 610. The resulting instrument offset is equivalent tothe measured translation. In one example the translation of the samplestage is measured according to one or more positional changes of thestage carriages 2404 of the translational stage 2400 shown in FIG. 24.As previously described, the translational stage 2400 is in one exampleused for each of the X and Y-stages 620, 622. The movement of the stagecarriages 2404 are measured with one or more encoders 2412 associatedwith each of the X and Y-stages 620, 622. Because of the high resolutionof the encoders 2412, the instrument offset measured with the method2700 is configured to provide an accurate instrument offset with aresolution approaching 0.1 microns or better.

FIG. 27B shows one schematic example of the automated testing system 600configured for determining the instrument offset 2722 as previouslydescribed with regard to the method 2700. In the example shown in FIG.27B, the optical and mechanical testing instruments 610, 612 are coupledwith an instrument stage 608, as previously shown in FIGS. 6A and 6B.The probe 702 of the mechanical testing instrument 612 has marked thesample 2610, for instance, with the marking 2710. In one example, themarking 2710 includes an identification notifier 2712, such asadditional indentations, markings, or the like provided to the sample2610. At the center or an easily recognizable location of to the marking2710 is provided a location focus 2714. For instance, in the exampleshown in FIG. 27B, the location focus 2714 is a single indentation atthe center of the “H” pattern of the identification notifier 2712. Inanother example, the location focus 2714 resides in a different portionof the marking 2710, for instance, at an outlier portion of thenotifier, at a point of the identification notifier 2712 and the like.As previously described, after provision of the marking 2710 to thesample 2610, the sample stage 614 including the sample 2610 thereon istranslated to align the marking 2710 with the optical testing instrument610, for instance, an optical working region 2716 of the opticalinstrument 2610. One example of the optical working region 2716 includesbut is not limited to a focal point of the optical instrument 610.

As shown in FIG. 27B, in one example the instrument offset 2722 is acomposite of an X instrument offset 2718 and a Y instrument offset 2720.In an example with an instrument offset composite 2722 as shown in FIG.27B, measurement is performed by each of the stage actuators 620, 622,as previously described with regard to the method 2700. For instance,each of the translational stages 2400 associated with the X and Y-stages620, 622 includes an encoder 2412 that measures the translation of therespective stages and thereby is able to determine the respective Xinstrument and Y instrument offsets 2718, 2720. In another example, themechanical testing instrument 612 and the optical instrument 610 aresubstantially aligned along one axis, for instance, the X or Y axis. Insuch a circumstance, the instrument offset 2722 is equivalent to one ofthe X instrument offset 2718 and the Y instrument offset 2720.

In operation, after provision of the marking 2710, the sample stage 614is actuated as previously described herein. In one example, the opticalinstrument 610 is operated manually to ascertain and identify themarking 2710 and focus the optical working region 2716 on the locationfocus 2714 to accurately and precisely determine the instrument offsetcomposite 2722. In another example, the automated testing system 600includes pattern recognition software configured to work with theoptical instrument 610 to search for and recognize the marking 2710 andfurther analyze the marking 2710 (e.g., with pattern recognitionsoftware) to locate the location focus 2714. With this automatedoperation, the instrument stage 608 including the mechanical testinginstrument 612 and the optical instrument 610 may perform an automatedinstrument offset determination such as method 2700 without operatorinput.

Center of Rotation Stage Determination

The method 2800 shown in FIG. 28A is one example of a method fordetermining a center of rotation of the stage, such as the sample stage614 previously shown in FIGS. 6A and 6B. As will be described in detailbelow, the determination of the center of the stage assists inaccurately locating testing locations 2620 on the sample wherein thesample is coupled along the sample stage 614. Stated another way, thestage center such as the stage center 2606 shown in FIG. 26 provides areference point for measurement of each of the testing locationsrelative to the sample stage 614 and thereby allows for the accuratepositioning of one or more of the mechanical and optical testinginstruments 612, 610 relative to one or more testing locations 2620 onthe sample 2610. At 2802, the sample such as the sample 2610 previouslyshown in FIGS. 26B and 26C is marked at a plurality of locations, forinstance, with markings 2710 (e.g., deformations of the sample,indentations, abrasions, scratches, observable marks and the like). Aspreviously described with regard to FIG. 27B, the markings 2710 in oneexample include identification notifiers 2712 and location foci 2714.

Marking of the sample at a plurality of locations (Step 2802) includesin one example marking the sample 2610 at a first location of aplurality of locations with the mechanical testing instrument 612. Aspreviously described and shown in FIGS. 6A and 6B, the mechanicaltesting instrument 612 includes a probe tip 702 sized and shaped to markthe sample 2610. In one example the sample 2610 is an initializationsample sized and shaped for positioning on the sample stage 614 but isnot otherwise needed for measuring of mechanical characteristics of asample. Stated another way, the sample 2610 in this example is usedprimarily for initializing the automated testing system 600. Forinstance, the initialization sample is used for finding the stage center2606 and the other reference points, such as reference points needed foraccurate translating and rotating of the sample stage 614 and one ormore testing locations 2620 into alignment with the instruments 610,612.

As further shown in FIG. 28B, marking the sample at a plurality oflocations includes at 2806 rotating the sample stage and the sample 2610a specified angle measure wherein the sample stage and the sample aretranslationally static relative to a base, such as the base of theautomated testing system (e.g., the granite base or one or more of thetesting system, enclosure and the like). In one example, as shown inFIG. 28B, the sample stage 614 is rotated approximately 120 degreesbetween each of the markings 2710. In still another example, the samplestage 614 is rotated approximately any angle measure between 0 and 360degrees. As described below, the sample stage 614 is configured torotate these specified amounts because a circle, such as the stagecenter circle 2820, will be overlaid on each of the markings 2710, forinstance at the location focus centers 2714, to form a circle perimeter2822 as shown in FIG. 28B. The provision of three or more markings 2710ensures that the stage center circle 2820 extends around the stagecenter 2606 and is thereby usable to determine the stage center 2606.Stated another way, through one or more of observation and mathematicalanalysis of the stage center circle 2820, the stage center 2606 isaccurately and reliably positioned at the center of rotation of thesample stage 614. Optionally, the specified angle for rotation includesone or more of varying or arbitrary angles. For instance, where thestage 614 remains translationally static, the provision of threemarkings 2710 at differing angles through rotation of the stage 614 willprovide sufficient points for overlaying of the stage center circle2820.

As further shown at 2810 in FIG. 28A, marking of the sample 2610 isrepeated with at least second and third locations of the plurality oflocations according to the repeated rotation of the sample stage and thesample (see Step 2806 previously described above). Stated another way,with the rotation of the sample stage 614 and the initialization sample2610 provided thereon, a plurality of markings 2710 are provided for thesample 2610 for overlying of the stage center circle 2820. At 2812, thecenter of rotation of the sample stage 614 is determined from a circlesuch as the stage center circle 2820 having a perimeter 2822 coincidentwith the plurality of locations such as the markings 2710. The center ofrotation of the sample stage 614 is coincident to the center of thestage center circle 2820. That is to say, by constraining the samplestage 614 to only rotate relative to the instrument stage 608 includingthe mechanical testing instrument 612 thereon, providing a plurality ofmarkings 2710 to the sample 2610 ensures that the plurality of markingswhen overlayed by the stage center circle 2820 determines the stagecenter 2606.

Turning now to FIG. 28B, a schematic example of the initializationmethod 2800 for determining the center of rotation of the stage 614described in FIG. 28A is provided. For instance, a sample 2610, such asan initialization sample 2610, is coupled with the sample stage 614. Asshown in one example, the initialization sample 2610 is misalignedrelative to the perimeter of the sample stage 614. As shown, forinstance, the sample 2610 is offset relative to the stage center 2606according to first and second sample offsets 2824, 2826 (exaggerated fordemonstration purposes). As shown, for instance, in FIG. 28B, the firstsample offset 2824 is greater than the second sample offset 2826 therebyshowing the sample 2610 is translated (offset) relative to the samplestage 614 at the initial positioning of the sample 2610 on the samplestage 614. The method 2800 as described herein is configured todetermine the stage center 2606 corresponding to the center of rotationof the sample stage 614 even with misalignment of the sample 2610relative to the sample stage 614.

By maintaining the mechanical testing instrument 612 in the staticorientation relative to the moving sample stage 614 rotation of themoving sample stage 614 ensures that each of the markings 2710 marked inthe sample 2610 are positioned around the stage center 2606 in a circleas shown in FIG. 28B. As previously described, the overlying of thestage center circle 2820 including the circle perimeter 2822 allows forthe ready determination of the stage center 2606.

By using the initialization sample 2610 a sample provides a surface formarking by the mechanical testing instrument 612 (in the manner of ablank) to allow for the marking of the sample 2610 without otherwisemarring the surface of the sample stage 614. After marking of the sample2610 with the markings 2710, in one example the optical instrument 610is used to identify each of the markings 2710, for instance, thelocation foci 2714, and index each of the foci relative to its positionwith respect to the other markings 2710. Indexing of the markings 2710allows for the ready overlaying of the stage center circle 2820.

In one example, the method 2800 with the schematic shown in FIG. 28Bincludes translating the sample stage 614 and the sample 2610 (such asan initialization sample) between the plurality of locations, forinstance, the markings 2710 shown in FIG. 28B. Each of the markings 2710are observed at the plurality of locations with an optical instrumentsuch as the optical instrument 610. Optionally, the markings 2710 areindents created with the mechanical testing instrument 612. In anotherexample, the markings 2710 include but are not limited to scratches,abrasions, scallops and the like formed in the sample 2610.

As each of the markings 2710 are observed with the optical instrument610, the markings 2710 are indexed at the plurality locations. Forinstance, the plurality of markings 2710 and their location on thesample 2610 (and relative to the stage 614) are indexed and recordedwithin the control station 110 shown in FIG. 1 of the automated testingassembly 100 (e.g., memory device, readable medium, disk and the like).Method 2800 further includes in another example determining the centerof rotation of the sample stage (e.g., the center 2606) by forming thestage center circle 2820 having its perimeter 2822 coincident with eachof the indexed markings 2710 at the plurality of locations around thesample 2610. The center of rotation of the sample stage 614 iscoincident to the center of the stage center circle 2820. In oneexample, software such as software contained in the control station 110of the automated testing assembly 100 is configured to overlay the stagecenter circle 2820 (e.g., a virtual circle) according to the markings2710 and from the overlayed stage center circle 2820 determine the stagecenter 2606 through mathematical analysis of the stage center circle2820.

Translational Deskewing of the Sample

FIG. 29A shows one example of a method 2900 for translational deskewingof the samples such as the sample 2610 positioned on the sample stage614 as shown in FIG. 26C. As previously described, in some examples thesample 2610 is positioned on the sample stage 614 in a substantiallyaligned but not perfectly aligned orientation. For instance, one of thecenters of either the sample stage 614 or the sample 2610 is offsetrelative to the other center. Similarly, the orientation of the testinglocations on the sample 2610, including the orientation of the samplecoordinate system 2612 is tilted or translated and rotated relative to astage coordinate system, such as the stage coordinate system 2600 shownin FIG. 26A. The following deskewing methods, including translationaldeskewing and rotational deskewing determine the relative orientation ofthe sample 2610 relative to the sample coordinate system 2612 of thesample stage 614 to allow for reliable and accurate positioning of thesample 2610, including for instance, testing locations such as thetesting locations 2620 shown in FIG. 26B, into alignment or coincidencewith one or more working regions of the instruments of the automatedtesting system 600, such as the optical and mechanical testinginstruments 610, 612.

At 2902, an optical instrument 610 is aligned with a sample stagereference point such as the stage center 2606 along at least a firsttranslational axis, for instance, the stage X axis or stage Y axis 2602,2604. With regard to the method 2900, step 2902 is optional. Althoughthe stage center 2606 has been used as the sample stage reference pointherein, in another example different sample stage reference points, suchas a predetermined portion of the sample stage 614, may be used. That isto say, in another example, for instance, with a sample stage 614 havinga different shape such as a circle, rectangle, square and the like, itmay be more convenient for mathematical purposes to use a differentsample stage reference point than the stage center 2606. With minormodifications (e.g., to the steps described herein, the correspondingmathematical analysis and the like) the methods described herein arefully applicable to sample stage reference points and first and secondreference points of the samples to ensure testing locations on thesample 2610 are accurately positioned relative to the instruments of theautomated testing system 600.

At 2904, a circular edge location of a plurality of circular edgelocations is sensed along a sample edge such as the sample edge 2922 ofthe sample 2610 shown in FIG. 29B.

In one example, sensing the circular edge location includes translatingstage 614 and the sample edge 2922 toward the optical instrument 610. Aspreviously described in one example, the sample stage 614 is moveablewithin the automated testing system 600, for instance, by translationand rotation relative to the optical instrument 610 and mechanicaltesting instrument 612.

At 2908, the circular edge location such as a sample edge location 2924shown in FIG. 29B is detected with the optical instrument 610 as theoptical instrument 610 crosses over the sample edge 2922. For instance,the control station 110 of the automated testing assembly 100 includespattern recognition or edge recognition software configured to operatethe optical instrument 610 and detect the edge of the sample 6910 as theedge of the sample passes beneath the optical instrument 610. At 2910,the circular edge location is indexed relative to the sample stagereference point such as the stage center 2606 (or any other referencepoint) previously shown in FIG. 28B and optionally determined with themethod 2800 as described herein. At 2912, the sample stage 614 and thesample 2610 are rotated, for instance, a specified angle measure, tofacilitate the observing and detecting of another of the sample edgelocations 2924 shown in FIG. 29B.

At 2914, the sensing of the circular edge location such as the sampleedge location 2924 along the sample edge 2922 is repeated after each ofthe rotations as shown in Step 2912. The sensing of sample edgelocations 2924 is repeated until at least three or more circular edgelocations 2924 are indexed from different locations along the sampleedge 2922. As described herein, the sample stage 614 is rotated aspecified angle measure. In one example, the specified angle measureincludes one or more of a set or varied angular measurements such as 120degrees, 90 degrees, 30 degrees and the like. In another example, thespecified angle measure is not a set angle. Instead, three or moresample edge locations 2924 along the sample edge 2922 of the sample 2610are detected and, as will be described below, the overlying of a circlehaving a perimeter coincident with each of the three or more circularedge locations will correspondently form a circle with the indexedsample edge locations 2924 that determines the first reference point ofthe sample 2610, for instance, the sample center 2622 as shown in FIG.29B. Stated another way, as long as the sample stage 614 is retained ina translationally static orientation (aside from translation for edgedetection) and only rotated the detecting and indexing of three or moreedge locations 2924 along the sample edge 2922 creates a sufficientnumber of points for a virtual circle to be laid over the sample edgelocations 2924 to thereby enable the easy determination of the samplecenter 2622, for instance, through mathematical analysis of the circleoverlying the sample edge locations 2924 and coincident with the sampleedge 2922.

At 2916, the center of the sample 2610 is determined from a circle suchas a virtual circle having a perimeter coincident with the three or morecircular edge locations 2924 spaced apart around a portion or around theentire perimeter of the sample 2610. For instance, the center of thesample 2622 is determined through mathematical analysis of the virtualcircle (or the three or more edge locations 2924).

In one example, the method 2900 includes several options. In oneexample, translating the sample stage 614 and the sample edge 2922toward the optical instrument 610 includes, for instance, translatingthe sample stage 614 and the sample edge 2922 toward the opticalinstrument along a second translational axis different from the firsttranslational axis. For instance, as described at 2902, the opticalinstrument is aligned with at least a first translational axis, forinstance, the Y axis 2604 extending through the stage center 2606 shownin FIG. 26A. In the example described herein, the sample stage 614 andthe sample edge 2922 are then translated along a second translationalaxis such as the stage X axis 2602, also shown in FIG. 26A. Translationof the sample stage 614 from the first position along the firsttranslational axis such as the stage Y axis 2604 and along the stage Xaxis 2602 readily allows for the sensing and indexing of one or more ofthe sample edge locations 2924 with translation of the sample stage 614along a single axis. Stated another way, translation along two or moreaxes such as the X and Y axis from a first location is not required, asthe translation toward the sample edge 2922 occurs along a singletranslational axis and allows for ready determination of the translationalong the single axis relative to a predetermined point, for instance,coincident with the origin of the stage coordinate system 2600 (at thezero value of the stage Y axis 2604).

As shown in FIG. 29B, the sample 2610 is offset or misaligned relativeto the sample stage 614. In practice, the sample 2610 will be moreclosely aligned with the sample stage 614, for instance, the perimeterof the sample 2610 will be substantially coextensive or aligned with theperimeter of the sample stage 614. That is to say, the centers of therespective sample 2610 and the sample stage 614 will be closely alignedand thereby have minimal or nonexistent offset between the two. Evenwith precise positioning of the sample 2610 on the sample stage 614, theprocesses as described herein, for instance, the method 2900 detailingtranslational deskewing of the sample stage 2610 relative to the sample614 will be required to ensure accurate positioning of the plurality oftesting locations 2620 of the sample 2610 according to the stagecoordinate system 2600 of the automated testing system 600 (and the axesof the X and Y stages 620, 622).

Further, the schematic view shown in FIG. 29B shows a plurality ofoptical instrument 610 in a variety of positions around the sample stage614, for instance, coincident with multiple sample edge locations 2924as described herein. The plurality of optical instrument 610 areprovided for the convenience of the reader. However, in actual practice,the sample stage 614 is moved as shown in FIG. 29B and the opticalinstrument 610 will be substantially static as shown in solid lines inFIG. 29B. The optical instrument 610 shown in broken lines are therebyprovided to indicate the sample edge locations 2924 and the relativeposition of the optical instrument 610 relative to the detected edgelocations. Stated another way, the sample edge locations 2924 around thesample 2610 are in fact positioned beneath the optical instrument 610shown in solid lines during operation and performance of the method 2900for translational deskewing as described herein.

As previously described, the method 2900 shown in FIG. 29A andrepresented in the schematic figure shown in FIG. 29B is used todetermine a first reference point such as the sample center 2622 of thesample 2610. As will be described in further detail below, the samplecenter 2622 is used in combination with the stage center 2606 todetermine the translational position of the sample 2610 relative to thesample stage 614 such as the stage center 2606. Referring to FIG. 26Cthe position of the sample 2610 for instance the position of the samplecenter 2622 relative to the stage center 2606 is the “r” measure shownin FIG. 26C. For instance the sample center 2622 has a radius and anangular orientation corresponding to the φ measurement shown in FIG. 26C(e.g., a first reference angular offset). Stated another way, the samplecenter 2622 is a first reference point of the sample stage 2610 and hasan angular and radial position relative to the stage coordinate system2600 including the stage center 2606. As will be described in furtherdetail below this first reference point position relative to the stagecenter 2606 will be used to transform the locations of the testinglocations 2620 shown in FIG. 26B into corresponding rotational andtranslational movement of the sample stage 614 to ensure alignment ofthe plurality of testing locations 2620 with one or more of themechanical and optical testing instrument 612, 610 even where the sample2610 is misaligned relative to the sample stage 614.

Rotational Deskewing of the Sample

FIG. 30A shows one example of a method 3000 for rotationally deskewing asample, such as the sample 2610, relative to the sample stage 614. Aspreviously described in at least some examples, the sample 2610 ispositioned on the sample stage 614 and despite efforts to perfectlyalign the sample 2610 with the sample stage 614 some amount ofmisalignment may occur between the sample and the sample stage. Therotational deskewing method 3000 provided herein cooperates with thetranslational deskewing method 2900 previously described to index andorient the sample 2610 relative to the sample stage 614 for accuratepositioning of the plurality of testing locations 2620 shown in FIG. 26Brelative to the coordinate system of the sample stage 614 for accuratepositioning of the testing locations in alignment with one or more ofthe optical and mechanical testing instruments 610, 612 throughoperation of the automated testing system, for instance, throughoperation of the X-stage 620, Y-stage 622 and the rotational stage 624.

At 3002, an optical instrument 610 is aligned with a first translationalaxis coincident with the first reference point. For instance the opticalinstrument 610 is aligned with a translational axis such as a Y axisextending through the sample center 2622 and substantially parallel tothe stage Y Axis 2604 shown in FIG. 26A. Method step 3002 is optionalwith regard to the method 3000. For instance, the optical instrument 610is unaligned with one or more of the Y or X axes at the outset of themethod 3000. At 3004, the sample stage and the sample 614, 2610 aretranslated along a second translational axis relative to the opticalinstrument 610 to a location near an edge of the sample, for instance,the sample edge 2922. Further the sample stage and the sample 614, 2610are translated so the sample orientation feature 2618 (e.g., a secondreference point) is positioned substantially near the working region ofthe optical instrument 610. That is to say, the optical instrument 610is aligned with a portion of the sample, for instance, a portion of thesample 2610 near the sample orientation feature 2618. The opticalinstrument 610 is positioned in an orientation that allows for ready todetection of various portions of the sample orientation feature 2618.

At 3006, the sample stage 614 and the sample 2610 are rotated, forinstance around the center of rotation 2606 (e.g., the stage center2606). Rotation of the sample stage 614 and the sample 2610 where theoptical instrument 610 is positioned near the sample orientation feature2618 allows for the ready examination of various portions of the sampleorientation feature 2618. For instance, the sample orientation feature2618 includes a first feature portion 3020 and a second feature portion3022. In one example, the sample orientation feature 2618 includes thefirst and second feature portions 3020, 3022 and each of the portions3020, 3022 are readily configured for discrimination and identificationfrom one another. At 3008, the sample orientation feature 2618 (thesecond reference point of the sample) is detected with the opticalinstrument. The sample orientation feature has a second referenceangular offset relative to the first reference point (e.g., the samplecenter 2622 and an X-axis parallel to the stage X axis 2602) accordingto the rotation of the sample stage 614 and the sample 2610.

Optionally, the sample reference point 2618 includes the first andsecond feature portions 3020 and 3022. The first and second featureportions 3020 and 3022 are detected with the optical instrument 610. Thefirst feature portion 3020 has a first angular measurement 3024 and thesecond feature portion 3022 has a second angular measurement 3026different from the first angular measurement 3024. For instance, asshown in FIG. 30B each of the first and second feature portions 3020,3022 have corresponding first and second angular measurements 3024, 3026relative to the sample center 2622 and a transposed stage X axis 3028extending through the sample center 2622 (and parallel to the stage Xaxis 2602 in FIG. 26A). In one example the first and second angularmeasurements 3024, 3026 thereby provide an angular measure of the sampleorientation feature 2618 relative to the sample center 2622 according tothe coordinate system of the sample stage 614.

Optionally, the first and second angular measurements 3024, 3026 areaveraged and the average of the first and second angular measurements isthe second reference angular offset. In one example, the secondreference angular offset indicates the orientation of the sample 2610relative to the sample center 2622 and correspondingly to the samplestage 614. As shown in FIG. 26B, each of the testing locations 2620 isoriented relative to the stage center 2606 and the sample coordinatesystem 2612. By determining the orientation of the sample orientationfeature 2618 relative to the sample center 2622 the orientation of thesample 2610 is determined to thereby allow for the ready positioning ofthe sample stage 614 with the sample 2610 thereon for alignment of oneor more of the testing locations 2620 with the optical and mechanicaltesting instruments 610, 612 despite misalignment of the sample 2610relative to the sample stage 614.

As will be described in further detail below the determination of thestage center 2606, the sample center 2622 (a first reference point ofthe sample) and the second orientation feature 2618 (a second referencepoint indicative of the second reference angular offset of the sample2610 relative to the sample stage 614) allows for the ready positioningand aligning of the testing locations 2620 through mathematical analysiswith one or more of the optical and mechanical testing instrument 610,612 as described herein. Stated another way, with the combination of thefeatures shown in FIG. 26C, for instance the values of r, φ and acorresponding to the positions and orientations of the stage center 2606relative to the sample center 2622 and the orientation of the sampleorientation feature 2618 relative to the sample center 2622substantially any position on the sample 2610 (such as the testinglocations 2620) may be readily positioned with accuracy and precisionrelative to the optical and mechanical testing instruments 610, 612.

As described above, the method 3000 optionally includes detecting thefirst and second feature portions 3020, 3022 of the second referencepoint, such as the sample orientation feature 2618, for instance withthe optical instrument 610. The second feature portion 3022 is inanother example spaced from the first feature portion 3020 a specifiedangle. For instance, the second feature portion 3022 is adjacent to thefirst feature portion 3020 and is angularly offset from the firstfeature portion 3020 a known value. Because the second feature portion3022 is offset a specified amount, in one example averaging the firstand second angular measurements uses the measure determined for thefirst feature portion 3020 for instance through detection with theoptical instrument 610 in combination with the specified angularposition of the second feature portion 3022 relative to the firstfeature portion 3020 to determine the second reference angular offset(e.g., the average of the angular measurement of the first featureportion 3020 and the same angle adjusted a known amount for the secondfeature portion 3022) of the sample orientation feature 2618.

In the example shown in FIG. 30B, the second reference angular offset3030 is shown as a bisecting line extending between the first and secondangular measurements 3024, 3026 (i.e., the second reference angularoffset 3030 is the average of the first and second angular measurements3024, 3026). In yet another example the sample orientation feature 2618shown in FIG. 30B for instance is a marking point and the easilyrecognizable by the optical instrument 610. For instance, the secondorientation feature 2618 in one example is similar to the marking 2710shown in FIG. 27B. For instance the marking 2710 includes anidentification notifier 2712 to make the marking readily identifiableand further includes a location focus 2714 to provide an exact positionfor the sample orientation feature 2618 as it relates to the samplecenter 2622. In such an example a single angular measurement is neededfrom the location focus 2714 relative to the sample center 2622 todetermine the orientation of the sample orientation feature 2618relative to the sample center 2622. In such an example, the method 3000shown in FIG. 30A includes rotating the sample stage 614 so the sampleorientation feature 2618 is aligned with the optical instrument 610. Inthis example a single angle is measured in place of measuring multipleangles as described in one example herein.

Aligning an Instrument with One or More Test Locations

Referring now to FIG. 31A one example of a method 3100 for aligning oneor more testing locations with an instrument is provided. At 3102 asample such as the sample 2610 is coupled on a sample stage, such as thesample stage 614 of a testing system 600. The sample 2610 includes oneor more testing locations 2620 spaced apart on the sample 2610. In oneexample, the testing system 600 includes an instrument, such as anoptical or mechanical testing instrument 610, 612 configured for one ormore of testing or observation of the sample 2610 on the sample stage614. In another example, the testing system 600 includes the featuresshown for the testing system 600 provided in FIGS. 6A and 6B.

At 3104 a testing location such as one or more of the testing locationsto 2620 shown in FIGS. 26B, C is aligned with the instrument such as themechanical testing or optical instrument 612, 610. In one example,aligning the testing location 2620 includes, at 3106, rotating thesample stage 614 and the testing location 2620 position on the sample2610 toward alignment with a working region of the instrument such as aprobe tip 702 or an optical working region 2716 of the opticalinstrument 610. In another example, aligning the testing location of the2620 of the one or more testing locations with the instrument includes,at 3108, translating the sample stage 614 and the testing location 2620toward alignment with the working region of the testing instrument(again, for instance the optical working region 2716 or the probe tip702).

At 3110 the testing location 2620 is tested with one or more of theinstruments 610, 612. For instance, in the example of the mechanicaltesting instrument 612, the mechanical testing instrument 612 isconfigured to indent, scratch, abrade, delaminate or provide any one ofa plurality of mechanical testing operations at the testing location2620. In another example the optical instrument 610 includes but is notlimited to one or more of an optical instrument, a microscope, scannerand the like configured to observe and detect (whether through visiblelight detection, electron scanning or transmission, observation withother light wavelengths and the like) various features of the sample2610 at the testing location 2620.

Several options for the method 3100 follow. In one example, testingincludes one or more of mechanical testing or observation at micron orless scale with the instrument, such as one or more of the mechanicaland optical testing instruments 612, 610. For instance, the mechanicaltesting instrument 612 is configured to provide an indentation,deformation or other marking to the sample 2610 at a micron (e.g., up toa multiple micron scale). In another example, the mechanical testinginstrument 612 is configured to provide an indentation at less than amicron scale, for instance at a nano scale. In yet another example, theoptical testing instrument 610 is similarly configured to observemechanical characteristics and features of the sample 2610 at micron(e.g., up to a plurality of micron scale) and at the nano scale.

In yet another example, the method 3100 includes translating the samplestage as previously described herein. In one option translating thesample stage includes translating the sample stage 614 along an X axissuch as an X axis provided by the X-stage 620. In another example,translating the sample stage includes constraining translation (e.g.,limiting) of the sample stage 614 along another axis such as the Y axisfor instance an axis aligned with the movement direction of the Y-stage622 previously shown in FIGS. 6A and 6B. In one example the Y axis ofthe Y stage 622 is substantially parallel to a cantilevered instrumentarm 607 as previously described herein.

In another example, constrained translation of the sample stage 614along the Y axis includes translating the sample stage along the Y axisbetween the instrument and another instrument for instance according tothe instrument offset as previously described herein and shown forinstance in FIG. 27B and determined by way of the method 2700 shown inFIG. 27A. That is to say, the Y stage 622 is configured to move thesample stage 614 in a manner substantially constrained or limitedaccording to the instrument offset composite 2722 (e.g., the Yinstrument offset 2720) shown in FIG. 27B. The sample stage 614 therebyprovides a sample stage footprint substantially similar to the length orwidth of the sample stage 614 along the Y axis. In other words, thesample stage footprint along the Y axis is only slightly larger than adimension of the sample stage, such as length, according to theinstrument offset.

In yet another example, aligning the testing location 2620 of the one ormore testing locations with the instrument includes rotating the samplestage 614 and the testing location 2620 into coincidence with the X axisfor instance the X axis of the X stage 620 where the testing locationhas an original non-zero Y location relative to the Y axis. For instancereferring to FIG. 26A, the stage X axis 2602 is substantially alignedwith the movement axis of the X stage 620 previously shown and describedin FIGS. 6A and 6B. In one example where a testing location such as oneof the testing locations 2620 in its original position is not alignedwith the stage X axis 2602, the stage 614 is rotated to position thetesting location 2620 in coincidence with the X axis (linear movementaxis) of the X-stage 620.

By moving the testing location 2620 into coincidence with the X axis ofthe stage 620 (the linear movement axis of the X-stage 620) Ytranslation, for instance along the Y axis of the Y stage 622 (thelinear movement axis of the Y-stage 622), is thereby substantiallyminimized or entirely eliminated. Instead, translation for instance withthe X stage 620, is used to move the testing location 620 intocoincidence or alignment with one or more of the instruments such as themechanical and optical testing instrument 612, 610.

In yet another example aligning the testing location with the instrumentincludes translating and rotating the sample stage 2610 and the sample614 within the sample stage footprint 2100 (see FIG. 21A) bounded by theoutermost perimeter surfaces of the sample stage relative to theinstrument (e.g., 610, 612) in a plurality of orientations configured toselectively align the instrument with substantially the entire surfacearea of the sample stage. For instance, as shown in FIG. 21A the opticalinstrument 610 is provided at the center of the first footprint 2100(e.g., the sample stage footprint 2100). As shown, the sample stagefootprint or first footprint 2100 is bounded by the outermost perimetersurfaces and the sample stage 614 according to translation of the samplestage 614 along the X axis (linear movement axis of the X-stage 620) androtation of the sample stage with the rotational stage 624. As shown,the Y component 2101 of the first footprint 2100 is substantiallyminimized through the combination of X translation and rotation of thesample stage 614. Stated another way, each of the target locations shownin FIG. 21A (for instance at the outermost and innermost portions of thestage) are positionable in alignment with the optical and mechanicaltesting instruments 610, 612 with the stage 614 moved into one or moreorientations within the first footprint 2100 shown in FIG. 21A.Optionally, the sample stage footprint 2100 is within a testing systemfootprint including the sample stage footprint 2100 and a columnfootprint bounded by a column base 605 (shown in FIG. 9). As shown inFIG. 9 the column base 605 is a portion of the cantilevered instrumentcolumn 606 coupled with the instrument 610, 612.

Transformation of Sample Based Testing Location Coordinates

As previously described herein, the first and second reference points ofthe sample 2610, for instance the sample center 2622 and the locationand orientation of the sample orientation feature 2618 are used incombination with the stage reference feature (a sample stage referencepoint, such as the stage center) 2606 to accurately position one or moreof the plurality of testing to locations 2620 in coincidence oralignment with one or more instruments such as the optical andmechanical testing instruments 610, 612. As shown for instance in FIG.26C, the orientation of each of these features relative to each otherprovides positional coordinates shown for instance with the variables r,φ, and α where r is the radius of the sample center 2622 from the stagecenter 2606, φ is the angle measurement of the sample center 2622relative to the stage X axis 2602 and the stage center 2606 and α is theangle measure of the sample orientation feature 2618, for instance thesecond reference angular offset 3030 shown in FIG. 30B. Each of thesevalues is used in one example to mathematically determine the positionof the testing locations 2620 according to the stage coordinate system2600 for positioning by the X, Y and rotational stages 620, 622, 624 ofthe automated testing system 600. Stated another way, these valuesfacilitate the accurate positioning of each of the testing locations2620 relative to one or more of the optical and mechanical testinginstrument 610, 612 despite misalignment between the sample 2610 and thesample stage 614.

For instance, referring to FIG. 31B, one example of a method 3120 foraligning the testing location 2620 of the one or more testing locationswith the instrument (e.g., one or more of the instruments 610, 612)includes determining the first X and Y coordinates for the testinglocation 2620 relative to an origin such as the sample center 2622 ofthe sample 2610. As previously described the sample coordinate system2612 is in one example centered or has an origin at the sample center2622 as shown in FIG. 26B. At 3124 the first X and Y coordinates of thetesting location 2620 (e.g., T₁) are transformed into an angle valueΘ_(T1) and a translational value R_(T1) for a rotational stage and atleast one translational stage (e.g., stages 624, 620) respectivelycoupled with the sample stage 614 as shown by the coordinates for T₁ inFIG. 26C.

With the rotational and translational values determined at 3126 thesample stage 614 and the testing location 2620 on the sample 2610, arerotated. In one example, the testing location 2620 is rotated accordingto the angle value Θ_(T1) into coincidence with a translational axissuch as the X axis of the X-stage 620 (e.g., the testing location is ona line parallel to the linear movement axis of the stage). At 3128, thesample stage 614 and the testing location 2620 are translated accordingto the translational value R_(T1) parallel to the translational axisdescribed above. That is to say, the testing location is translatedalong a line parallel to the translation axis of the stage, such as theX-stage 620, the translational value R_(T1).

In another example, the method 3120 includes first translating thesample stage 614 along a translational axis parallel to the movementaxis of the translational stage such as the X-stage 620. Thereafter thesample stage 614 is rotated to bring the testing location 2620 intocoincidence with the X-stage translational axis.

In another example the method 3120 includes rotating the sample stage614 and each of the one or more testing locations 2620 (e.g., T₁-T₄)into respective coincidence with the translational axis of thetranslational stage, such as the X stage 620. Stated another way, theplurality of testing locations are separately positioned along a lineparallel to the linear movement axis of the X-stage 620. In yet anotherexample, rotating the sample stage 614 and each of the one or moretesting locations respective angle values (e.g., Θ_(T1-4)) intorespective coincidence with the translational axis of the translationalstage includes moving the testing locations 2620 into coincidence with atranslational axis aligned or coincident with the working region (thefocal point or probe tip) of the instruments 610, 612 and parallel to amovement axis of one of the translation stages 620, 622. By rotating thetesting locations into alignment with a single translational axisextending through the working region, translational movement with, forinstance the X-stage 620, is able to move the testing location 2620 intocoincidence with the instrument 610, 612.

The testing locations 2620 in coincidence with the translational axis(e.g., on a line parallel to the translational axis) are translated Rvalues, such as R_(T1-4), to move the testing locations 2620 intoalignment or coincidence with the working regions (e.g., region 2716 orthe probe tip 702 shown in FIG. 27B) of the optical and mechanicaltesting instruments 612, 610. Rotating of the sample stage 614 and thetesting location 2620 of interest for the testing procedure intocoincidence with the translational axis substantially eliminatestranslation along a second translational axis different from the firsttranslational axis (such as the Y axis of the Y-stage 622). Forinstance, the testing locations 2620 positioned away from the stage andsample X and Y axes 2602, 2604 and 2614, 2616 are positioned along thetranslational axis (i.e., the linear axis of movement) of the X-stage620 to substantially eliminate translation of the sample stage 614 andthe testing locations 2620 of the sample 2610 for instance along anothertranslation axis such as the axis of the Y-stage 622. Optionally, thestage 614 is translated first according to the R_(T1-4) of each of thetesting locations 2620 and thereafter rotated according to the Θ_(T1-4)of each of the locations.

A prophetic example is provided below that determines the coordinatesand relative positions of the first and second reference points 2622 and2618 of the sample 2610 as well as the sample stage reference point 2606(in one example the center of the stage 614) and then uses correspondingvalues (r, φ, α and the like) to determine the translational and angularcoordinates for one or more testing locations 2620. The propheticexample is conducted according to the methods described herein and shownin the Figures. The prophetic example is provided as a series of steps.It will be apparent that many of the steps in the prophetic example maybe rearranged or modified and continue to come within the umbrella ofmethods and apparatus described herein. Modifications of the samplestage shape, specified reference points (i.e., non-center points) andthe like will modify the steps and corresponding mathematical analysisused herein, and such modifications are fully within the scope of thedisclosure.

Machine Setup/Initialization

-   1. Home the X-stage 620, Y-stage 622, Z1—first instrument stage 608,    Z2—second instrument stage 608 and the Theta stage 624.-   2. Perform a Tip to Optics Calibration—This procedure allows the    machine to make a mark on a sample and then move the mark precisely    under the optics for viewing by the operator.    -   a. Attach a Sample (e.g., an initialization sample) such as        Polycarbonate to the stage 614. Optionally, may used one of the        diagnostic samples 1106 at the stage receptacles 628 on the        stage receptacle flange 630.    -   b. Use the GUI (e.g., the control station 110) to manually move        the X,Y,Theta, and Z1 stages so the sample is located under the        optical instrument 610 and the optics are focused on the sample.    -   c. Perform an H-Pattern marking 2710 (or other similar pattern        to assist in calibration) for the Tip to Optics Calibration        including:        -   i. The automated testing system 600 will move the X and            Y-stages 620, 622 the nominal offset distance between the            tip and optics (e.g., the mechanical testing instrument 612            and the optical instrument 610) so the tip 702 is            approximately over the same sample location that was viewed            with the optics. The Theta stage 624 is static.        -   ii. The GUI control station 110 will instruct the operator            to manually move the Z1 stage 608 down until the tip 702 is            within about 1 mm of the sample height.        -   iii. The GUI control station 110 will slowly (e.g., at a            slower pace than the initial approach) continue to move the            Z1 stage 608 down until it detects contact with the sample.        -   iv. The mechanical testing instrument 612 will perform a            series of 7 indents in the shape of an H to form the marking            2710.        -   v. The automated testing system 600 will return the X, Y,            and Z1 stages 620, 622 and 608 to the original optics            position.        -   vi. The GUI control station 110 will instruct the operator            to move the X and Y-stages 620, 622 until the center of the            H pattern marking 2710 (e.g., the location focus 2714) is            aligned with reticle in the camera. Optionally, pattern            recognition software instructs and controls the optical            instrument 610 in a similar manner to find the location            focus 2714.        -   vii. The automated testing system 600 will calculate and            record the exact X, Y, and Z1 displacement between the tip            and the optics locations (e.g., the instrument offset            composite 2722 between the mechanical testing and optical            instruments 612, 610).-   3. Perform a Center of Rotation Calibration—This procedure assists    in achieving accurate alignment of testing locations 2620 on the    sample 2610 with one or more instruments. This procedure locates the    center of rotation of the stage 614 within a tolerance of around    about 1 micron.    -   a. Mount a sample such as a Polycarbonate initialization sample        or another material on the stage 614 that covers the center of        rotation of the stage 614 (e.g., the axis of rotation provided        by the rotational stage 624).    -   b. Use the GUI control station 110 to manually move the X, Y,        and Z1 stages 620, 622 and 608 to position the center of        rotation of the stage 614 approximately under the optical        instrument 610 with the optical instrument focused on the        sample.    -   c. Implement the Center of Rotation Location Calibration with        the control station 110.        -   i. The automated testing system 600 moves the X, Y, and Z1            stages 620, 622, 608 the Tip to Optics offset determined            above to move the mechanical testing instrument 612 over the            location focused on with the optical instrument 610.        -   ii. The automated testing system 600 marks the sample with a            marking 2710 (e.g., an H pattern of 7 indents) at the            location.        -   iii. The rotational stage 624 rotates the sample stage 614            120 degrees and the mechanical testing instrument 612            provides another marking 2710 (e.g., another H pattern). The            X and Y-stages 620, 622 are static.        -   iv. The rotational stage 624 rotates the sample stage 614            120 more degrees (240 degrees total) and provides a third            marking 2710.        -   v. The X,Y, Theta, and Z1 instrument stages 620, 622, 624,            608 are returned to their original positions to position the            first marking 2710 under the optical instrument 610 and in            focus. The first marking 2710 is centered under the reticle            of the optical instrument 610.        -   vi. The GUI control station 110 prompts the user to locate            the other two markings 2710 (e.g., H-patterns of indents) by            manually operating the X and Y-stages 620, 622. The            rotational stage 624 is static. Optionally, the control            station 110 includes pattern recognition software to detect            and index the markings 2710 or the each of the markings 2170            are indexed as they are marked on the sample.        -   vii. The user (or software control algorithm) moves the            stages 620, 622 until the location focus 2714 of each            marking 2710 is aligned with the camera reticle of the            optical instrument 610. The automated testing system 600            will record (e.g., index) the X and Y stage coordinates of            the center of each H-pattern: X₀, Y₀; X₁₂₀, Y₁₂₀; X₂₄₀,            Y₂₄₀; Optionally, the control station 110 includes pattern            recognition software to detect and index the markings 2710            or the each of the markings 2170 are indexed as they are            marked on the sample.        -   viii. The automated testing system 600 fits a circle (e.g.,            a stage center circle 2820) to the three sets of X and Y            coordinates corresponding to the markings 2710. The center            of the fit circle is the X-Y stage coordinates for the            center of rotation 2606 of the sample stage 614. The center            of rotation coordinates are (X_(center), Y_(center)). The            analysis below provides one example of mathematical            equations for determining the center of rotation 2606 from            the coordinates of the markings 2710. “r” is the radius of            the stage center circle 2820.

$\begin{matrix}{\mspace{79mu} {{{( {X_{0} - X_{C}} )^{2} + ( {Y_{0} - Y_{C}} )^{2}} = r^{2}}\mspace{79mu} {{( {X_{120} - X_{C}} )^{2} + ( {Y_{120} - Y_{C}} )^{2}} = r^{2}}}} & \; \\{\mspace{79mu} {{{( {X_{240} - X_{C}} )^{2} + ( {Y_{240}Y_{C}} )^{2}} = r^{2}}{{X_{0}^{2} - {2X_{0}X_{C}} + X_{C}^{2} + Y_{0}^{2} - {2Y_{0}Y_{C}} + Y_{C}^{2}} = {X_{120}^{2} - {2X_{120}X_{C}} + X_{C}^{2} + Y_{120}^{2} - {2Y_{120}} - {2Y_{120}Y_{C}} + Y_{C}^{2}}}{{X_{240}^{2} - {2X_{240}X_{C}} + X_{C}^{2} + Y_{240}^{2} - {2Y_{240}Y_{C}} + Y_{C}^{2}} = {X_{120}^{2} - {2X_{120}X_{C}} + X_{C}^{2} + Y_{120}^{2} - {2Y_{120}Y_{C}} + Y_{C}^{2}}}}} & \; \\{\mspace{79mu} {{{X_{0}^{2} - {2X_{0}X_{C}} + Y_{0}^{2} - {2Y_{0}Y_{C}}} = {X_{120}^{2} - {2X_{120}X_{C}} + Y_{120}^{2} - {2Y_{120}Y_{C}}}}{{X_{240}^{2} - {2X_{240}X_{C}} + Y_{240}^{2} - {2Y_{240}Y_{C}}} = {X_{120}^{2} - {2X_{120}X_{C}} + Y_{120}^{2} - {2Y_{120}Y_{C}}}}\mspace{79mu} {X_{C} = \frac{X_{120}^{2} + Y_{120}^{2} - {2Y_{120}Y_{C}} - X_{0}^{2} - Y_{0}^{2} + {2Y_{0}Y_{c}}}{2( {X_{120} - X_{0}} )}}\mspace{79mu} {X_{C} = \frac{X_{120}^{2} + Y_{120}^{2} - {2Y_{120}Y_{C}} - X_{240}^{2} - Y_{240}^{2} + {2Y_{240}Y_{C}}}{2( {X_{120} - X_{240}} )}}\begin{matrix}{\mspace{79mu} {X_{C} = \frac{X_{120}^{2} + Y_{120}^{2} - {2Y_{120}Y_{C}} - X_{0}^{2} - Y_{0}^{2} + {2Y_{0}Y_{C}}}{2( {X_{120} - X_{0}} )}}} \\{= \frac{X_{120}^{2} + Y_{120}^{2} - {2Y_{120}Y_{C}} - X_{240}^{2} - Y_{240}^{2} + {2Y_{240}Y_{C}}}{2( {X_{120} - X_{240}} )}}\end{matrix}{{\frac{X_{120}^{2} + Y_{120}^{2} - X_{0}^{2} - Y_{0}^{2}}{2( {X_{120} - X_{0}} )} + \frac{{2Y_{0}Y_{C}} - {2Y_{120}Y_{c}}}{2( {X_{120} - X_{0}} )}} = {\frac{X_{120}^{2} + Y_{120}^{2} - X_{240}^{2} - Y_{240}^{2}}{2( {X_{120} - X_{240}} )} + \frac{{2Y_{240}Y_{C}} - {2Y_{120}Y_{C}}}{2( {X_{120} - X_{240}} )}}}}} & \; \\{{{\frac{X_{120}^{2} + Y_{120}^{2} - X_{0}^{2} - Y_{0}^{2}}{( {X_{120} - X_{0}} )} - \frac{X_{120}^{2} + Y_{120}^{2} - X_{240}^{2} - Y_{240}^{2}}{( {X_{120} - X_{240}} )}} = {\frac{{2Y_{240}Y_{C}} - {2Y_{120}Y_{C}}}{( {X_{120} - X_{240}} )} - \frac{{2Y_{0}Y_{C}} - {2Y_{120}Y_{C}}}{( {X_{120} - X_{0}} )}}}{{{( {X_{120}^{2} + Y_{120}^{2} - X_{0}^{2} - Y_{0}^{2}} )( {X_{120} - X_{240}} )} - {( {X_{120}^{2} + Y_{120}^{2} - X_{240}^{2} - Y_{240}^{2}} )( {X_{120} - X_{0}} )}} = {{( {{2Y_{240}Y_{C}} - {2Y_{120}Y_{C}}} )( {X_{120} - X_{0}} )} - {( {{2Y_{0}Y_{C}} - {2Y_{120}Y_{C}}} )( {X_{120} - X_{240}} )}}}} & \; \\{\mspace{79mu} {Y_{C} = \frac{\begin{matrix}{{( {X_{120}^{2} + Y_{120}^{2} - X_{0}^{2} - Y_{0}^{2}} )( {X_{120} - X_{240}} )} -} \\{( {X_{120}^{2} + Y_{120}^{2} - X_{240}^{2} - Y_{240}^{2}} )( {X_{120} - X_{0}} )}\end{matrix}}{{( {{2Y_{240}} - {2Y_{120}}} )( {X_{120} - X_{0}} )} - {( {{2Y_{0}} - {2Y_{120}}} )( {X_{120} - X_{240}} )}}}} & \;\end{matrix}$

Deskewing

-   1. The robotic handling system 200 pulls a sample 2610 from the    storage module 104.    -   a. The sample 2610 is roughly centered on the handling fork 404.    -   b. The sample 2610 is roughly oriented with its sample        orientation feature 2618 (e.g., a notch) in a known direction.-   2. The robotic handling system 200 loads the sample 2610 onto the    sample stage 614. The elevation pins 634 lower the sample 2610 on to    the sample stage surface 616. Optionally, vacuum ports 632 vacuum    couple the sample 2610 to the sample stage 614.-   3. Implement the Procedure to Determine the First Reference Point of    the Sample (Translational Deskewing)—This procedure locates the    sample 2610 for the automated testing system 600 within a linear    tolerance of around about 1 micron. Finding the first reference    point of the sample 2610, such as the center 2622 improves the    accuracy of automated test site location.

a. The Y-stage 622 moves so the Y coordinate of the center of rotationof the stage 614 is aligned with the Y location of the reticle in theoptical instrument 610 (e.g., the optical working region 2716).

-   -   b. Optionally, the Z1 stage 608 moves to focus the optical        instrument 610 on the sample 2610.    -   c. The rotational stage 624 moves to three different positions        approximately 120 degrees apart including positions on the        sample 2610 that avoid positioning the wafer orientation feature        2618 (e.g., a notch or flat) within the optical instrument        working region 2716.    -   d. At each of the three different rotational positions (e.g., 0,        120 and 240 degrees), starting at a position where the optical        instrument 610 is focused on the sample 2610, the X-stage 620        moves in a direction that will eventually move the sample 2610        out from the optical working region 2716.    -   e. At each of the three rotational positions, an edge detecting        vision algorithm (e.g., provided in the control station 110)        records the exact translation value of the X-stage 620 where the        edge 2922 of the sample 2610 lines up with the optical        instrument 610 corresponding to the sample edge locations 2924.    -   f. These three translational and rotational coordinates of the        sample edge (X, and Theta measurements of, for instance 0, 120        and 240 degrees) are used to calculate the r, φ location of the        center 2622 of the sample 2610 relative to the center of        rotation 2606 of the stage 614. See FIGS. 26C and 29B. The φ        value is the first reference angular offset of the sample center        relative to the stage center of rotation 2606.

-   4. Implement the Procedure to Determine the Second Reference Point    of the Sample (Rotational Deskewing)—This procedure determines the    orientation of the sample orientation feature 2618 relative to the    sample stage 614 (by way of the sample center 2622). The procedure    determines the sample 2610 orientation to within a tolerance on the    order of around about 0.001 degrees.    -   a. The X,Y, and rotational stages 620, 622, 624 move to focus        the optical instrument working region 2716 on a position near        the sample edge 2922 of the sample 2610 and in the general        vicinity of the sample orientation feature 2618 (e.g., the theta        angle).    -   b. The Y-stage 622 is operated to position the center 2622 of        the sample 2610 in alignment with the optical instrument 610.

Y _(sample center) =Y _(center) +r*sin(φ+theta)

-   -   c. The X-stage 620 is operated to position the center 2622 of        the sample 2610 just inside the sample edge 2922 of the sample.        In one example, the sample 2610 is a 150 mm radius        semi-conductor wafer.

X _(sample edge) =X _(center)+149+r*cos(φ+theta)

-   -   d. The rotational stage 624 is operated to rotate sample 2610.        An edge detecting vision algorithm is used with the optical        instrument 610 to detect the angular measures of both feature        portions 3020, 3022 (e.g., the edges of the notch or flat) of        the sample orientation feature 2618.    -   e. The average of the two angular measures, for instance        theta_(s) and theta₂, is the α value (e.g., the second reference        angular offset) for the actual orientation of the wafer.

Automated Test Site Location

-   1. The coordinates of one or more testing locations 2620 are input    (e.g., read from instructions, hand keyed and the like) according to    the sample coordinate system 2612 (x_(w),y_(w) including for    instance the X and Y coordinates for T₁₋₄ shown in FIG. 26B).    Optionally, the coordinates are input at the control station 110. In    another example, all testing locations for that type of sample    (e.g., a semiconductor wafer with a diameter of 300 mm) will be    stored in the measurement recipe in the control station 110.-   2. One or more of the control station 110 or the automated testing    system 600 calculates the stage coordinates (X,Y, Θ) from the sample    coordinates based on the sample coordinate system 2612 needed to    place the optical instrument 610 or the mechanical testing    instrument 612 over each of the testing locations 2620 according to    the following equations that incorporate the previously determined    values for r, φ and α:

Θ=A TAN 2(y _(w) ,x _(w))+α

-   -   The Θ value is used to rotate the sample 2610 with the        rotational stage 624 so the desired testing location 2620 is in        line with the Y-location of the center of the optics. In other        words, the testing location is on a line through the center of        the sample and parallel to the Y translational axis of the        Y-stage 622 after the Θ rotation.

X=X _(center) +r*cos(Θ+φ)+x _(w)*cos(α+Θ)−y _(w)*sin(α+Θ)

-   -   The X value is used to translate the sample 2610 with the        X-stage 620 so the desired testing location 2620 is aligned with        one of the optical and mechanical testing instruments 610, 612.

Y=Y _(center) +r*sin(Θ+φ)

-   -   The Y value is used to optionally translate the sample 2610 with        the Y-stage 622 so the desired testing location 2620 is aligned        with one of the optical and mechanical testing instruments 610,        612. Translation according to the Y value is in one example        optional. For instance, where there is a misalignment between        the optical and mechanical testing instruments 610, 612 along        the Y axis of the Y-Stage 622, the Y value corrects for this        misalignment and positions the testing location in alignment        with either of the instruments.

-   3. Where the X, Y and Θ coordinates are used to position the desired    testing location 2620 in alignment with the optical instrument, the    X and Y stages 620, 622 are operated to move the desired testing    location 2620 into alignment with the mechanical testing instrument    610 (e.g., the location of the probe 702) according to the Tip to    Optics calibration offset (e.g., the instrument offset composite    2722 including one or more of the Y and Y instrument offsets 2718,    2720).

The combination of x-y-theta (rotational) positioning (as opposed to x,ypositioning alone) described in the example above and herein, allows forthe minimal cantilevering of the instruments on the cantileveredinstrument column Stated another way, through a combination of x, ypositioning along with rotation, all portions of a 300 mm wafer arepositionable beneath the mechanical testing instrument with an armconfigured to position the instrument across the radius of the wafer(e.g., 150 mm). An X-Y only system would require at least 300 mm ofcantilever or a bridge structure having a large mass, footprint, and insome cases a natural frequency that is not cooperative with thefrequencies of the automated testing system 100 but is dictated by themass of the bridge.

Further, the x-y-theta stage includes an X stage with a larger range oftranslation available than the Y stage. This allows the X stage to havesufficient travel to move at least one radius of the wafer (150 mm)under the optics and 2 transducer heads (an additional 150 mm). The Ytravel is long enough to accommodate the small difference in Y positionsbetween the optics and transducer heads (several millimeters).

The x-y-theta positioning of the sample stage 614 therebycorrespondingly minimizes the length of the cantilevered arm of theinstrument column 606. The system with the short cantilevered arm (e.g.,the cantilevered instrument column 606 in FIG. 6A) is thereby moreresistant to mechanical noise (has a high stiffness without an extensivearm that is prone to deflection). Deflections of cantilevers increasewith the cube of the cantilever length so reducing the cantilever lengthby a factor of 2 reduces the deflections by a factor of 8 for the samebeam cross section and loading.

The footprint of the system 600 (See FIG. 6A) with the short arm and thecompactly moving stage is minimal. In other words, a compactcantilevered arm 606 in combination with a compact x-y-theta stagesystem 614 fits within a smaller enclosure (e.g., the automated testingenclosure 108) and assumes less space on the factory floor. Conventionalsupport structures, such as a bridge or arch assembly extending toeither side of the sample stage with corresponding support legs and x-ystage assemblies (and corresponding enlarged footprints) are not needed.

CONCLUSION

The systems and methods described herein provide a rapid and accuratemethod for testing multiple samples with multiple testing locationsdirectly or near directly from production. Each of the systems andmethods further provide one or more of functions and benefits providedherein. For instance, the systems provide an orderly and efficientprocess for conducting micro- and nanomechanical testing on a series ofsamples with a minimum of system downtime between sample tests.Additionally, the systems and methods facilitate high throughput testingthat acquires greater and more accurate to statistical sampling data onthe tested materials.

Further, the systems and methods described herein provide a system thatminimizes surface contamination of material samples prior and subsequentto conducting micro- and nanomechanical testing in order to achieveaccurate test data even where the samples are taken immediately fromproduction or are in-line with production.

Further still, the systems and methods described herein precisely moveand control the material samples into and out of a nanomechanicaltesting instrument in order to minimize damage or breakage ofnanomechanical testing system components as well as material samples.

Moreover, the systems and methods significantly reduce the average,per-test costs associated with testing a relatively high volume ofmaterial samples and reduce yield loss. Further, the systems and methodsreduce measurement error through, for instance, operator interaction. Byreducing operation interaction labor costs are reduced and facilitiesare efficiently used, including eliminating the cost and labor formaintaining a smaller clean room environment. For instance, the indexingof samples relative to the coordinate systems and instruments of theautomated testing system through the analysis of each sample aspositioned on the sample stage allows for accurate and precisepositioning of one of more testing locations (e.g., specified testinglocations of a heterogeneous sample) relative to the instruments.Further still, the provision of the probe change assembly (orassemblies), diagnostic samples, methods for analyzing the probe,calibrating the automated testing system according to thecharacteristics of the probe and the like further minimize operatorinteraction and decrease system downtime.

The systems and methods described herein collect, manage and monitorquality control data relative to tested samples and enable long-termtracking of material sample data, to utilize material sample data toidentify real-time production line problems and to correlate this datato long-term material and/or device performance.

Further, in another example, the systems and methods automaticallyidentify test locations on the material surface prior to conductingmicro- and nanomechanical testing to achieve accurate test data on theregion of interest.

The non-limiting examples shown in the figures and description hereincan be combined in any permutation or combination. That is to say, thefeatures shown in any one example (figure, passage and the like) arecombinable with other examples described herein alone or with otherfeatures. Further, features found in various claims whether dependent orindependent claims may be combined with other examples, claims and thelike by themselves or in combination with other claimed and unclaimedfeatures described herein. Furthermore, any reference to numberedelements in the descriptions of the methods is not intended to belimited to the numbered elements described. Instead, the numberedelements are provided for exemplary purposes only. The numbered elementsare intended to include all similar elements described herein as well astheir equivalents.

Various Notes & Examples

Example 1 can include a testing system including a multiple degree offreedom stage for aligning a sample with an instrument configured formechanical testing at micron or less scale, the testing systemcomprising a instrument column including a column base and an instrumentarm extending from the column base; an instrument coupled with theinstrument arm; a multiple degree of freedom sample stage assemblyincluding: a sample stage, and a stage actuator assembly including atleast one translational actuator and a rotational actuator, and thestage actuator assembly is configured to selectively align substantiallyall locations between the instrument and the sample stage with theinstrument through actuation of the at least one of the translationalactuator and the rotational actuator.

Example 2 can include, or can optionally be combined with the subjectmatter of Example 1, to optionally include wherein the instrument arm iscantilevered and extends from the column base less than a sample stagelength of the sample stage.

Example 3 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 or 2 to optionallyinclude wherein the sample stage includes a sample stage footprint basedon the range of translation and rotation provided by the at least onetranslational actuator and the rotational actuator, and at least a firstdimension of the sample stage footprint is substantially similar to asample stage length.

Example 4 can include, or can optionally be combined with the subject tomatter of one or any combination of Examples 1 through 3 to optionallyinclude wherein a testing system footprint of the testing systemincludes: the sample stage footprint, and a column footprint of theinstrument column bounded by the column base.

Example 5 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 4 to optionallyinclude wherein the at least one translational actuator includes anX-stage actuator and a Y-stage actuator, the X and Y-stage actuators arerespectively configured to translate the sample stage along X and Yaxes, and a Y-axis translation range of the sample stage is coextensivewith the first dimension of the sample stage footprint.

Example 6 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 5 to optionallyinclude wherein an X-axis translation range of the sample stage iscoextensive with a second dimension of the sample stage footprint, andthe X-axis translation range is greater than the Y-axis translationrange.

Example 7 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 6 to optionallyinclude wherein the instrument includes an instrument footprint smallerthan a sample stage footprint, and the stage actuator assembly isconfigured to selectively align substantially all locations of thesample stage with the instrument footprint.

Example 8 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 7 to optionallyinclude an instrument actuator configured for moving the instrumentorthogonally relative to the sample stage.

Example 9 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 8 to optionallyinclude wherein the at least one translational actuator includes anX-stage actuator and a Y-stage actuator, the X and Y-stage actuators arerespectively configured to translate the sample stage along X and Yaxes.

Example 10 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 9 to optionallyinclude a method for selectively aligning and testing one or moretesting locations with an instrument, the method comprising coupling asample on a sample stage of a testing system, the sample includes one ormore testing locations spaced apart on the sample, wherein the testingsystem includes: an instrument configured for one or more of testing orobservation of the sample, and the sample stage; aligning a testinglocation of the one or more testing locations with the instrument,aligning the testing location includes: rotating the sample stage andthe testing location toward alignment with a working region of theinstrument, and translating the sample stage and the testing locationtoward alignment with the working region of the testing instrument; andtesting the testing location of the one or more testing locations withthe instrument.

Example 11 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 10 to optionallyinclude wherein testing includes one or more of mechanical testing orobservation at micron or less scale with the instrument.

Example 12 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 11 to optionallyinclude wherein translating the sample stage includes: translating thesample stage along an X axis, and constraining translation of the samplestage along a Y axis substantially parallel to a cantilevered instrumentarm coupled with the instrument.

Example 13 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 12 to optionallyinclude wherein constraining translation of the sample stage along the Yaxis includes translating the sample stage along the Y axis between theinstrument and another instrument.

Example 14 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 13 to optionallyinclude wherein aligning the testing location of the one or more testinglocations with the instrument includes rotating the sample stage androtating the testing location into coincidence with the X axis where thetesting location has an original non-zero Y location relative to the Yaxis.

Example 15 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 14 to optionallyinclude aligning the testing location with the instrument includestranslating and rotating the sample stage and the sample within a samplestage footprint bounded by outermost perimeter surfaces of the samplestage relative to the instrument in a plurality of orientationsconfigured to selectively align the instrument with substantially theentire surface area of the sample stage.

Example 16 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 15 to optionallyinclude wherein aligning the testing location with the instrumentincludes translating and rotating the sample stage and the sample withinthe sample stage footprint, and the sample stage footprint is within atesting system footprint including the sample stage footprint and acolumn footprint bounded by a column base of a cantilevered instrumentcolumn coupled with the instrument.

Example 17 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 16 to optionallyinclude wherein aligning the testing location of the one or more testinglocations with the instrument includes: determining first X and Ycoordinates for the testing location relative to an origin of a samplecoordinate system of the sample, transforming the first X and Ycoordinates into an angle value and a translational value for arotational stage and at least one translational stage coupled with thesample stage, respectively, rotating the sample stage and the testinglocation includes rotating the testing location the angle value intocoincidence with a translational axis of the translational stage, andtranslating the sample stage and the testing location includestranslating the testing location the translational value parallel to thetranslational axis.

Example 18 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 17 to optionallyinclude wherein aligning the testing location of the one or more testinglocations includes aligning at least one of an X and Y axis of thesample coordinate system with the instrument.

Example 19 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 18 to optionallyinclude rotating the sample stage and the each of the one or moretesting locations respective angle values into respective coincidencewith the translational axis of the translational stage, and rotating thesample stage eliminates translation along a second translational axisdifferent from the translational axis because of differing Y coordinatesof a plurality of testing locations where the one or more testinglocations includes the plurality of testing locations.

Example 20 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 19 to optionallyinclude indexing and deskewing the sample with the one or more testinglocations, indexing and deskewing including: indexing the position andorientation of the sample relative to the sample stage, the sampleincludes first and second reference points and the sample stage includesa sample stage reference point, indexing including: determining a firstreference position of the first reference point relative to the samplestage reference point, and determining a second reference angular offsetof the second reference point relative to the first reference point.

Example 21 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 20 to optionallyinclude wherein determining the first reference position of the firstreference point includes: determining a radius of the first referencepoint from the sample stage reference point, and determining a firstreference angular offset of the first reference point relative to thesample stage reference point.

Example 22 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 21 to optionallyinclude determining the first reference point of the sample, wherein thefirst reference point is a center of the sample, and the sample iscircular, determining the first reference point including: sensing acircular edge location of a plurality of circular edge locations of asample edge, sensing including: translating the sample stage and thesample edge toward the optical instrument, detecting the circular edgelocation with the optical instrument as the optical instrument crossesover the sample edge, indexing the circular edge location relative tothe sample stage reference point, and rotating the sample stage and thesample a specified angle measure; repeating the sensing of the circularedge location after each rotation until three or more circular edgelocations are indexed; and determining the center of the sample from acircle having a perimeter coincident with the three or more circularedge locations.

Example 23 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 22 to optionallyinclude aligning an optical instrument with the sample stage referencepoint along at least a first translational axis;

Example 24 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 23 to optionallyinclude wherein translating the sample stage and the sample edge towardthe optical instrument includes translating the sample stage along asecond translational axis different from the first translational axis.

Example 25 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 24 to optionallyinclude wherein determining the second reference angular offset of thesecond reference point includes: translating the sample stage and thesample along a first translational axis relative to the opticalinstrument to a location near an edge of the sample and the secondreference point, wherein the optical instrument is aligned with thesample, rotating the sample stage, detecting the second reference pointwith the optical instrument, the second reference point having a secondreference angular offset relative to the first reference point accordingto the rotation of the sample stage and the sample.

Example 26 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 25 to optionallyinclude aligning an optical instrument with a second translational axiscoincident with the first reference point, the second translational axisis orthogonal to the first translational axis,

Example 27 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 26 to optionallyinclude wherein detecting the second reference point includes detectingfirst and second portions of the second reference point, wherein each ofthe first and second portions includes respective first and secondangular measurements.

Example 28 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 27 to optionallyinclude wherein detecting the second reference point includes averagingthe first and second angular measurements and the average of the firstand second angular measurements is the second reference angular offset.

Example 29 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 28 to optionallyinclude determining an instrument offset between an optical instrumentand the instrument, determining the instrument offset including: markingthe sample with a mark at a first offset marking location on the samplewith the instrument, wherein the instrument is aligned with the mark,translating the sample stage and the mark at the first offset markinglocation of the sample into alignment with the optical instrument, andmeasuring the translation of the sample stage from alignment of the markwith the instrument to alignment of the mark with the opticalinstrument, and the instrument offset is equivalent to the measuredtranslation.

Example 30 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 29 to optionallyinclude determining the center of rotation of the sample stageincluding: marking the sample at a plurality of locations including:marking the sample at a first location of the plurality of locationswith the instrument, and rotating the sample stage and the sample aspecified angle measure, wherein the sample stage and the sample aretranslationally static relative to a base; repeating marking of thesample at second and third locations of the plurality of locationsaccording to the repeated rotation of the sample stage and the sample;and determining the center of rotation of the sample stage from a circlehaving a perimeter coincident with the plurality of locations, thecenter of rotation coincident to a center of the circle.

Example 31 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 30 to optionallyinclude translating the sample stage and the sample between theplurality of locations; observing each of the marks at the plurality oflocations with an optical instrument, wherein the marks are indents;indexing the marks at the plurality of locations; and determining thecenter of rotation of the sample stage includes forming the circlehaving the perimeter coincident with each of the indexed marks at theplurality of locations, the center of rotation coincident to the centerof the circle.

Example 32 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 31 to optionallyinclude a method for automatically examining an instrument probe coupledwith a mechanical testing instrument configured to performing mechanicaltesting at micron scale or less, the method comprising determining if aninstrument probe use threshold is achieved, the instrument probe iscoupled with a transducer, and the transducer is configured to move theinstrument probe, measure an instrument probe indentation depth andmeasure force applied to the instrument probe through the transducer;and conducting a probe check operation once the instrument probe usethreshold is achieved, the probe check operation includes: aligning theinstrument probe with a diagnostic sample, indenting the instrumentprobe into the diagnostic sample, measuring one or more of theindentation depth, indentation force or a sample mechanical parameterwith the transducer, and determining the instrument probe requires oneof calibration or replacement if one or more of the measured indentationdepth, the measured indentation force or the sample mechanical parameterare outside of an indentation threshold range, an indentation forcethreshold range or a sample mechanical parameter threshold range of thediagnostic sample, respectively.

Example 33 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 32 to optionallyinclude wherein determining if the instrument probe use threshold isachieved includes: counting the number of transducer operations, anddetermining if the number of transducer operations are greater than atransducer operation count threshold.

Example 34 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 33 to optionallyinclude wherein determining if the transducer operation count thresholdis achieved includes adjusting the transducer operation count thresholdaccording to one or more of the material tested with the instrumentprobe and the force applied to the probe through the transducer.

Example 35 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 34 to optionallyinclude wherein determining if the transducer operation count thresholdis achieved includes adjusting the transducer operation count thresholdaccording to a specified accuracy range.

Example 36 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 35 to optionallyinclude wherein determining if the instrument probe use threshold isachieved includes: measuring one or more of the instrument probeindentation depth, force applied to the instrument probe through thetransducer or a sample mechanical parameter of a sample, and determiningthe instrument probe use threshold is met if one or more of theinstrument probe indentation depth, force applied to the instrument orthe sample mechanical parameter is outside of one or more of a specifiedindentation depth threshold range, a specified force threshold range ora specified sample mechanical parameter threshold range of the sample.

Example 37 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 36 to optionallyinclude wherein aligning the instrument probe with the diagnostic sampleincludes moving the diagnostic sample beneath the instrument probe.

Example 38 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 37 to optionallyinclude wherein moving the diagnostic sample beneath the instrumentprobe includes one or more of translating and rotating a sample stagesurface, wherein the sample stage surface includes a stage receptacleflange housing one or more diagnostic samples.

Example 39 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 38 to optionallyinclude wherein moving the diagnostic sample includes translating thesample stage surface along an X-axis and a Y-Axis.

Example 40 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 39 to optionallyinclude wherein moving the diagnostic sample includes rotating thesample stage surface around a Z-axis.

Example 41 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 40 to optionallyinclude wherein moving the diagnostic sample beneath the instrumentprobe includes a combination of translating and rotating a sample stagesurface from a first sample location where the instrument probe isaligned with the first sample location to a second diagnostic locationwhere the instrument probe is aligned with the diagnostic sample.

Example 42 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 41 to optionallyinclude conducting a probe calibration if one or more of the measuredindentation depth, the measured indentation force or the samplemechanical parameter are outside of the indentation threshold range, theindentation force threshold range or the sample mechanical parameterthreshold range, respectively, the probe calibration including:performing one or more indentations with the instrument probe againstthe diagnostic sample, each of the one or more indentations areconducted according to a specified array of one of indentation depths orindentation forces, each of the indentation depths and indentationsforces are different; measuring one of the indentation force or theindentation depth of each of the one or more indentations according tothe specified array of indentation depths or indentation forces;associating the respective measured indentation forces or the measuredindentation depths with the corresponding indentation depths orindentation forces of the specified array; calculating a probe areafunction for the instrument probe according to the relationship betweenthe associated indentation forces or indentation depths with theindentation depths or indentation forces of the specified array; andcalibrating functions for generating one or more of modulus and hardnessvalues for a sample according to the probe area function.

Example 43 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 42 to optionallyinclude conducting the probe check operation after calculation of theprobe area function, and determining the instrument probe requiresreplacement if one or more of the measured indentation depth, themeasured indentation force or the sample mechanical parameter areoutside of the indentation threshold range, the indentation forcethreshold range or the sample mechanical parameter threshold range ofthe diagnostic sample, respectively.

Example 44 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 43 to optionallyinclude a method for automatically examining a transducer response of amechanical testing instrument configured to perform mechanical testingat micron scale or less, the method comprising: determining if atransducer operation threshold is achieved, the transducer is coupledwith an instrument probe, and the transducer is configured to move theinstrument probe, measure the instrument probe movement and measure theforce applied to the instrument probe through the transducer; andconducting a space indentation operation with the transducer once thetransducer operation threshold is achieved, the space indentationoperation includes: moving the instrument probe into a position wherethe instrument probe will not engage a surface during the spaceindentation, applying a specified voltage to the transducer, measuringthe movement of the instrument probe caused by the application of thespecified voltage, and determining the transducer requires one or moreof calibration or service if the movement is outside of a specifiedmovement threshold for the specified voltage.

Example 45 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 44 to optionallyinclude wherein determining if the transducer operation threshold isachieved includes: counting the number of transducer operations, anddetermining if the number of transducer operations are greater than atransducer operation count threshold.

Example 46 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 45 to optionallyinclude wherein determining if the transducer operation threshold isachieved includes adjusting the transducer operation count thresholdaccording to one or more of the material tested with the instrumentprobe and the force applied to the probe through the transducer.

Example 47 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 46 to optionallyinclude wherein determining if the transducer operation threshold isachieved includes adjusting the transducer operation count thresholdaccording to a specified accuracy range.

Example 48 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 47 to optionallyinclude wherein determining if the transducer operation threshold isachieved includes determining that the transducer operation threshold isachieved if the transducer measures a force outside of a normaloperating force range.

Example 49 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 48 to optionallyinclude to a testing system including a probe changing assembly forcoupling and decoupling a probe of a mechanical testing instrumentconfigured for mechanical testing at micron or less scale, the probechanging assembly comprising: a probe magazine housing a plurality ofprobes, the probes are configured for mechanical testing at micron scaleor less; at least one probe change unit configured to: grasp one of theplurality of probes housed in the probe magazine, couple one of theplurality of probes with a probe receptacle of a mechanical testinginstrument, and decouple one of the plurality of probes from the probereceptacle of the mechanical testing instrument; and an actuator coupledwith the at least one probe change unit, and the actuator is configuredto move and align the at least one probe change unit with the probemagazine and the probe receptacle of the mechanical testing instrument.

Example 50 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 49 to optionallyinclude a mechanical testing instrument including: a transducer, and aprobe receptacle coupled with the transducer, the probe receptacle isconfigured to couple with at least one of the plurality of probes.

Example 51 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 50 to optionallyinclude wherein the actuator includes a multiple degree of freedomstage, the multiple degree of freedom stage includes: an X-stageconfigured to linearly move the at least one probe change unit along anX-axis, and a Y-stage configured to linearly move the at least one probechange unit along a Y-axis.

Example 52 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 51 to optionallyinclude wherein the actuator includes a theta stage coupled with atleast one of the X and Y-stages, the theta stage is configured to rotatethe at least one probe change unit about a Z-axis.

Example 53 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 52 to optionallyinclude wherein the actuator includes a multiple degree of freedomstage, the multiple degree of freedom stage includes: a sample stagesurface, a stage receptacle flange coupled with the sample stagesurface, and one or more stage receptacles, each of the one or morestage receptacles are sized and shaped to house one of to the at leastone probe change units.

Example 54 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 53 to optionallyinclude at least one diagnostic sample, the diagnostic sample is coupledwith the actuator, and the actuator is configured to move and align theat least one diagnostic unit with the probe receptacle of the mechanicaltesting instrument.

Example 55 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 54 to optionallyinclude wherein the at least one probe change unit includes: a mirrorarm, and a mirror coupled with the mirror arm, the mirror is directedtoward one or more of identification and calibration information on oneof the plurality of probes, where the probe is grasped by the at leastone probe change unit.

Example 56 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 55 to optionallyinclude an optical instrument coupled with the base, and the actuator isconfigured to move and align the mirror with the optical instrument.

Example 57 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 56 to optionallyinclude wherein the base includes a cantilevered instrument columnextending over the actuator.

Example 58 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 57 to optionallyinclude wherein the at least one probe change unit is configured tocouple a decoupled one of the plurality of probes with the probemagazine (i.e., replace it in the probe magazine).

Example 59 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 58 to optionallyinclude a probe change unit for changing instruments probes used inmechanical testing at micron scale or less, the probe change unitcomprising: a motor; a drive shaft coupled with the motor; a spindlecoupled with the drive shaft; a rotary clutch assembly coupled with thespindle; a probe changing tool coupled with the spindle, wherein therotary clutch is configured to provide locking rotary engagement betweenthe probe changing tool and the spindle in a probe decoupling rotationaldirection and selective slipping engagement between the probe changingtool and the spindle in a probe installing rotational direction; andwherein the probe changing tool is sized and shaped to non-rotatablycouple with an instrument probe configured for mechanical testing atmicron scale or less.

Example 60 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 59 to optionallyinclude a drive cap interposed between the probe changing tool and thespindle, the drive cap is engaged with the probe changing tool androtatably coupled with the spindle.

Example 61 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 60 to optionallyinclude wherein the rotary clutch includes: at least one pawl, the atleast one pawl includes a pawl head and a pawl tail, and the head ishingedly coupled with the spindle, and a biasing element configured tobias the tail away from the spindle.

Example 62 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 61 to optionallyinclude wherein the drive cap includes: at least one pawl receiver sizedand shaped to receive the pawl tail where the spindle is rotated in theprobe decoupling rotational direction, and a slipping engagement surfaceextending along the drive cap, and in the probe installing rotationaldirection the slip engagement surface and the at least one pawlcooperate to statically fix the drive cap and the probe changing toolwith the spindle at or below a torque threshold and to rotatably couplethe drive cap and the probe changing tool relative to the spindle abovethe torque threshold.

Example 63 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 62 to optionallyinclude wherein the biasing element is an elastomeric band receivedwithin a biasing element housing of the spindle.

Example 64 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 63 to optionallyinclude wherein the at least one pawl includes a first pawl and a secondpawl, and a pawl boss extends between the first and second pawls, thepawl boss is engaged with the biasing element.

Example 65 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 64 to optionallyinclude a slipping interface between the drive cap and a rotationalbearing coupled with the spindle.

Example 66 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 65 to optionallyinclude wherein the slipping interface includes a wave washer.

Example 67 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 66 to optionallyinclude a mirror arm, and a mirror directed toward one or more ofidentification and calibration information on an instrument probe wherethe instrument probe is coupled with the probe changing tool.

Example 68 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 67 to optionallyinclude wherein the probe changing tool includes an access port, and oneor more of the identification and calibration information are visiblethrough the access port where the instrument probe is coupled with theprobe changing tool.

Example 69 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 68 to optionallyinclude an optical instrument coupled with the base, and the actuator isconfigured to move and align the mirror with the optical instrument.

Example 70 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 69 to optionallyinclude a method for installing an instrument probe with a mechanicaltesting instrument configured for performing mechanical testing atmicron scale or less, the method comprising: aligning an instrumentprobe coupled with a probe change unit with a probe receptacle of themechanical testing instrument; moving one or more of the instrumentprobe or the probe receptacle into engagement with the other of theprobe receptacle or the instrument probe; coupling the instrument probewith the probe receptacle; and disengaging the instrument probe from theprobe change unit.

Example 71 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 70 to optionallyinclude wherein aligning the instrument probe with the probe receptacleincludes one or more of X-axis and Y-axis translating of the probechange unit.

Example 72 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 71 to optionallyinclude wherein aligning the instrument probe with the probe receptacleincludes rotating the probe change unit around a Z-axis.

Example 73 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 72 to optionallyinclude wherein aligning the instrument probe with the probe receptacleincludes actuating a multiple degree of freedom stage configured totranslate in the X and Y-axes and rotate around a Z-axis, the multipledegree of freedom stage includes: a sample stage surface, a stagereceptacle flange coupled with the sample stage surface, and one or morestage receptacles in the stage receptacle flange, each of the one ormore stage receptacles are sized and shaped to house the probe changeunit.

Example 74 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 73 to optionallyinclude wherein moving one or more of the instrument probe or the probereceptacle into engagement with the other of the probe receptacle or theinstrument probe includes translating the probe receptacle along aZ-axis with an instrument stage coupled with the mechanical testinginstrument.

Example 75 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 74 to optionallyinclude wherein coupling the instrument probe with the probe receptacleincludes rotating the instrument probe with the probe change unit.

Example 76 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 75 to optionallyinclude wherein rotating the instrument probe with the probe change unitincludes rotating a probe changing tool in a probe installing rotationaldirection, the probe changing tool is coupled with a spindle with arotary clutch providing a selectively slipping engagement between theprobe changing tool and the spindle.

Example 77 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 76 to optionallyinclude wherein coupling the instrument probe with the probe receptacleincludes: initially rotating the instrument probe with the probe changeunit in a probe decoupling rotational direction; measuring the forceincident on a transducer of the mechanical testing instrument; arrestingrotation of the probe in the probe decoupling rotational direction wherethe measured force incident on the transducer decreases below a threadinterface force threshold; and rotating the instrument probe with theprobe change unit in a probe installing rotational direction afterarresting rotation of the probe in the probe decoupling rotationaldirection.

Example 78 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 77 to optionallyinclude wherein coupling the instrument probe with the probe receptacleincludes counting steps of a step motor of the probe change unit, andarresting operation of the step motor when a step count threshold isachieved.

Example 79 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 78 to optionallyinclude checking coupling of the instrument probe with the probereceptacle including: measuring the force on a transducer of themechanical testing instrument after coupling of the instrument probe;and determining the instrument probe is coupled with the probereceptacle if the transducer measures a force corresponding with aninstrument probe weight.

Example 80 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 79 to optionallyinclude mounting the instrument probe in the probe change unit.

Example 81 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 80 to optionallyinclude wherein mounting the instrument probe in the probe change unitincludes: aligning the probe change unit with the instrument probe in aprobe magazine; moving one or more of the instrument probe or the probechange unit into engagement with the other of the probe change unit orthe instrument probe; and coupling the instrument probe with the probechange unit.

Example 82 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 81 to optionallyinclude decoupling a previously installed probe from the probereceptacle before coupling of the instrument probe with the probereceptacle.

Example 83 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 82 to optionallyinclude wherein decoupling the previously installed probe from the probereceptacle includes: aligning the probe change unit with the previouslyinstalled probe; coupling the previously installed probe with the probechange unit; and decoupling the previously installed probe from theprobe receptacle of the mechanical testing instrument.

Example 84 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 83 to optionallyinclude loading the previously installed probe within a probe magazine.

Example 85 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 84 to optionallyinclude wherein decoupling the previously installed probe from the probereceptacle includes rotating the previously installed probe with theprobe change unit.

Example 86 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 85 to optionallyinclude wherein rotation of the previously installed probe with theprobe change unit includes rotating a probe changing tool in a probedecoupling rotational direction, the probe changing tool is coupled witha spindle with a rotary clutch providing a locking rotary engagementbetween the probe changing tool and the spindle.

Example 87 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 86 to optionallyinclude reading one or more of identification data or calibration datafrom the instrument probe.

Example 88 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 87 to optionallyinclude wherein reading one or more of the identification data or thecalibration data includes: aligning a mirror with an optical instrument,wherein the mirror is directed toward one or more of identification orcalibration data on the instrument probe; reading one or more of theidentification or calibration data by way of the reflection of themirror toward the optical instrument.

Example 89 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 88 to optionallyinclude calibrating the one or more of the mechanical testing instrumentor the control or measurement functions for the mechanical testinginstrument according to the read calibration data.

Example 90 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 89 to optionallyinclude a method for initializing a testing system comprising:positioning a sample coupled with a sample stage in alignment with aninstrument, wherein the sample stage is configured for translational androtational movement relative to a base; deformably marking the samplewith marks at at least first, second and third marking locations withthe instrument; rotating the sample a specified angle measure betweeneach marking of the sample at the first, second and third markinglocations, wherein the sample stage and the sample are translationallystatic relative to the base; and determining the center of rotation ofthe sample stage from a circle having a perimeter coincident with atleast the markings at the first, second and third marking locations, thecenter of rotation coincident to a center of the circle.

Example 91 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 90 to optionallyinclude translating the sample stage and the sample between at least thefirst, second and third marking locations, wherein the sample stage andthe sample are rotationally static; observing each of the marks at thefirst, second and third marking locations with an optical instrument;indexing the marks at the first, second and third marking locations; andwherein determining the center of rotation of the sample stage includesdetermining the center of rotation from the circle having a perimetercoincident with the indexed marks.

Example 92 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 91 to optionallyinclude setting the center coordinates of the sample stage at the centerof rotation.

Example 93 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 92 to optionallyinclude wherein positioning the sample coupled with the sample stage inalignment with the instrument includes: positioning the sample and thesample stage in alignment with an optical instrument at the firstmarking location, and translating the sample and the sample stageaccording to an instrument offset to align the first marking locationwith the mechanical testing instrument, wherein the sample and thesample stage are rotationally static relative to the base.

Example 94 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 93 to optionallyinclude determining an instrument offset between an optical instrumentand the instrument, determining the instrument offset including:deformably marking the sample with an offset marking at a first offsetmarking location on the sample with the instrument, wherein theinstrument is aligned with the offset marking at the first offsetmarking location, translating the sample stage and the marking at thefirst offset marking location of the sample into alignment with theoptical instrument, and measuring the translation of the sample stagefrom alignment of the marking with the instrument to alignment of themarking with the optical instrument, and the instrument offset isequivalent to the measured translation.

Example 95 can include, or can optionally be combined with the subjectmatter of one or any combination of Examples 1 through 94 to optionallyinclude wherein deformably marking the sample at at least the first,second and third marking locations includes marking a specified patterninto the sample at at least one of the first, second and third indentinglocations, the specified pattern including: an identification notifier,and a location focus including the marking therein, wherein theidentification notifier is larger than the location focus.

Each of these non-limiting examples can stand on its own, or can becombined in any permutation or combination with any one or more of theother examples.

The above detailed description includes references to the accompanyingdrawings, which form a part of the detailed description. The drawingsshow, by way of illustration, specific embodiments in which thedisclosure can be practiced. These embodiments are also referred toherein as “examples.” Such examples can include elements in addition tothose shown or described. However, the present inventors alsocontemplate examples in which only those elements shown or described areprovided. Moreover, the present inventors also contemplate examplesusing any combination or permutation of those elements shown ordescribed (or one or more aspects thereof), either with respect to aparticular example (or one or more aspects thereof), or with respect toother examples (or one or more aspects thereof) shown or describedherein.

In the event of inconsistent usages between this document any documentsso incorporated by reference, the usage in this document controls.

In this document, the terms “a” or “an” are used, as is common in patentdocuments, to include one or more than one, independent of any otherinstances or usages of “at least one” or “one or more.” In thisdocument, the term “or” is used to refer to a nonexclusive or, such that“A or B” includes “A but not B,” “B but not A,” and “A and B,” unlessotherwise indicated. In this document, the terms “including” and “inwhich” are used as the plain-English equivalents of the respective terms“comprising” and “wherein.” Also, in the following claims, the terms“including” and “comprising” are open-ended, that is, a system, device,article, composition, formulation, or process that includes elements inaddition to those listed after such a term in a claim are still deemedto fall within the scope of that claim. Moreover, in the followingclaims, the terms “first,” “second,” and “third,” etc. are used merelyas labels, and are not intended to impose numerical requirements ontheir objects.

Method examples described herein can be machine or computer-implementedat least in part. Some examples can include a computer-readable mediumor machine-readable medium encoded with instructions operable toconfigure an electronic device to perform methods as described in theabove examples. An implementation of such methods can include code, suchas microcode, assembly language code, a higher-level language code, orthe like. Such code can include computer readable instructions forperforming various methods. The code may form portions of computerprogram products. Further, in an example, the code can be tangiblystored on one or more volatile, non-transitory, or non-volatile tangiblecomputer-readable media, such as during execution or at other times.Examples of these tangible computer-readable media can include, but arenot limited to, hard disks, removable magnetic disks, removable opticaldisks (e.g., compact disks and digital video disks), magnetic cassettes,memory cards or sticks, random access memories (RAMs), read onlymemories (ROMs), and the like.

The above description is intended to be illustrative, and notrestrictive. For example, the above-described examples (or one or moreaspects thereof) may be used in combination with each other. Otherembodiments can be used, such as by one of ordinary skill in the artupon reviewing the above description. The Abstract is provided to complywith 37 C.F.R. §1.72(b), to allow the reader to quickly ascertain thenature of the technical disclosure. It is submitted with theunderstanding that it will not be used to interpret or limit the scopeor meaning of the claims. Also, in the above Detailed Description,various features may be grouped together to streamline the disclosure.This should not be interpreted as intending that an unclaimed disclosedfeature is essential to any claim. Rather, inventive subject matter maylie in less than all features of a particular disclosed embodiment.Thus, the following claims are hereby incorporated into the DetailedDescription as examples or embodiments, with each claim standing on itsown as a separate embodiment, and it is contemplated that suchembodiments can be combined with each other in various combinations orpermutations. The scope of the disclosure should be determined withreference to the appended claims, along with the full scope ofequivalents to which such claims are entitled.

1. A testing system including a multiple degree of freedom stage foraligning a sample with an instrument configured for mechanical testingat micron or less scale, the testing system comprising: a instrumentcolumn including a column base and an instrument arm extending from thecolumn base; an instrument coupled with the instrument arm; a multipledegree of freedom sample stage assembly including: a sample stage, and astage actuator assembly including at least one translational actuatorand a rotational actuator, and the stage actuator assembly is configuredto selectively align substantially all locations between the instrumentand the sample stage with the instrument through actuation of the atleast one of the translational actuator and the rotational actuator. 2.The testing system of claim 1, wherein the instrument arm iscantilevered and extends from the column base less than a sample stagelength of the sample stage.
 3. The testing system of claim 1, whereinthe sample stage includes a sample stage footprint based on the range oftranslation and rotation provided by the at least one translationalactuator and the rotational actuator, and at least a first dimension ofthe sample stage footprint is substantially similar to a sample stagelength.
 4. (canceled)
 5. The testing system of claim 3, wherein the atleast one translational actuator includes an X-stage actuator and aY-stage actuator, the X and Y-stage actuators are respectivelyconfigured to translate the sample stage along X and Y axes, and aY-axis translation range of the sample stage is coextensive with thefirst dimension of the sample stage footprint.
 6. (canceled)
 7. Thetesting system of claim 1, wherein the instrument includes an instrumentfootprint smaller than a sample stage footprint, and the stage actuatorassembly is configured to selectively align substantially all locationsof the sample stage with the instrument footprint. 8-9. (canceled)
 10. Amethod for selectively aligning and testing one or more testinglocations with an instrument, the method comprising: coupling a sampleon a sample stage of a testing system, the sample includes one or moretesting locations spaced apart on the sample, wherein the testing systemincludes: an instrument configured for one or more of testing orobservation of the sample, and the sample stage; aligning a testinglocation of the one or more testing locations with the instrument,aligning the testing location includes: rotating the sample stage andthe testing location toward alignment with a working region of theinstrument, translating the sample stage and the testing location towardalignment with the working region of the testing instrument, and whereinthe sample stage is rotated and translated within a sample stagefootprint bounded by outermost perimeter surfaces of the sample stagerelative to the instrument in a plurality of orientations configured toselectively align the instrument with substantially the entire surfacearea of the sample stage; and testing the testing location of the one ormore testing locations with the instrument.
 11. (canceled)
 12. Themethod of claim 10, wherein translating the sample stage includes:translating the sample stage along an X axis, and constrainingtranslation of the sample stage along a Y axis substantially parallel toa cantilevered instrument arm coupled with the instrument.
 13. Themethod of claim 12, wherein constraining translation of the sample stagealong the Y axis includes translating the sample stage along the Y axisbetween the instrument and another instrument.
 14. The method of claim12, wherein aligning the testing location of the one or more testinglocations with the instrument includes rotating the sample stage androtating the testing location into coincidence with the X axis where thetesting location has an original non-zero Y location relative to the Yaxis. 15-16. (canceled)
 17. The method of claim 10, wherein aligning thetesting location of the one or more testing locations with theinstrument includes: determining first X and Y coordinates for thetesting location relative to an origin of a sample coordinate system ofthe sample, transforming the first X and Y coordinates into an anglevalue and a translational value for a rotational stage and at least onetranslational stage coupled with the sample stage, respectively,rotating the sample stage and the testing location includes rotating thetesting location the angle value into coincidence with a translationalaxis of the translational stage, and translating the sample stage andthe testing location includes translating the testing location thetranslational value parallel to the translational axis.
 18. The methodof claim 17, wherein aligning the testing location of the one or moretesting locations includes aligning at least one of an X and Y axis ofthe sample coordinate system with the instrument.
 19. The method ofclaim 17, comprising rotating the sample stage and the each of the oneor more testing locations respective angle values into respectivecoincidence with the translational axis of the translational stage, androtating the sample stage eliminates translation along a secondtranslational axis different from the translational axis because ofdiffering Y coordinates of a plurality of testing locations where theone or more testing locations includes the plurality of testinglocations.
 20. The method of claim 10 comprising indexing and deskewingthe sample with the one or more testing locations, indexing anddeskewing including: indexing the position and orientation of the samplerelative to the sample stage, the sample includes first and secondreference points and the sample stage includes a sample stage referencepoint, indexing including: determining a first reference position of thefirst reference point relative to the sample stage reference point, anddetermining a second reference angular offset of the second referencepoint relative to the first reference point.
 21. (canceled)
 22. Themethod of claim 20 comprising determining the first reference point ofthe sample, wherein the first reference point is a center of the sample,and the sample is circular, determining the first reference pointincluding: sensing a circular edge location of a plurality of circularedge locations of a sample edge, sensing including: translating thesample stage and the sample edge toward the optical instrument,detecting the circular edge location with the optical instrument as theoptical instrument crosses over the sample edge, indexing the circularedge location relative to the sample stage reference point, and rotatingthe sample stage and the sample a specified angle measure; repeating thesensing of the circular edge location after each rotation until three ormore circular edge locations are indexed; and determining the center ofthe sample from a circle having a perimeter coincident with the three ormore circular edge locations. 23-24. (canceled)
 25. The method of claim20, wherein determining the second reference angular offset of thesecond reference point includes: translating the sample stage and thesample along a first translational axis relative to the opticalinstrument to a location near an edge of the sample and the secondreference point, wherein the optical instrument is aligned with thesample, rotating the sample stage, detecting the second reference pointwith the optical instrument, the second reference point having a secondreference angular offset relative to the first reference point accordingto the rotation of the sample stage and the sample.
 26. (canceled) 27.The method of claim 20, wherein detecting the second reference pointincludes: detecting first and second portions of the second referencepoint, wherein each of the first and second portions includes respectivefirst and second angular measurements, and optionally averaging thefirst and second angular measurements and the average of the first andsecond angular measurements is the second reference an angular offset.28-29. (canceled)
 30. The method of claim 10, comprising determining thecenter of rotation of the sample stage including: marking the sample ata plurality of locations including: marking the sample at a firstlocation of the plurality of locations with the instrument, and rotatingthe sample stage and the sample a specified angle measure, wherein thesample stage and the sample are translationally static relative to abase; repeating marking of the sample at second and third locations ofthe plurality of locations according to the repeated rotation of thesample stage and the sample; and determining the center of rotation ofthe sample stage from a circle having a perimeter coincident with theplurality of locations, the center of rotation coincident to a center ofthe circle. 31-89. (canceled)
 90. A method for initializing a testingsystem comprising: positioning a sample coupled with a sample stage inalignment with an instrument, wherein the sample stage is configured fortranslational and rotational movement relative to a base; deformablymarking the sample with marks at at least first, second and thirdmarking locations with the instrument; rotating the sample a specifiedangle measure between each marking of the sample at the first, secondand third marking locations, wherein the sample stage and the sample aretranslationally static relative to the base; and determining the centerof rotation of the sample stage from a circle having a perimetercoincident with at least the markings at the first, second and thirdmarking locations, the center of rotation coincident to a center of thecircle.
 91. The method of claim 90 comprising: translating the samplestage and the sample between at least the first, second and thirdmarking locations, wherein the sample stage and the sample arerotationally static; observing each of the marks at the first, secondand third marking locations with an optical instrument; indexing themarks at the first, second and third marking locations; and whereindetermining the center of rotation of the sample stage includesdetermining the center of rotation from the circle having a perimetercoincident with the indexed marks. 92-93. (canceled)
 94. The method ofclaim 90 comprising determining an instrument offset between an opticalinstrument and the instrument, determining the instrument offsetincluding: deformably marking the sample with an offset marking at afirst offset marking location on the sample with the instrument, whereinthe instrument is aligned with the offset marking at the first offsetmarking location, translating the sample stage and the marking at thefirst offset marking location of the sample into alignment with theoptical instrument, and measuring the translation of the sample stagefrom alignment of the marking with the instrument to alignment of themarking with the optical instrument, and the instrument offset isequivalent to the measured translation.
 95. (canceled)